Prosecution Insights
Prosecution Insights
Technology areas: Chemistry & Materials • Semiconductors, Circuits & Optics
135 pending office actions • 34 art units • 93 examiners • 0 of 135 (0%) have an AI response strategy ready • 205 patents granted in the last 365 days
ASM IP Holding B.V. maintains 135 pending office actions in the Chemistry & Materials technology area. These actions are distributed among 94 distinct examiners and 34 distinct art units. MCCLURE, CHRISTINA D is the busiest examiner with 6 busiest examiner pending actions. The 34 distinct art units indicate that the company's chemical and material innovations are concentrated in a specific set of technical groups.
The ratio of 135 pending office actions to 94 distinct examiners suggests that several examiners are responsible for multiple applications. This concentration requires a coordinated approach to ensure consistent claim construction across the 94 distinct examiners. The 6 busiest examiner pending actions assigned to MCCLURE, CHRISTINA D represent a portion of the 135 pending office actions. Practitioners should monitor the tendencies of the busiest examiners to optimize prosecution strategy.
Managing 135 pending office actions across 34 distinct art units requires an understanding of the specific technical standards applied by each group. Because the 94 distinct examiners are spread across these units, there is variety in the technical scrutiny applied to the applications. This structure requires a strategy that accounts for both individual examiner preferences and art unit trends. The 34 distinct art units highlight the technical focus of the company's current patent filings.
Based on the USPTO statutory response window for each pending office action. 35 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 35 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 61 (45%) |
| §102 only | 1 (1%) |
| §112 only | 1 (1%) |
| Double-patenting only | 1 (1%) |
| Double-patenting + other | 6 (4%) |
| Multi-statute (no §101) | 65 (48%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| MCCLURE, CHRISTINA D | 6 | 29.9% | +32.7% |
| SWEELY, KURT D | 5 | 52.8% | +33.9% |
| BRATLAND JR, KENNETH A | 4 | 56.1% | +16.3% |
| TADAYYON ESLAMI, TABASSOM | 4 | 49.5% | +26.5% |
| HERNANDEZ-KENNEY, JOSE | 3 | 54.6% | +22.8% |
| MAYY, MOHAMMAD | 3 | 48.5% | +23.2% |
| MILLER, MICHAEL G | 3 | 52.0% | +15.8% |
| GAMBETTA, KELLY M | 3 | 71.8% | +33.1% |
| ROLLAND, ALEX A | 3 | 47.9% | +26.6% |
| REYES, JOSHUA NATHANIEL PI | 3 | 41.4% | +51.2% |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18131279 | GAS-PHASE METHOD OF FORMING RADIATION-SENSITIVE PATTERNABLE MATERIAL | LEE, ALEXANDER N | 25d overdue |
| 18925862 | METHOD AND SYSTEM FOR DEPOSITING METAL PHOSPHIDE | TUROCY, DAVID P | 19d overdue |
| 18384448 | METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES | MALSAWMA, LALRINFAMKIM HMAR | 15d overdue |
| 18644475 | METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS | HERNANDEZ-KENNEY, JOSE | 9d overdue |
| 17900065 | METHOD OF FORMING AN UNDERLAYER FOR EXTREME ULTRAVIOLET (EUV) DOSE REDUCTION AND STRUCTURE INCLUDING SAME | ANGEBRANNDT, MARTIN J | 5d overdue |
| 18092362 | REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REMOTE PLASMA | MOORE, KARLA A | 4d overdue |
| 17457605 | HIGH PERFORMANCE SUSCEPTOR APPARATUS | NUCKOLS, TIFFANY Z | 3d overdue |
