Prosecution Insights
Last updated: April 19, 2026
Application No. 18/095,235

RESIST COMPOSITION AND PATTERN FORMING PROCESS

Final Rejection §102§103
Filed
Jan 10, 2023
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Shin-Etsu Chemical Co. Ltd.
OA Round
2 (Final)
77%
Grant Probability
Favorable
3-4
OA Rounds
3y 1m
To Grant
82%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allow Rate
740 granted / 959 resolved
+12.2% vs TC avg
Moderate +5% lift
Without
With
+5.1%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
65 currently pending
Career history
1024
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
48.2%
+8.2% vs TC avg
§102
29.9%
-10.1% vs TC avg
§112
12.1%
-27.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 959 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the amendment received November 13, 2025. The rejection under 35 U.S.C. 102(a) (2) as being clearly anticipated by AQAD et al (12,140,866) is withdrawn in view of the arguments which note that the anticipation rejection is not met due to the secondary carbon atom disclosed in the prior art wherein R3 and R4 are C1 – C12 hydrocarbyl groups. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 1-15 are rejected under 35 U.S.C. 103 as being unpatentable over HATAKEYAMA et al (2020/0393760) in view of AQAD et al (12,140,866) and/or LABEAUME et al (2015/00093709). The claimed invention continues to recite the following: PNG media_image1.png 798 612 media_image1.png Greyscale HATAKEYAMA et al discloses photoresist composition comprising the use of acid generating units in the base polymer used in photoresist compositions, see Polymer 2 on page 120 below: PNG media_image2.png 684 348 media_image2.png Greyscale HATAKEYAMA et al lack a working example using the claimed photoacids of formula (1). AQAD et al discloses a similar compound at column 70, lines 45-63 shown here lacking the tertiary carbon bonded to the iodine-substitute phenyl group shown below: PNG media_image3.png 244 554 media_image3.png Greyscale Example 28 and 33 in Tables 2 and 3, respectively is shown in a working example the claimed resist composition comprising a base resin and a solvent, see below: PNG media_image4.png 356 470 media_image4.png Greyscale PNG media_image5.png 282 472 media_image5.png Greyscale Claims 2 and 3 are met by the compound above. Claim 4 and 5 are met by Example 28 and 33 above. Claim 6 and 7 are is met by P1 and the Examples 28 and 33: PNG media_image6.png 210 352 media_image6.png Greyscale No claims above are allowed. Claims 10 and 11 are met by the disclosure in column 79, line 60- column 82, line 82, line 50. LABEAUME et al report acid generators of the following formula meeting the claimed structure of Formula (1), meeting claims 1, 2, 4-7 as seen on page 6 and 8, respectively. PNG media_image7.png 180 278 media_image7.png Greyscale PNG media_image8.png 204 318 media_image8.png Greyscale Claims 4-8 are met by the resin in HATAKEYAMA et al Claim 9 to a surfactant is met by page 18, para. [0116] in LABEAUME as suitable additives in the composition. Claims 10 and 11 to the method are met by in LABEAUME in Example 13, page 22, para. [0149], below: It would have been prima facie obvious to one of ordinary skill in the art of photosensitive composition to use any of the disclose photoacids of AQAD such as PAG A7 wherein LABEAUME also show that tertiary carbon groups may be bonded to the Ar ring in place of the secondary carbon atom in PAG A7 with the reasonable expectation of same or similar results for high sensitivity, resolution and improved CDU in a photoresist composition. The rejection is repeated wherein the evidence submitted under Rule 132 has been considered, however the evidence not of proper scope, weight and character wherein the closest prior art compounds not compared would be the sulfonium cation of PAG-A7 from AQAD et al having an iodine substituted phenyl group on the end bonded to a secondary carbon atom shown below which is very close to the claimed tertiary carbon at the same location: PNG media_image9.png 246 566 media_image9.png Greyscale Claims 12-15 are met by the disclosure in para. [0100] of HATAKEYAMA et al wherein the anions disclosed meet the compounds recited in claim 13 and would be seen as conventional anion groups that can be paired with the cations of those known in AQAD with a tertiary carbon atom. Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu December 1, 2025
Read full office action

Prosecution Timeline

Jan 10, 2023
Application Filed
Jul 11, 2025
Non-Final Rejection — §102, §103
Nov 13, 2025
Response Filed
Nov 13, 2025
Response after Non-Final Action
Dec 01, 2025
Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Patent 12547074
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
77%
Grant Probability
82%
With Interview (+5.1%)
3y 1m
Median Time to Grant
Moderate
PTA Risk
Based on 959 resolved cases by this examiner. Grant probability derived from career allow rate.

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