Prosecution Insights
Last updated: July 17, 2026
Application No. 18/093,537

ADDITIVES FOR METALLIC PHOTORESIST

Final Rejection §102§103§112
Filed
Jan 05, 2023
Priority
Nov 30, 2022 — provisional 63/428,833
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
2 (Final)
77%
Grant Probability
Favorable
3-4
OA Rounds
0m
Est. Remaining
83%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
749 granted / 971 resolved
+12.1% vs TC avg
Moderate +6% lift
Without
With
+5.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
49 currently pending
Career history
1034
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
75.6%
+35.6% vs TC avg
§102
12.8%
-27.2% vs TC avg
§112
6.3%
-33.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 971 resolved cases

Office Action

§102 §103 §112
DETAILED CORRESPONDENCE This Office action is in response to the amendment received January 27, 2026. The rejection under 35 U.S.C. 103 as being unpatentable over TORIUMI et al (2009/0317742) in view of TSUCHIHASHI et al (2017/0285482) is withdrawn in view of the amendment which removes the scope which is met by the diphenylamine and the 4,4’-diaminodiphenyl ether compounds in the references. Claim Rejections - 35 USC § 112 The following is a quotation of the first paragraph of 35 U.S.C. 112(a): (a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention. The following is a quotation of the first paragraph of pre-AIA 35 U.S.C. 112: The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor of carrying out his invention. The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1, 3-7, and 9-22 are rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the written description requirement. The claim(s) contains subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor, or for applications subject to pre-AIA 35 U.S.C. 112, the inventor(s), at the time the application was filed, had possession of the claimed invention. The amendment to claim 1 inserting “one or more ligands that are detachable from the metallic core” finds no support in the specification as originally filed. Any of the bonds to the metallic core can be “detached” by various chemical reactions, and the specification does not disclose which bonds to which they are referring that are detachable. Correction to the amendment is necessary to comply with written description in the specification. Claims 1, 3-7, and 9-22 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claims 1, 17 and 19 as amended recite a confusing and indefinite structures in Formula (1) and Formula (2), when the variables “x” defined to be 0 to 6 and “y” defined to be 1 to 6 are greater than 2. Likewise in Formula (2) when “x” and “j” defined as 0 to 6 and “y” and “k” defined as 1 to 6 become confusing and indefinite when the value is greater than 2. Because there are no compounds which have more than 2 repeating units of the same functional group as claimed. For example, in Formula (1), if the value for “x” is 3 then we expect a repeating structure defined for “L” like -L-L-L and if selected to be “-S-“ then we arrive at a structure of -S-S-S- which not a real structure. Any of the functional groups in repeating units of three or more directly bonded to one another is not a known compound with the only exception being the alkyl groups. Correction is necessary unless applicants can provide evidence of repeating units having 3 or greater units in a row as defined in claims 1, 17 and 19. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 1, 3-7, 9-16, 19, 20, and 22 are rejected under 35 U.S.C. 103 as being unpatentable over KOH et al (2021/0380612) and/or MOON et al (2022/0194968). The claimed invention recites the following: PNG media_image1.png 714 674 media_image1.png Greyscale PNG media_image2.png 866 718 media_image2.png Greyscale PNG media_image3.png 722 720 media_image3.png Greyscale PNG media_image4.png 68 610 media_image4.png Greyscale PNG media_image5.png 860 674 media_image5.png Greyscale PNG media_image6.png 234 690 media_image6.png Greyscale KOH et al report a photoresist composition comprising an organometallic nanoparticle, and/or an organometallic cluster, as reported on page 1, para [0015] to [0025] for a metal core bonded to a ligand by an ionic bond, a covalent bond, a metallic bond, and/or van der Waals bond. Applicants are further directed to page 7, para. [0069] wherein the developer used in the pattern forming method include compounds which meet the claimed additive in claim 1 as a developer, such as methyl benzoate and ethyl benzoate as seen below: PNG media_image7.png 322 382 media_image7.png Greyscale The working examples lack the use of methyl benzoate or ethyl benzoate, however because of the equivalence disclosed by KOH et al, the one would expect same or similar results when developing the photoresist with any of the listed developers. MOON disclose a semiconductor photoresist composition comprising organotin compounds of the following formula: PNG media_image8.png 344 362 media_image8.png Greyscale The photoresist composition comprises a solvent which can be used such as anisole as reported on page 4, para. [0067] shown here: PNG media_image9.png 182 384 media_image9.png Greyscale Anisole meets the structure of Formula 1 in claim 1 when L is “-O-“ and R is methyl. (variables x is 1 and y is 1). The reference lack as working example using anisole as a solvent, however each of listed solvents is disclosed would be seen as equivalent to PGMEA and can be substituted in for PGMEA in Examples 1 to 5 expecting same or similar results. Claims 3-7 are met by MOON et al when the solvent is xylene or toluene. These compounds met Ar as phenyl, x is zero, R is a saturated hydrogen, have MW of less than 220 and are xylene or toluene, see para. [0067] in MOON above. Claims 9 – 11 are rejected as further defining Formula 2 which is an alternative additive in claim 1 which has been rejected. Claim 12 is met by xylene or toluene in MOON having a MW of about 78 to 780. Claims 13-15 further limit the (B) option for the additive in a treatment solution which can be seen as a developer and/or is rejected wherein claim 1 has been rejected on option (A). It would have been prima facie obvious to one of ordinary skill in the art of organometallic containing photosensitive composition to use methyl benzoate or ethyl benzoate as a developer in KOH et al and/or use anisole as a solvent for the photoresist composition in MOON with the reasonable expectation of same or similar results for improved resolution etch resistance and sensitivity as reported in both KOH et al and MOON. Claims 17-18 and 21 would be allowable upon correcting the indefiniteness for Formula 1 and 2 as seen above in paragraph 6 to the 35 U.S.C. 112 (b) rejection. None of the prior art references of record disclose the claimed treating the photoresist layer with a treatment solution containing an additive as recited in the method of claim 17. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. OUYANG et al (2021/0080832) is cited of interest wherein performing an infiltration step of introducing a metallic compound into the photoresist composition after coating the photoresist composition on a substrate. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu May 15, 2026
Read full office action

Prosecution Timeline

Jan 05, 2023
Application Filed
Sep 30, 2025
Non-Final Rejection mailed — §102, §103, §112
Jan 27, 2026
Response Filed
May 19, 2026
Final Rejection mailed — §102, §103, §112
Jun 18, 2026
Interview Requested
Jun 30, 2026
Applicant Interview (Telephonic)
Jun 30, 2026
Examiner Interview Summary

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
77%
Grant Probability
83%
With Interview (+5.6%)
2y 11m (~0m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 971 resolved cases by this examiner. Grant probability derived from career allowance rate.

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