| 18475002 | LOADLOCK ASSEMBLY INCLUDING CHILLER UNIT | LEE, AIDEN Y | 9d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17942318 | AIR GAP FORMING METHOD AND SELECTIVE DEPOSITION METHOD | ROLLAND, ALEX A | 22d overdue |
| 18644475 | METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS | HERNANDEZ-KENNEY, JOSE | 9d overdue |
| 17842007 | REACTOR SYSTEM AND METHOD FOR FORMING A LAYER COMPRISING INDIUM GALLIUM ZINC OXIDE | TADAYYON ESLAMI, TABASSOM | 21d |
| 18524307 | SUBSTRATE PROCESSING METHOD | GAMBETTA, KELLY M | 22d |
| 18179187 | SEMICONDUCTOR PROCESSING SYSTEM WITH GAS LINE FOR TRANSPORTING EXCITED SPECIES AND RELATED METHODS | REYES, JOSHUA NATHANIEL PI | 26d |
| 18596144 | REACTANT VAPORIZER AND RELATED SYSTEMS AND METHODS | TADAYYON ESLAMI, TABASSOM | 28d |
| 17990776 | METHOD OF FORMING SIOC AND SIOCN LOW-K SPACERS | MCCLURE, CHRISTINA D | 28d |
| 18086734 | EPITAXIAL REACTOR SYSTEMS AND METHODS OF USING SAME | BRATLAND JR, KENNETH A | 30d |
| Art Unit | Apps |
|---|---|
| 1718 | 29 |
| 1716 | 12 |
| 1717 | 6 |
| 1712 | 6 |
| 2899 | 6 |
| 1714 | 5 |
| 1759 | 4 |
| 3753 | 4 |
| 2896 | 3 |
| 2812 | 2 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 19401507 | METHOD OF FILLING GAP WITH FLOWABLE CARBON LAYER | HERNANDEZ-KENNEY, JOSE | 1717 | §103DP | Non-Final OA | — | Pending | Nov 26, 2025 |
| 19283552 | METHOD OF FORMING LOW-K MATERIAL LAYER, STRUCTURE INCLUDING THE LAYER, AND SYSTEM FOR FORMING SAME | MCCLURE, CHRISTINA D | — | §103§112 | Non-Final OA | — | Pending | Jul 29, 2025 |
| 19261057 | METHODS OF FILLING GAP ON SUBSTRATE SURFACE | PROCTOR, CACHET I | 1712 | §102§103 | Non-Final OA | — | Pending | Jul 07, 2025 |
| 19251984 | METHODS FOR FORMING A DOPED HIGH-K LAYER ON A SUBSTRATE | MELLOTT, JAMES M | 1759 | §103DP | Final Rejection | 50d | Pending | Jun 27, 2025 |
| 19200826 | METHOD, SYSTEM AND APPARATUS FOR FORMING METAL-INSULATOR-METAL AND/OR METAL-FERROELECTRIC-METAL DEVICE | MAYY, MOHAMMAD | — | §102§103§112 | Non-Final OA | — | Pending | May 07, 2025 |
| 19194543 | SUBSTRATE PROCESSING APPARATUS WITH TEMPERATURE CONTROLLER | MILLER, MICHAEL G | 1712 | §103 | Non-Final OA | — | Pending | Apr 30, 2025 |
| 19175324 | METHOD OF FORMING A STRUCTURE INCLUDING CARBON MATERIAL, STRUCTURE FORMED USING THE METHOD, AND SYSTEM FOR FORMING THE STRUCTURE | MCCLURE, CHRISTINA D | 1718 | §103§112 | Non-Final OA | — | Pending | Apr 10, 2025 |
| 19084915 | SUBSTRATE PROCESSING METHOD | MAYY, MOHAMMAD | 1718 | §102§103§112 | Non-Final OA | — | Pending | Mar 20, 2025 |
| 19068714 | DETECTING FAILED PULSE FROM RF POWER SOURCE | PRETLOW, DEMETRIUS R | — | §102§103 | Non-Final OA | — | Pending | Mar 03, 2025 |
| 19065143 | APPARATUS AND METHOD FOR PROVIDING A PULSE OF A PRECURSOR | MILLER, MICHAEL G | 1712 | §102§103 | Non-Final OA | — | Pending | Feb 27, 2025 |
| 19064376 | END EFFECTOR AND SUBSTRATE PROCESSING SYSTEM USING THE SAME | AHADI, ELIA | — | §102§103§112 | Non-Final OA | — | Pending | Feb 26, 2025 |
| 19036574 | SUBSTARATE PROCESSING APPARATUS WITH VUV INTENSITY CONTROL | ASFAW, MESFIN T | — | §102§103 | Non-Final OA | — | Pending | Jan 24, 2025 |
| 19032149 | METHODS AND SYSTEM FOR PRECURSOR RECYCLING | ALEJANDRO MULERO, LUZ L | 1716 | §103 | Non-Final OA | — | Pending | Jan 20, 2025 |
