Prosecution Insights
Last updated: April 19, 2026
Application No. 18/159,808

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD

Final Rejection §103
Filed
Jan 26, 2023
Examiner
WALKE, AMANDA C
Art Unit
1722
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Shin-Etsu Chemical Co. Ltd.
OA Round
2 (Final)
88%
Grant Probability
Favorable
3-4
OA Rounds
2y 7m
To Grant
97%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allow Rate
1488 granted / 1681 resolved
+23.5% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
52 currently pending
Career history
1733
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
51.0%
+11.0% vs TC avg
§102
23.1%
-16.9% vs TC avg
§112
15.2%
-24.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1681 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Objections Claim 1 is objected to because of the following informalities: The formulas in claim 1 are too light to be clearly seen for examination and for printing. Claim 1 should be amended to darken the drawing so that each structure is clear. Appropriate correction is required. Specification The disclosure is objected to because of the following informalities: The structures in the abstract, on page 5, 15, 20, 21, 23, 27-39, 43-46, 82-84, 89-96, 106-110, 148-151, 153, 154, Table 2 on page 152, Table 3 on page 155, Table 4 on page 156, Table 5 on page 159, Table 6 on page 160, Table 7 on page 162, Table 8 on page 163, are all very light. Some structures are so light that they are missing lines in phenyl rings or bonds, or the structures and the date in the tables are too light to clearly read. Appropriate correction is required. The abstract of the disclosure is objected to because the structures are too light to be seen. Similar to the claims and specification, there are missing bonds and must be corrected. A corrected abstract of the disclosure is required and must be presented on a separate sheet, apart from any other text. See MPEP § 608.01(b). Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-19 is/are rejected under 35 U.S.C. 103 as being unpatentable over Sasami et al (2020/0218154) in view of Fujii et al (2020/0159118). Sasami et al disclose a resist composition and polymer wherein the polymer comprises a unit similar to that of the instant formula (A-1) having an acid-labile group. In the reference formula (a-1), the group Y is a group falling within the scope of the instant claims, wherein RB and RC join to form a ring, n4 is 0. The reference formula and definitions are broad, and the reference does not specify the suitable substituents for the group. PNG media_image1.png 302 298 media_image1.png Greyscale PNG media_image2.png 96 98 media_image2.png Greyscale Fujii et al disclose a resist composition and polymer wherein the polymer comprises a unit similar to that of the instant formula (A-1) having an acid-labile group. PNG media_image3.png 170 316 media_image3.png Greyscale PNG media_image4.png 84 320 media_image4.png Greyscale PNG media_image5.png 102 322 media_image5.png Greyscale In the formula, which is similar in structure to the monomer of Sasami et al discussed above, Rx01 is a structure is (a01-r-2), wherein Xaa is a cyclic group and Ra04 is a benzene, naphthalene, or anthracene (wherein instant n4 is 0-2), and the ring my be substituted by an alkyl group, -OH group, carboxyl group, halogen, or alkoxy ([0134]).The broader teachings of the reference for the substituents include preferably fluorine as the halogen and fluorinated alkyl ([0104]-[0106], [0094]-[0098]).A fluorine or florinated allyl would have been contemplated by one or ordinary skill in the art, and also any of the other of the six total categories, including -OH (instant claims 3 and 4). Therefore, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Sasami et al, choosing as the ring of the monomer of formula (a-1), choosing as the aromatic ring, that as taught by Fujii et al wherein the ring may be one wherein the instant n4 is 0-2, and wherein at least a -OH substituent is present, give the six types of substituents one of ordinary skill in the art would have been motivated to select a -OH group. The resultant monomer would meet the limitations of the instant formula (A-1) and (A-2) (instant claims 1, 2, and 12). The polymer of Sasami et al further comprises a monomeric unit meeting the limitations of the instant (B-1), (B-2), and (B-4): PNG media_image6.png 46 302 media_image6.png Greyscale PNG media_image7.png 260 324 media_image7.png Greyscale PNG media_image8.png 352 330 media_image8.png Greyscale PNG media_image9.png 202 280 media_image9.png Greyscale PNG media_image10.png 180 268 media_image10.png Greyscale Monomers preferred by the reference are preferred and used in the examples of the instant specification. Wherein the cation includes structures falling within the scope of the instant cation-1 and cation-2, with exemplified cations being used in the instant examples (instant claims 5-8). PNG media_image11.png 134 134 media_image11.png Greyscale PNG media_image12.png 62 178 media_image12.png Greyscale Reference monomer (a2) falls within the scope of the additional monomer having an acid-labile group according to the instant formula (a-2), wherein the R9 to R11 do no comprise a fluorine atom or aromatic ring (instant claim 9): PNG media_image13.png 314 268 media_image13.png Greyscale PNG media_image14.png 346 136 media_image14.png Greyscale The reference resist further includes a unit (b-1) having a -OH group, wherein ZB may be an ester of single bond as required by the instant formula (C-1) of instant claim 10: PNG media_image15.png 378 292 media_image15.png Greyscale PNG media_image16.png 136 152 media_image16.png Greyscale PNG media_image17.png 96 98 media_image17.png Greyscale The reference resist further comprises a unit having a lactone group as required by the instant claim 11, instant formula (D-1). PNG media_image18.png 148 314 media_image18.png Greyscale PNG media_image19.png 332 314 media_image19.png Greyscale The resist further comprises an organic solvent (see examples; instant claim 13), a photoacid generator (see examples; instant claim 14), a nitrogen-containing compound/ quencher (examples; instant claim 15), and a surfactant ([0094]-[0097]; instant claim 16). The pattern forming method of the reference includes the steps as set forth by the instant claims 17-19, wherein the composition is coated onto a substrate, dried/ pre-baked, exposed to radiation including KrF and EUV, and developed ([0111]-[0113]). Claim(s) 1-20 is/are rejected under 35 U.S.C. 103 as being unpatentable over Fujii et al in view of Sasami et al. Fujii et al and Sasami et al have been discussed above. Fujii et al teach a resist composition capable of begun developed by alkali (TMAH) solution or solvent development. The resist comprises a polymer, acid generator, solvent, surfactant, and a quencher (see examples, claims; instant claims 12-15). The polymer comprises units meeting the limitations of the instant (A-1) as discussed above, and further teaches units of the instant formulas (C-1) and (D-1) ( comprising an aromatic ring with an -OH group, and a lactone; instant claims 10, 11): PNG media_image20.png 320 304 media_image20.png Greyscale The reference further teaches a unit (a1) is included, which comprises a structure of the instant (a-1) of the instant claim 9: PNG media_image21.png 212 308 media_image21.png Greyscale PNG media_image22.png 142 586 media_image22.png Greyscale The acid generator disclosed by the reference is broad, and is not particularly limited, and the resin may include additonal units ([0449]-0452]). The reference further teaches the cations preferably have a strcuture falling within the scope of the instant claims 5-8 ([0518], examples), and more than one may be used ([0547]). The reference fails to specifically teach the monomer comprising the acid generator as claimed. However, as discusseda bove, Sasami et al teach the inclusion ofone acid generating compound intothe polymer, and an additional acid generator. The aniosn andcation have strucutre meeting the instanmt formulas, and have strucutres falling within the teachings of Fujiiet al. The reference teaches that an improvement in line edge roughness (LER), an decreased acid diffusion ([0050]). The reference includes the acid generator into a polymer having units similar to that of Fujii et al. Therefore, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the materials of Fujii et al, choosing as one acid generator, that taught by Sasami et al to improve the uniformity and LER of the resist pattern. The method of forming a resist includes the steps as claimed, and teaches that either an alkali developing or solvent developing process may be used (instant claims 17-20): PNG media_image23.png 108 354 media_image23.png Greyscale PNG media_image24.png 188 328 media_image24.png Greyscale Response to Arguments Applicant's arguments filed 12/3/2025 have been fully considered but they are not persuasive. Applicant has submitted an additional copy of the specification, but not the claims. The claimed formulas are still too light to see the bonds clearly to be printed and must be corrected. PNG media_image25.png 164 356 media_image25.png Greyscale In the newly submitted specification, the compounds are still light and it is difficult to clearly see many of the compounds and bonds clearly (especially the rings, the substituents are in a darker print as easier to see). A clearer copy must be submitted prior to allowance. PNG media_image26.png 336 412 media_image26.png Greyscale As an examples, (A-2) on page 8 is clear. The above cited (A-1), (B-1), and (B-2) are on page 5 are not (also [0046]). Further examples (not all compounds, just a sample of them with light or missing bonds or missing -O-alkyl group) appear below. PNG media_image27.png 118 96 media_image27.png Greyscale PNG media_image28.png 120 428 media_image28.png Greyscale PNG media_image29.png 132 202 media_image29.png Greyscale PNG media_image30.png 100 104 media_image30.png Greyscale Applicant has argued that the cited references fail to teach that the unit of formula (A-1) “comprises one or two hydroxyl groups (that is, in formula (A-1), “n1” represents an integer of 1 or 2”, and that the Fujii reference makes no mention of the number of hydroxyl groups as substituents.” (response, page 5, paragraphs 2 and 3). The office notes that the presence of a hydroxyl substituent inherently indicates that n1 is (at least) 1, with one hydroxyl substituent present. Clearly the presence of a hydroxyl substituent means that there is at least one substituent present on the ring and n1 is one. One of ordinary skill in the art would immediately recognize that that n1 would be 1. Exemplified rings include a single substituent (alkyls, page 9 of Fujii), further leading to the presence of one substituent with n1 being 1. Applicant has also argued on page 10 that the higher sensitivity and higher contrast sought by applicant by the inclusion of the monomer is not recognized by the references, however, the references do not need to add a compound to a composition for the same reason or to solve the same problem as applicant. In the chemical arts, a compound (polymer, salt, organic compound, dye, etc.) may be added to a material for a difference purpose, but one of skill in the art would expect the inclusion to result in the same properties as a compound of the same structure would possess the same properties regardless of the reason for addition. Therefore, the arguments are unpersuasive and the rejections are maintained. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to AMANDA C WALKE whose telephone number is (571)272-1337. The examiner can normally be reached Monday to Thursday 5:30am to 4pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Niki Bakhtiari can be reached at 571-272-3433. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AMANDA C. WALKE/Primary Examiner, Art Unit 1722
Read full office action

Prosecution Timeline

Jan 26, 2023
Application Filed
Aug 30, 2025
Non-Final Rejection — §103
Dec 03, 2025
Response Filed
Feb 12, 2026
Final Rejection — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
88%
Grant Probability
97%
With Interview (+8.2%)
2y 7m
Median Time to Grant
Moderate
PTA Risk
Based on 1681 resolved cases by this examiner. Grant probability derived from career allow rate.

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