Prosecution Insights
Last updated: April 19, 2026
Application No. 18/019,201

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD

Final Rejection §103
Filed
Feb 01, 2023
Examiner
WALKE, AMANDA C
Art Unit
1722
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Resonac Corporation
OA Round
2 (Final)
88%
Grant Probability
Favorable
3-4
OA Rounds
2y 7m
To Grant
97%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allow Rate
1488 granted / 1681 resolved
+23.5% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
52 currently pending
Career history
1733
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
51.0%
+11.0% vs TC avg
§102
23.1%
-16.9% vs TC avg
§112
15.2%
-24.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1681 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 14-23 is/are rejected under 35 U.S.C. 103 as being unpatentable over Nankawa et al (2011/0086309) in view of Suzuki et al (JP 2018-169548 and its machine translation). Nankawa et al disclose a method of forming a resist pattern comprising the steps as set forth by the instant claims 15-20, and the element of claim 14: PNG media_image1.png 252 310 media_image1.png Greyscale Wherein the reference also teaches a step of plating ([0127]; instant claim 17). The resist resin composition used in the method includes a binder polymer (A), polymerizable compound (B), initiator (C) (claim 1), and a sensitizing dye having an absorption max of about 37- to 420 nm ([0094], claim 5), and wherein a preferred alicyclic group for R4 of monomer unit (II) is (II) a dicyclopentanyl group (claims 1 and 3). The sensitizing dye includes compounds such as anthracenes, courmarins, pyrazolines, and also compounds known as UV absorbers, in triazoles and trizaines taught by the instant specification as types of compounds meeting the UV absorber limitations, including the molar absorption coefficient), and two or more compound may be added in combination and are taught by the reference to absorb UV light and when two are used in combination, one of the sensitizing compounds, would meet the limitations of the UV absorber as they absorb UV radiation during exposure to increase sensitivity and improve resolution. Alternatively, the initiator also absorbs UV light to induce photoinitiator at the exposure wavelength, and imidazoles and benzophenone compounds are disclosed, and when two are included, the benzophenone would meet the limitations of the UV absorber (which is preferably a benzophenone; ([0090]-[0096], bis(diethylamino)benzophenone suggested by the reference appears to be known to have a molar absorption coefficient of about 49,000 at 365). The material used in the method is taught by the instant claims and specification to include a UV absorber having the property of a molar absorption coefficient in a range of 500 to 50,000 L/ (mol.cm) at 365, which is not specifically by the reference, however, the compounds taught by the reference include compound absorbing UV light and are in the class of compounds taught by the instant specification as inherently possessing his property and meeting the limitations of the instant claims absent evidence to the contrary. Given the teachings of the reference, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to perform the method of Nankawa et al, wherein the material used in the method includes each of an initiator, a sensitizing dye, and one of an additional benzophenone initiator or additional UV sensitizing dye, wherein the resultant method and material would include the components as claimed including a UV absorbing compound as instantly claimed. Nankawa et al disclose a benzophenone UV absorber, with a non-limiting example of bis(diethylamino)benzophenone. Suzuki et al disclose a photosensitive resin composition comprising a UV absorber, wherein the reference teaches a bis(diethylamino)benzophenone as suggested by Nankawa et al, and further teach hydroxy-containing benzophenones as newly claimed. The reference teaches benzophenone, 4,4 ′ - diaminobenzophenone, 4,4 ′ - bis (dimethylamino) benzophenone, 4,4 ′ - bis (diethylamino) benzophenone, 4,4 ′ - bis (dibutylamino) benzophenone, 4-ethylamino benzophenone , 2,4-dihydroxybenzophenone , 3,4-dihydroxybenzophenone , 2,3,4-trihydroxybenzophenone , 2344 ′ - tetrahydroxybenzophenone, 2,2 ′, 4,4 ′ - tetrahydroxybenzophenone, 2,2 ′, 4,4 ′ - tetramethoxybenzophenone, 2,2 ′, 4,4 ′ - tetraethoxybenzophenone, 2,2 ′, 4,4 ′ - tetrabutoxybenzophenone, 2,2 ′ - dihydroxy-4, 4 ′ - dimethoxybenzophenone, 2,2 ′ - dihydroxy-4, 4 ′ - diethoxybenzophenone, 2,2 ′ - dihydroxy-4, 4 ′ - dibutoxybenzophenone, 4,4 ′ - dihydroxybenzophenone, 4,4 ′ - dimethoxybenzophenone, 4,4 ′ - dibutoxybenzophenone, and 4,4 ′ - diphenylbenzophenone. Wherein 2,3,4-trihydroxybenzophenone , 2344 ′ - tetrahydroxybenzophenone, 2,2 ′, 4,4 ′ - tetrahydroxybenzophenone meet the limitations of the instant claims 1 and 21-23. Suzuki therefore teaches that suitable UV absorbers include those as suggested by Nankawa et al, and teaches their equivalence to 2,4-dihydroxybenzophenone ,2,3,4-trihydroxybenzophenone , 2344 ′ - tetrahydroxybenzophenone, 2,2 ′, 4,4 ′ - tetrahydroxybenzophenone, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Nankawa et al, choosing as the UV absorber, that taught by Suzuki et al to be known and equivalent to those suggested by the primary reference. Claim(s) 14-23 is/are rejected under 35 U.S.C. 103 as being unpatentable over Nankawa et al in view of Ushijima et al (JP 2007-272138 and its machine translation). Nankawa et al has been discussed above and discloses a benzophenone UV absorber, with a non-limiting example of bis(diethylamino)benzophenone. Ushijima et al disclose a photosensitive material and teaches that known benzophenones include diaminobenzophenone, and equates them to the hydroxy-containing compounds as set forth by the newly amended claim 14 and 21-23 ([0013]). Examples of the benzophenone compound include 2,2′-dihydroxy-4-methoxybenzophenone, 2,2′-dihydroxy-4,4′-dimethoxydisulfobenzophenone disodium, 2,2′-dihydroxy-4,4′-. Dimethoxybenzophenone, 2,2 ′, 3,4-tetrahydroxybenzophenone, 2,2 ′, 4,4′-tetrahydroxybenzophenone, 2,2′3,4,4′-pentahydroxybenzophenone, 2,2′- Dihydroxy-4-methoxybenzophenone, 2,3,3′4,4 ′, 5′-hexahydroxybenzophenone, 2,3,4,4′-tetrahydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 2, 4,4′-trihydroxybenzophenone, 2,4,5-trihydroxybenzophenone, 2,4,6-trihydroxybenzophenone, 2,4-di Droxy-4′-diethylaminobenzophenone, 2,4-dihydroxy-4′-dimethylaminobenzophenone, 2,4-dihydroxybenzophenone, 4,4′-dihydroxybenzophenone, 2-hydroxy-4- (2-hydroxy-3-methacryloxy ) Propoxybenzophenone, 2-hydroxy-4'-dimethylaminobenzophenone, 2-hydroxy-4-i-octyloxybenzophenone, 2-hydroxy-4-n-octyloxybenzophenone, 2-hydroxy-4-octyloxybenzophenone, 2 -Hydroxy-4-acetoxyethoxybenzophenone, 2-hydroxy-4-octadecyloxybenzophenone, 2-hydroxy-4-dodecyloxybenzophenone, 2-hydroxy-4-methoxy-2'-carboxybe Zophenone, 2-hydroxy-4-methoxy-5-sulfobenzophenone, 2-hydroxy-4-methoxybenzophenone, 2-hydroxybenzophenone, 4,4'-dihydroxybenzophenone, 4,4'-bis (diethylamino) benzophenone, 4, 4′-bis (dimethylamino) benzophenone, 4 ′, 6-dihydroxy-2-naphthobenzophenone, 4-dodecyloxy-2-hydroxybenzophenone, 4-hydroxybenzophenone, N, N, N ′, N′-tetramethyl- Examples include 4,4′-diaminobenzophenone. Among these, 2,3,4-trihydroxybenzophenone, 2,4-dihydroxybenzophenone, 2-hydroxy-4-n-octyloxybenzophenone and 2-hydroxy-4-methoxybenzophenone can be preferably used. The reference teaches each compound as set forth by the instant claims 21-23, and teaches their equivalence to the diamino type benzophenone disclosed by the primary reference. Given the teachings of the references, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Nankawa et al choosing as the choosing as the benzophenone UV absorber, that taught by Ushijima et al to be known and equivalent to those suggested by the primary reference Response to Arguments Applicant’s arguments with respect to claim(s) 14-20 (and now 21-23) have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Conclusion Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to AMANDA C WALKE whose telephone number is (571)272-1337. The examiner can normally be reached Monday to Thursday 5:30am to 4pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Niki Bakhtiari can be reached at 571-272-3433. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AMANDA C. WALKE/Primary Examiner, Art Unit 1722
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Prosecution Timeline

Feb 01, 2023
Application Filed
Oct 06, 2025
Non-Final Rejection — §103
Jan 07, 2026
Response Filed
Mar 12, 2026
Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
88%
Grant Probability
97%
With Interview (+8.2%)
2y 7m
Median Time to Grant
Moderate
PTA Risk
Based on 1681 resolved cases by this examiner. Grant probability derived from career allow rate.

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