| 19008803 | METHOD AND APPARATUS FOR AREA-SELECTIVE DEPOSITION | GAMBETTA, KELLY M | 1718 | §103 | Final Rejection | 41d | Pending | Jan 03, 2025 |
| 19007858 | GAS MANIFOLD AND ASSEMBLY AND SYSTEM INCLUDING SAME | MURPHY, KEVIN F | 3753 | §103 | Final Rejection | — | Pending | Jan 02, 2025 |
| 19000941 | METHODS AND ASSEMBLIES FOR SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL | WEDDLE, ALEXANDER MARION | 1712 | §102§103 | Final Rejection | — | Pending | Dec 24, 2024 |
| 18985379 | APPARATUS FOR A SUBSTRATE SUPPORT WITH MULTI-ZONE CONTROL | WILSON, LEE D | — | §103§112 | Non-Final OA | — | Pending | Dec 18, 2024 |
| 18982214 | DEPOSITION OF ORGANIC FILMS | LU, JIONG-PING | — | §102§103DP | Non-Final OA | — | Pending | Dec 16, 2024 |
| 18975928 | SUBSTRATE TRANSFER ARM AND APPARATUS USING THE SAME | LE, HUAN G | — | §102§103§112 | Non-Final OA | — | Pending | Dec 10, 2024 |
| 18973788 | APPARATUS AND METHODS FOR PERFORMING AN IN-SITU ETCH OF REACTION CHAMBERS WITH FLUORINE-BASED RADICALS | REMAVEGE, CHRISTOPHER | — | §102DP | Non-Final OA | — | Pending | Dec 09, 2024 |
| 18961225 | SUBSTRATE COOLING APPARATUS USING CONDUCTION AND RADIANCE | NEUPANE, ADARSH | — | §103 | Non-Final OA | — | Pending | Nov 26, 2024 |
| 18930631 | METHOD FOR FORMING A RARE-EARTH-CONTAINING LAYER, APPARATUS, AND STRUCTURE | MCCLURE, CHRISTINA D | 1718 | §102§103§112 | Final Rejection | — | Pending | Oct 29, 2024 |
| 18928314 | METHODS AND APPARATUS FOR SUSCEPTOR LEVELING | TAUFIQ, FARAH N | — | §103 | Non-Final OA | — | Pending | Oct 28, 2024 |
| 18925862 | METHOD AND SYSTEM FOR DEPOSITING METAL PHOSPHIDE | TUROCY, DAVID P | 1718 | §103§112 | Final Rejection | 19d overdue | Pending | Oct 24, 2024 |
| 18904974 | METHODS AND SYSTEMS FOR PREVENTIVE MAINTENANCE OF SEMICONDUCTOR PROCESSING EQUIPMENT | CAMPBELL, NATASHA N. | 1714 | §103§112 | Non-Final OA | — | Pending | Oct 02, 2024 |
| 18900134 | METHOD, SYSTEM AND APPARATUS FOR FORMING ANISOTROPIC LAYER | KUNEMUND, ROBERT M | — | §103 | Non-Final OA | — | Pending | Sep 27, 2024 |
| 18900571 | SELECTIVE DEPOSITION OF INHIBITOR MATERIAL AND DEPOSITION ASSEMBLIES | ROLLAND, ALEX A | 1759 | §103 | Non-Final OA | 56d | Pending | Sep 27, 2024 |
| 18817440 | METHODS AND APPARATUS FOR A SUSCEPTOR ASSEMBLY | COMBER, KEVIN J | 2812 | §103 | Non-Final OA | — | Pending | Aug 28, 2024 |
| 18816095 | DEPOSITION OF ORGANIC MATERIAL | DAGENAIS, KRISTEN A | — | §103 | Non-Final OA | — | Pending | Aug 27, 2024 |
| 18815636 | METHODS OF FORMING SEMICONDUCTOR STRUCTURES, SEMICONDUCTOR PROCESSING SYSTEMS AND RELATED COMPUTER PROGRAM PRODUCTS | WATTS, JEREMY DANIEL | — | §102§103 | Non-Final OA | — | Pending | Aug 26, 2024 |
| 18787053 | PROTECTED METALLIC COMPONENTS, REACTION CHAMBERS INCLUDING PROTECTED METALLIC COMPONENTS, AND METHODS FOR FORMING AND UTILIZING PROTECTED METALLIC COMPONENTS | SWEELY, KURT D | 1718 | §102§103§112 | Final Rejection | 33d | Pending | Jul 29, 2024 |
| 18786895 | METHOD, SYSTEM AND APPARATUS FOR TREATING SUBSTRATE SURFACE | TALBOT, BRIAN K | — | §102§103§112 | Non-Final OA | — | Pending | Jul 29, 2024 |
| 18780059 | BOTTOM-UP METAL NITRIDE FORMATION | ARMAND, MARC ANTHONY | — | DP | Non-Final OA | — | Pending | Jul 22, 2024 |
| 18777790 | METHOD FOR FORMING SILICON NITRIDE FILM SELECTIVELY ON SIDEWALLS OF TRENCHES | TIVARUS, CRISTIAN ALEXANDRU | — | §102§103§112 | Non-Final OA | — | Pending | Jul 19, 2024 |
