Prosecution Insights
Last updated: April 19, 2026
Application No. 18/072,773

REACTANT VAPOR DELIVERY SYSTEMS FOR SEMICONDUCTOR PROCESSING TOOLS AND METHODS

Final Rejection §103
Filed
Dec 01, 2022
Examiner
ZERVIGON, RUDY
Art Unit
1716
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Asm Ip Holding B V
OA Round
2 (Final)
66%
Grant Probability
Favorable
3-4
OA Rounds
3y 3m
To Grant
60%
With Interview

Examiner Intelligence

Grants 66% — above average
66%
Career Allow Rate
691 granted / 1046 resolved
+1.1% vs TC avg
Minimal -6% lift
Without
With
+-6.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 3m
Avg Prosecution
49 currently pending
Career history
1095
Total Applications
across all art units

Statute-Specific Performance

§101
0.5%
-39.5% vs TC avg
§103
47.7%
+7.7% vs TC avg
§102
31.7%
-8.3% vs TC avg
§112
15.1%
-24.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1046 resolved cases

Office Action

§103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 103 The text of those sections of Title 35, U.S. Code not included in this action can be found in a prior Office action. Claim 1 and 4 are rejected under 35 U.S.C. 103 as being unpatentable over Nakada; Takayuki et al. (US 20190019705 A1) in view of Cho; Kuei-Hsiung et al. (US 20180151397 A1). Nakada teaches a reactor comprising: a flange (20; Figure 1; [0016] - Applicant’s 170; Figure 1) disposed between an upper chamber (14; Figure 1) and a lower chamber (4; Figure 1) of a reaction chamber (14+4; Figure 1-Applicant’s 104; Figure 1); a substrate support (26c; Figure 1,2; [0017]) configured to support a substrate on a top side of the substrate support (26c; Figure 1,2; [0017]), the substrate support (26c; Figure 1,2; [0017]) additionally configured to be vertically actuated (32; Figure 1; [0019]) between an upper position and a lower position within the reaction chamber (14+4; Figure 1); a primary gas delivery apparatus (44a; Figure 1-Applicant’s 138; Figure 1) disposed within the upper chamber (14; Figure 1) and configured to deliver gas to an upper surface of the substrate; and an elongate gas delivery apparatus (76; Figure 1-3-Applicant’s 138; Figure 1) disposed within the lower chamber (4; Figure 1) and configured to partially surround the substrate support (26c; Figure 1,2; [0017]), the delivery apparatus (44a; Figure 1-Applicant’s 138; Figure 1) configured to allow gas to pass through an interior thereof and out a plurality of apertures (“supply holes”; [0021]) in fluid communication with the interior of the delivery apparatus (44a; Figure 1-Applicant’s 138; Figure 1) - claim 1 Nakada does not teach: a primary gas delivery apparatus (44a; Figure 1-Applicant’s 138; Figure 1) comprising a showerhead (Applicant’s 138; Figure 1) – claim 1. The reactor of Claim 1, wherein the showerhead (Applicant’s 138; Figure 1) comprising a circular bottom surface and a plurality of apertures in the circular bottom surface as claimed by claim 4 Cho also teaches a vertical processing chamber (Figure 1,5) for numerous processes ([0044]) under a showerhead (72; Figure 1,5) having a circular bottom surface and a plurality of apertures in the circular bottom surface. It would have been obvious to one of ordinary skill in the art before the effective filing date of the claimed invention for Nakada to add Cho’s showerhead (72; Figure 1,5) as taught by Cho. Motivation for Nakada to add Cho’s showerhead (72; Figure 1,5) as taught by Cho is for gas “..in a thin and even distribution around the reaction chamber” as taught by Cho ([0033]). Allowable Subject Matter Claims 2-3, and 5-13 allowed. The following is an examiner’s statement of reasons for allowance: The Examiner’s expanded search confirms Nakada; Takayuki et al. (US 20190019705 A1) remains the closest prior art. Amended claim 2 is allowable at least because Nakada; Takayuki et al. (US 20190019705 A1) does not teach, alone or in combination Nakada’s elongate gas delivery apparatus (76; Figure 1-3-Applicant’s 138; Figure 1) comprising an arched segment with an angle greater than 180º, Nakada’s gas elongate delivery apparatus (76; Figure 1-Applicant’s 138; Figure 1) having an inner horizontal width (inner horizontal width of 44a; Figure 2) greater than a horizontal width of Nakada’s substrate support (26c; Figure 1,2; [0017]), and wherein Nakada’s plurality of apertures (76a; Figure 1-3) are disposed level with or above the top side of Nakada’s substrate support (26c; Figure 1,2; [0017]) when Nakada’s substrate support (26c; Figure 1,2; [0017]) is in the lower position - claim 2 Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee. Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.” Response to Arguments Applicant’s arguments, see pages 6-8, filed January 23, 2026, with respect to the rejection of claim 1 under §102 have been fully considered and are persuasive. Therefore, the rejection has been withdrawn. However, upon further consideration, a new ground(s) of rejection is made in view of Nakada; Takayuki et al. (US 20190019705 A1) in view of Cho; Kuei-Hsiung et al. (US 20180151397 A1). Conclusion The prior art made of record and relied upon and not relied upon is considered pertinent to applicant's disclosure. Arc shaped gas distribution pipe in multi-chamber systems include at least: US 20060213439 A1 US 6183564 B1 US 6409837 B1 US 20100075488 A1 Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to Examiner Rudy Zervigon whose telephone number is (571) 272- 1442. The examiner can normally be reached on a Monday through Thursday schedule from 8am through 6pm EST. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Any Inquiry of a general nature or relating to the status of this application or proceeding should be directed to the Chemical and Materials Engineering art unit receptionist at (571) 272-1700. If the examiner cannot be reached please contact the examiner's supervisor, Parviz Hassanzadeh, at (571) 272- 1435. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http:/Awww.uspto.gov/interviewpractice. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://pair-direct.uspto.gov. Should you have questions on access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative or access to the automated information system, call 800-786-9199 (IN USA OR CANADA) or (571) 272-1000. /Rudy Zervigon/ Primary Examiner, Art Unit 1716
Read full office action

Prosecution Timeline

Dec 01, 2022
Application Filed
Apr 24, 2023
Response after Non-Final Action
Oct 23, 2025
Non-Final Rejection — §103
Jan 23, 2026
Response Filed
Mar 17, 2026
Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12601062
MULTI-PORT GAS INJECTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME
2y 5m to grant Granted Apr 14, 2026
Patent 12597588
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
2y 5m to grant Granted Apr 07, 2026
Patent 12595562
HEAT TREATMENT APPARATUS
2y 5m to grant Granted Apr 07, 2026
Patent 12592363
Actively Controlled gas inject FOR PROCESS Temperature CONTROL
2y 5m to grant Granted Mar 31, 2026
Patent 12586763
SHOWER HEAD ELECTRODE ASSEMBLY AND PLASMA PROCESSING APPARATUS
2y 5m to grant Granted Mar 24, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
66%
Grant Probability
60%
With Interview (-6.1%)
3y 3m
Median Time to Grant
Moderate
PTA Risk
Based on 1046 resolved cases by this examiner. Grant probability derived from career allow rate.

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