| 18775963 | DETERMINING SUBSTRATE DECENTERING IN SEMICONDUCTOR PROCESSING SYSTEMS EMPLOYED TO DEPOSIT MATERIAL LAYERS ONTO SUBSTRATES | RAIMUND, CHRISTOPHER W | — | §103§112 | Non-Final OA | — | Pending | Jul 17, 2024 |
| 18773858 | Vapor Deposition Processes | CROWELL, ANNA M | — | §102§103§112DP | Non-Final OA | — | Pending | Jul 16, 2024 |
| 18755620 | MATERIAL LAYER DEPOSITION METHODS, SEMICONDUCTOR PROCESSING SYSTEMS, AND COMPUTER PROGRAM PRODUCTS FOR CONTROLLING THICKNESS OF PRECOAT MATERIAL LAYERS IN SEMICONDUCTOR PROCESSING SYSTEMS | LOUIE, MANDY C | 1718 | §103 | Final Rejection | — | Pending | Jun 26, 2024 |
| 18742250 | METHODS FOR SILICON GERMANIUM UNIFORMITY CONTROL USING MULTIPLE PRECURSORS | BRATLAND JR, KENNETH A | 1714 | §102§103 | Non-Final OA | — | Pending | Jun 13, 2024 |
| 18740699 | METHOD, SYSTEM, AND APPARATUS FOR DEPOSITION OF TRANSITION METAL FILM | HALL, VICTORIA KATHLEEN | — | §102§103§112 | Non-Final OA | — | Pending | Jun 12, 2024 |
| 18739563 | SUBSTRATE SUPPORTING APPARATUS AND SUBSTRATE PROCESSING APPARATUS | LIGAN, OLUWAFEMI LUCRECE | — | §102§103 | Non-Final OA | — | Pending | Jun 11, 2024 |
| 18677160 | EPITAXY FAST RAMP TEMPERATURE CONTROL SYSTEMS AND PROCESSES | GIORDANO, MICHAEL JAMES | — | §103 | Non-Final OA | — | Pending | May 29, 2024 |
| 18676023 | METHOD SYSTEM AND APPARATUS FOR REMOTE SOLID REFILL | ARNETT, NICOLAS ALLEN | 3753 | §102§103§112 | Non-Final OA | — | Pending | May 28, 2024 |
| 18666277 | EQUIPMENT FRONT END MODULE | SCHULT, ALLEN | 3652 | §103 | Non-Final OA | — | Pending | May 16, 2024 |
| 18656799 | SELECTIVE DEPOSITION OF A MATERIAL COMPRISING SILICON AND NITROGEN | RAMALLO, GUSTAVO G | — | §102§103§112 | Non-Final OA | — | Pending | May 07, 2024 |
| 18644475 | METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS | HERNANDEZ-KENNEY, JOSE | 1717 | §103§112 | Non-Final OA | 9d overdue | Pending | Apr 24, 2024 |
| 18642877 | SYSTEMS AND METHODS FOR DEPOSITING MATERIAL LAYERS ONTO SUBSTRATES | MCCLURE, CHRISTINA D | — | §103 | Non-Final OA | — | Pending | Apr 23, 2024 |
| 18635185 | SUBSTRATE PROCESSING APPARATUS INCLUDING ELECTROSTATIC CHUCK | AL-TAWEEL, MUAAMAR QAHTAN | 2838 | §103 | Non-Final OA | — | Pending | Apr 15, 2024 |
| 18631858 | SEMICONDUCTOR PROCESSING DEVICE WITH EDGE PURGING | BENNETT, CHARLEE | — | §103 | Non-Final OA | — | Pending | Apr 10, 2024 |
| 18624808 | LOW LEAKAGE CAPACITORS, AND RELATED STRUCTURES, METHODS, AND SYSTEMS | KEBEDE, BROOK | — | §102 | Non-Final OA | — | Pending | Apr 02, 2024 |
| 18608609 | METHODS OF FORMING A SEMICONDUCTOR STRUCTURE | DEMISSIE, BERHANU GELETA | 4100 | §102§103 | Non-Final OA | — | Pending | Mar 18, 2024 |
| 18603366 | ENCLOSURE CONSTRUCTIONS FOR REACTORS USED IN SEMICONDUCTOR FABRICATION PROCESSING | DANIELS, MATTHEW J | — | §103 | Final Rejection | — | Pending | Mar 13, 2024 |
| 18598145 | METHOD OF FORMING DIELECTRIC MATERIAL LAYER USING PLASMA | MCCLURE, CHRISTINA D | 1718 | §103§112 | Non-Final OA | — | Pending | Mar 07, 2024 |
| 18595668 | SYSTEMS AND METHODS FOR MONITORING OF A CONTROLLED ENVIRONMENT IN A SUBSTRATE PROCESSING SYSTEM | BARTLETT, WILLIAM P | 2169 | §103 | Final Rejection | — | Pending | Mar 05, 2024 |
| 18596144 | REACTANT VAPORIZER AND RELATED SYSTEMS AND METHODS | TADAYYON ESLAMI, TABASSOM | 1718 | §103 | Final Rejection | 28d | Pending | Mar 05, 2024 |
| 18585313 | WAFER PROCESSING APPARATUS WITH FILM UNIFORMITY IMPROVEMENT CAPABILITIES | SWEELY, KURT D | — | §103 | Non-Final OA | — | Pending | Feb 23, 2024 |
| 18425107 | METHOD, ASSEMBLY AND SYSTEM FOR FILM DEPOSITION AND CONTROL | LUONG, HENRY T | 2844 | §103 | Non-Final OA | — | Pending | Jan 29, 2024 |
| 18416147 | METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM OVER A DIELECTRIC SURFACE OF A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS AND RELATED SEMICONDUCTOR DEVICE STRUCTURES | PAYEN, MARVIN | 2899 | §103 | Final Rejection | — | Pending | Jan 18, 2024 |
| 18402950 | METHODS AND SYSTEMS FOR FORMING STRUCTURES COMPRISING A THRESHOLD VOLTAGE TUNING LAYER | JUNGE, BRYAN R. | 2897 | §102§112 | Non-Final OA | 12d | Pending | Jan 03, 2024 |
| 18395822 | METHODS AND APPARATUS FOR AN ACCUMULATOR | DURDEN, RICHARD KYLE | 3753 | §103§112 | Non-Final OA | — | Pending | Dec 26, 2023 |
| 18395907 | PARTIAL BREAKDOWN OF PRECURSORS FOR ENHANCED ALD FILM GROWTH | YEUNG LOPEZ, FEIFEI | 2899 | §103§112 | Final Rejection | — | Pending | Dec 26, 2023 |
| 18392301 | LOAD LOCK ARRANGEMENTS, ASSOCIATED TEMPERATURE CONTROL ASSEMBLIES, AND SEMICONDUCTOR PROCESSING SYSTEMS INCLUDING LOAD LOCK ARRANGEMENTS AND TEMPERATURE CONTROL ASSEMBLIES | JENNISON, BRIAN W | 2812 | §112 | Non-Final OA | — | Pending | Dec 21, 2023 |
| 18392538 | SUBSTRATE PROCESSING APPARATUS WITH CAPABILITIES OF AUTOMATIC DEVICE CONFIGURATION AND A METHOD THEREOF | FOLLANSBEE, YVONNE TRANG | 2117 | §103 | Final Rejection | — | Pending | Dec 21, 2023 |
| 18391815 | SYSTEMS AND APPARATUS FOR SEMICONDUCTOR EQUIPMENT | ANBACHT, BRIT ELIZA | 1776 | §102§103 | Non-Final OA | — | Pending | Dec 21, 2023 |
| 18540329 | METHODS FOR FORMING MULTILAYER STRUCTURES ON A SUBSTRATE AND RELATED MULTILAYER STRUCTURES | WALL, VINCENT | 2898 | §103 | Final Rejection | — | Pending | Dec 14, 2023 |
| 18540230 | METHODS FOR FORMING SEMICONDUCTOR STACKED STRUCTURES ON A SUBSTRATE AND RELATED SEMICONDUCTOR STRUCTURES | BRATLAND JR, KENNETH A | 2811 | §103§112 | Non-Final OA | — | Pending | Dec 14, 2023 |
| 18532190 | SEMICONDUCTOR MANUFACTURING CHEMICAL COMPOUND MONITORING PROCESS | NYAMOGO, JOSEPH A | 2858 | §102§103 | Final Rejection | — | Pending | Dec 07, 2023 |
| 18524307 | SUBSTRATE PROCESSING METHOD | GAMBETTA, KELLY M | 1718 | §103§112 | Non-Final OA | 22d | Pending | Nov 30, 2023 |
| 18522132 | EQUIPMENT FRONT-END MODULES FOR SEMICONDUCTOR PROCESSING SYSTEMS AND METHODS OF MAKING SEMICONDUCTOR PROCESSING SYSTEMS | YU, YUECHUAN | 1718 | §103§112 | Non-Final OA | — | Pending | Nov 28, 2023 |
| 18519172 | METHOD OF FORMING AN ORGANIC POLYMER COMPRISING POLYIMIDE | GOODWIN, DAVID J | 2817 | §103 | Final Rejection | — | Pending | Nov 27, 2023 |
| 18517837 | VAPOR PHASE PRECURSOR DELIVERY SYSTEM | REYES, JOSHUA NATHANIEL PI | 1746 | §102§103 | Non-Final OA | — | Pending | Nov 22, 2023 |
| 18510043 | SYSTEMS AND APPARATUS FOR SEMICONDUCTOR EQUIPMENT | CROWELL, ANNA M | 1716 | §102§103DP | Non-Final OA | — | Pending | Nov 15, 2023 |
| 18388661 | SYSTEMS AND APPARATUS FOR SEMICONDUCTOR EQUIPMENT | PENCE, JETHRO M | 1717 | §103 | Non-Final OA | — | Pending | Nov 10, 2023 |
| 18384448 | METHOD AND SYSTEM FOR TUNING PHOTORESIST ADHESION LAYER PROPERTIES | MALSAWMA, LALRINFAMKIM HMAR | 2892 | §102§103 | Final Rejection | 15d overdue | Pending | Oct 27, 2023 |
| 18496081 | SEMICONDUCTOR PROCESSING CHAMBER WITH FILAMENT LAMPS HAVING NONUNIFORM HEAT OUTPUT | WILCZEWSKI, MARY A | — | §102§103 | Final Rejection | — | Pending | Oct 27, 2023 |
| 18491546 | ALD DEPOSITION METHOD AND SYSTEM | MAYY, MOHAMMAD | 1718 | §103 | Final Rejection | — | Pending | Oct 20, 2023 |
| 18377885 | GAS INLET TUBE ASSEMBLY FOR AN IMPROVED GAS MIXTURE IN A SUBSTRATE PROCESSING APPARATUS | BENNETT, CHARLEE | 1718 | §103 | Final Rejection | 21d | Pending | Oct 09, 2023 |
| 18376597 | METHODS FOR FORMING A TRANSITION METAL NIOBIUM NITRIDE FILM ON A SUBSTRATE BY ATOMIC LAYER DEPOSITION AND RELATED SEMICONDUCTOR DEVICE STRUCTURES | ANDERSON, WILLIAM H | 2817 | §103 | Final Rejection | — | Pending | Oct 04, 2023 |
| 18475002 | LOADLOCK ASSEMBLY INCLUDING CHILLER UNIT | LEE, AIDEN Y | 1718 | §103§112 | Non-Final OA | 9d | Pending | Sep 26, 2023 |
| 18474953 | WAFER PROCESSING APPARATUS | TRAN, VI N | 2117 | §102§103§112 | Non-Final OA | — | Pending | Sep 26, 2023 |
| 18465835 | METHOD OF FORMING A SI-COMPRISING EPITAXIAL LAYER SELECTIVELY ON A SUBSTRATE | SLUTSKER, JULIA | 2891 | §103 | Final Rejection | — | Pending | Sep 12, 2023 |
| 18243173 | SYSTEM AND APPARATUS FOR A LIFT PIN | CHEN, KEATH T | 1716 | §102§103 | Non-Final OA | — | Pending | Sep 07, 2023 |
| 18463034 | COMPOSITIONS COMPRISING BORAZINE AND ITS DERIVATIVES, AND RELATED METHODS AND SYSTEMS | MILLER, MICHAEL G | 1712 | §103 | Final Rejection | — | Pending | Sep 07, 2023 |
| 18239176 | SYSTEM AND APPARATUS FOR A REACTION CHAMBER | KENDALL, BENJAMIN R | 2896 | §103§112 | Non-Final OA | 26d | Pending | Aug 29, 2023 |
| 18452725 | SUBSTRATE PROCESSING APPARATUS | MILLER, JR, JOSEPH ALBERT | 1712 | §102§103 | Final Rejection | — | Pending | Aug 21, 2023 |
| 18234549 | METHOD OF FORMING MATERIAL WITHIN A RECESS | TADAYYON ESLAMI, TABASSOM | 1718 | §103§112 | Final Rejection | 34d | Pending | Aug 16, 2023 |
| 18230729 | METHODS AND APPARATUS FOR A SUSCEPTOR LIFT TOOL | WILKINSON, RALPH DAVID | 3654 | §102§103§112 | Non-Final OA | — | Pending | Aug 07, 2023 |
| 18362404 | WAFER BOAT AND A METHOD FOR FORMING LAYER ON A PLURALITY OF SUBSTRATES | BRAYTON, JOHN JOSEPH | 1794 | §103 | Non-Final OA | 22d | Pending | Jul 31, 2023 |
| 18228122 | SUBSTRATE PROCESSING METHOD | STEVENSON, ANDRE C | 2899 | §103 | Final Rejection | — | Pending | Jul 31, 2023 |
| 18222012 | SUBSTRATE PROCESSING METHOD | LOUIE, MANDY C | 1718 | §103 | Non-Final OA | — | Pending | Jul 14, 2023 |
| 18351227 | FLOW CONTROL ARRANGEMENTS WITH ENCLOSED FLOW SWITCHES AND ISOLATION VALVES, SEMICONDUCTOR PROCESSING SYSTEMS, AND FLOW CONTROL METHODS | KENDALL, BENJAMIN R | 2896 | §103 | Non-Final OA | — | Pending | Jul 12, 2023 |
| 18346608 | SEMICONDUCTOR PROCESSING APPARATUS FOR PROCESSING A PLURALITY OF SUBSTRATES WITH CROSS FLOW | BRAYTON, JOHN JOSEPH | 1794 | §103 | Non-Final OA | — | Pending | Jul 03, 2023 |
| 18214656 | METHOD OF FORMING P-TYPE DOPED SILICON-GERMANIUM LAYERS AND SYSTEM FOR FORMING SAME | TADAYYON ESLAMI, TABASSOM | 1718 | §103 | Non-Final OA | — | Pending | Jun 27, 2023 |
| 18205766 | METHODS AND APPARATUSES FOR FLOWABLE GAP FILL | TUROCY, DAVID P | 1718 | §103 | Non-Final OA | — | Pending | Jun 05, 2023 |
| 18324411 | SUBSTRATE SUPPORTS, SEMICONDUCTOR PROCESSING SYSTEMS, AND MATERIAL LAYER DEPOSITION METHODS | LUND, JEFFRIE ROBERT | 1716 | §102§103 | Final Rejection | — | Pending | May 26, 2023 |
| 18199018 | SUBSTRATE PROCESSING METHOD | STEVENSON, ANDRE C | 2899 | §103 | Final Rejection | 19d | Pending | May 18, 2023 |
| 18195422 | THERMAL MANAGEMENT SYSTEMS AND DEVICES FOR CABINETS USED IN SEMICONDUCTOR FABRICATION PROCESSING | GARDNER, NICOLE | 3753 | §102§103§112 | Non-Final OA | 27d | Pending | May 10, 2023 |
| 18195456 | FILM FORMING APPARATUS WITH ANNULAR EXHAUST DUCT | SWEELY, KURT D | 1718 | §103 | Final Rejection | 76d | Pending | May 10, 2023 |
| 18137800 | SUBSTRATE PROCESSING APPARATUS INCLUDING EXHAUST DUCT | HASSANZADEH, PARVIZ | 1716 | §103 | Final Rejection | — | Pending | Apr 21, 2023 |
| 18135792 | PRECURSOR VESSEL COOLING ASSEMBLY, SYSTEM INCLUDING THE ASSEMBLY, AND METHODS OF USING SAME | KING, BRIAN M | 3763 | §103§112 | Final Rejection | 75d | Pending | Apr 18, 2023 |
| 18131279 | GAS-PHASE METHOD OF FORMING RADIATION-SENSITIVE PATTERNABLE MATERIAL | LEE, ALEXANDER N | 1737 | §102§103 | Non-Final OA | 25d overdue | Pending | Apr 05, 2023 |
| 18129932 | GAS-DELIVERY ASSEMBLY AND REACTOR SYSTEM INCLUDING SAME | KENDALL, BENJAMIN R | 2896 | §103 | Non-Final OA | 40d | Pending | Apr 03, 2023 |
| 18190696 | PYROMETER CONTROLLED MULTI-WAFER CLEANING PROCESS | BRATLAND JR, KENNETH A | 1714 | §103 | Non-Final OA | — | Pending | Mar 27, 2023 |
| 18179187 | SEMICONDUCTOR PROCESSING SYSTEM WITH GAS LINE FOR TRANSPORTING EXCITED SPECIES AND RELATED METHODS | REYES, JOSHUA NATHANIEL PI | 1718 | §103 | Non-Final OA | 26d | Pending | Mar 06, 2023 |
| 18110403 | SYSTEMS AND METHODS FOR PROCESSING THE SURFACE OF AN EPITAXIALLY GROWN SILICON FILM USING A RADICAL SPECIES | QI, HUA | 1714 | §102§103§112 | Final Rejection | 21d | Pending | Feb 16, 2023 |
| 18105275 | REACTOR COOLING SYSTEM | SWEELY, KURT D | 1718 | §103 | Non-Final OA | — | Pending | Feb 03, 2023 |
| 18100331 | REACTOR SYSTEM WITH SOURCE VESSEL WEIGHT MONITORING | KUYKENDALL, ALYSSA LEE | 1774 | §102§103§112Other | Final Rejection | 34d | Pending | Jan 23, 2023 |
| 18149700 | METHODS FOR FORMING A SEMICONDUCTOR STRUCTURE INCLUDING A DIPOLE LAYER | ROLLAND, ALEX A | 1759 | §103§112 | Non-Final OA | — | Pending | Jan 04, 2023 |
| 18092362 | REMOTE PLASMA UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING REMOTE PLASMA | MOORE, KARLA A | 1716 | §103§112Other | Final Rejection | 4d overdue | Pending | Jan 02, 2023 |
| 18089635 | METHODS AND APPARATUS FOR HEATING AND TEMPERATURE MONITORING | AMAR, MARC J | 3741 | §103§112 | Final Rejection | 22d | Pending | Dec 28, 2022 |
| 18086734 | EPITAXIAL REACTOR SYSTEMS AND METHODS OF USING SAME | BRATLAND JR, KENNETH A | 1714 | §103§112 | Non-Final OA | 30d | Pending | Dec 22, 2022 |
| 18065869 | SYSTEMS AND METHODS FOR CONTROLLING MOISTURE IN SEMICONDUCTOR PROCESSING SYSTEMS | TREMARCHE, CONNOR J. | 3762 | §103 | Non-Final OA | — | Pending | Dec 14, 2022 |
| 18072764 | METHODS FOR IMPROVING THIN FILM QUALITY | GAMBETTA, KELLY M | 1718 | §103§112 | Final Rejection | 71d | Pending | Dec 01, 2022 |
| 17990776 | METHOD OF FORMING SIOC AND SIOCN LOW-K SPACERS | MCCLURE, CHRISTINA D | 1718 | §103 | Final Rejection | 28d | Pending | Nov 21, 2022 |
| 17971829 | PLASMA CVD APPARATUS WITH A BEVEL MASK WITH A PLANAR INNER EDGE | FORD, NATHAN K | 1718 | §103 | Final Rejection | — | Pending | Oct 24, 2022 |
| 17955816 | MODULAR REACTION CHAMBER | NUCKOLS, TIFFANY Z | 1718 | §102§103§112 | Final Rejection | — | Pending | Sep 29, 2022 |
| 17948674 | SYSTEM AND APPARATUS FOR GAS DISTRIBUTION | FORD, NATHAN K | 1716 | §103 | Non-Final OA | — | Pending | Sep 20, 2022 |
| 17942318 | AIR GAP FORMING METHOD AND SELECTIVE DEPOSITION METHOD | ROLLAND, ALEX A | 1759 | §103 | Final Rejection | 22d overdue | Pending | Sep 12, 2022 |
| 17900065 | METHOD OF FORMING AN UNDERLAYER FOR EXTREME ULTRAVIOLET (EUV) DOSE REDUCTION AND STRUCTURE INCLUDING SAME | ANGEBRANNDT, MARTIN J | 1737 | §102§103 | Non-Final OA | 5d overdue | Pending | Aug 31, 2022 |
| 17896218 | CVD APPARATUS AND METHOD FOR CLEANING CHAMBER OF CVD APPARATUS | KLUNK, MARGARET D | 1718 | §103 | Final Rejection | 33d | Pending | Aug 26, 2022 |
| 17895370 | SEALING SYSTEM FOR A REACTOR SYSTEM | KLUNK, MARGARET D | 1716 | §102§103§112 | Non-Final OA | — | Pending | Aug 25, 2022 |
| 17864698 | SUBSTRATE SUPPORT UNIT, THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | LAW, NGA LEUNG V | 1717 | §103 | Final Rejection | 49d overdue | Pending | Jul 14, 2022 |
| 17847470 | SUBSTRATE PROCESSING APPRATUS INCLUDING A SUBSTRATE LIFT MECHANISM | SWEELY, KURT D | 1718 | §103 | Final Rejection | — | Pending | Jun 23, 2022 |
| 17842007 | REACTOR SYSTEM AND METHOD FOR FORMING A LAYER COMPRISING INDIUM GALLIUM ZINC OXIDE | TADAYYON ESLAMI, TABASSOM | 1718 | §103 | Final Rejection | 21d | Pending | Jun 16, 2022 |
| 17840870 | SUSCEPTOR CLEANING | REYES, JOSHUA NATHANIEL PI | 1718 | §103 | Non-Final OA | — | Pending | Jun 15, 2022 |
| 17739493 | CVD APPARATUS AND FILM FORMING METHOD | FORD, NATHAN K | 1716 | §103 | Non-Final OA | — | Pending | May 09, 2022 |
| 17708299 | METHODS AND SYSTEMS FOR FILLING A GAP | AU, BAC H | 2898 | §102§103 | Non-Final OA | — | Pending | Mar 30, 2022 |
| 17680607 | METHODS AND SYSTEMS FOR FILLING A GAP | YAP, DOUGLAS ANTHONY | 2899 | §102§103§112 | Non-Final OA | — | Pending | Feb 25, 2022 |
| 17666681 | METHOD AND SYSTEM FOR FORMING BORON NITRIDE ON A SURFACE OF A SUBSTRATE | HERNANDEZ-KENNEY, JOSE | 1717 | §102§103 | Non-Final OA | — | Pending | Feb 08, 2022 |
| 17457605 | HIGH PERFORMANCE SUSCEPTOR APPARATUS | NUCKOLS, TIFFANY Z | 1716 | §102§103 | Non-Final OA | 3d overdue | Pending | Dec 03, 2021 |
| 17360045 | METHOD FOR FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES | BENITEZ ROSARIO, JOSHUA | 2815 | §103 | Non-Final OA | — | Pending | Jun 28, 2021 |
| 17169440 | REACTOR SYSTEM WITH MULTI-DIRECTIONAL REACTION CHAMBER | MOORE, KARLA A | 1716 | §103§112 | Non-Final OA | — | Pending | Feb 06, 2021 |
| 17152592 | METHOD FOR DEPOSITION OF SILICON NITRIDE LAYER USING PRETREATMENT, STRUCTURE FORMED USING THE METHOD, AND SYSTEM FOR PERFORMING THE METHOD | STEVENSON, ANDRE C | 2899 | §103 | Final Rejection | — | Pending | Jan 19, 2021 |
| 17147827 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD FOR MONITORING INTEGRATED VALUE | KACKAR, RAM N | 1716 | §103 | Non-Final OA | — | Pending | Jan 13, 2021 |
| 17109080 | SUBSTRATE PROCESSING APPARATUS, BEVEL MASK AND SUBSTRATE PROCESSING METHOD | LAW, NGA LEUNG V | 1717 | §103 | Non-Final OA | — | Pending | Dec 01, 2020 |
| 16210922 | METHOD OF FORMING A STRUCTURE INCLUDING SILICON NITRIDE ON TITANIUM NITRIDE AND STRUCTURE FORMED USING THE METHOD | CIESLEWICZ, ANETA B | 2893 | §103 | Non-Final OA | — | Pending | Dec 05, 2018 |
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