Prosecution Insights
Last updated: April 19, 2026
Application No. 18/231,547

MANUFACTURING METHOD OF DIAMOND COMPOSITE WAFER

Final Rejection §102
Filed
Aug 08, 2023
Examiner
ERDEM, FAZLI
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Etron Technology Inc.
OA Round
2 (Final)
85%
Grant Probability
Favorable
3-4
OA Rounds
2y 7m
To Grant
99%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allow Rate
895 granted / 1050 resolved
+17.2% vs TC avg
Strong +16% interview lift
Without
With
+15.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 7m
Avg Prosecution
32 currently pending
Career history
1082
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
48.4%
+8.4% vs TC avg
§102
39.1%
-0.9% vs TC avg
§112
7.4%
-32.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1050 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Response to Arguments Applicant's arguments filed 1/28/2026 have been fully considered but they are not persuasive. Furthermore, during the updated search examiner discovered further potential prior art references such as (2011040126 (Gaul et al) (Fig. 4, paragraph 0022), Hobart et al. (20150348866) and Yu (20210407942) which could also read on claims. Furthermore, examiner is in the opinion that incorporation of limitations from paragraph 0213 of the instant application as published i.e. 20240047192, could potentially put the application in condition for an allowance. Examiner, kindly requests the applicant to schedule for an interview for further explanation Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-14 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Xu et al. (20160233141) Regarding Claim 1, in Figs. 1A-5 and paragraphs 0043, 0076 and 0077, Xu et al. discloses a method to process a diamond composite wafer 2/4/6/16, comprising:(a) forming a plurality of through vias 6 in the diamond composite wafer and a first re-distribution layer 20-1 on a first side of the diamond composite wafer;(b) attaching a temporary carrier to the first re-distribution layer, and forming a second re-distribution layer on a second side of the diamond composite wafer (Figs. 1C and 1D); (c) releasing the temporary carrier to form a circuit containing diamond composite wafer (Figs. 4, 5 6). Regarding Claim 2, in Xu et al, the diamond composite wafer comprises a semiconductor substrate with a predetermined diameter and a plurality of diamond blocks 4 on the semiconductor substrate. Regarding Claim 3, in Xu et al, the semiconductor substrate comprises a plurality of semiconductor blocks 10 consolidated into the predetermined diameter. Regarding Claim 4, forming a plurality of IC circuits in the semiconductor substrate (see paragraph 0077) Regarding Claim 5, the first re-distribution layer is formed on the semiconductor substrate, and the second re-distribution layer is formed on the plurality of diamond blocks (see paragraphs 0076, 0077, and 0079) Regarding Claim 6, dicing the circuit containing diamond composite wafer into a plurality of circuit containing composite block, each circuit containing composite block comprising one of the diamond blocks and a semiconductor block diced from the semiconductor substrate (see paragraph 0077(. Regarding Claim 7, each of the plurality of through vias comprises an electrical via (i.e. metal), an optical via, a thermal via and/or a fluidic via. Regarding Claim 8, the first re-distribution layer and/or the second re-distribution layer comprises an electrical interconnection or an optical waveguide (see paragraph 0076, 0077 and 0079). Regarding Claim 9, in Figs. 1A-5, the diamond composite wafer comprises a first semiconductor substrate with a predetermined diameter, a plurality of diamond blocks on the first semiconductor substrate, and a second semiconductor substrate with the predetermined diameter on the first semiconductor substrate. Regarding Claim 10, in paragraphs 0076, 0077 and 0079, the first re-distribution layer is formed on the first semiconductor substrate, and the second re-distribution layer is formed on the second semiconductor substrate. Regarding Claim 11, in paragraph 0077, dicing the circuit containing diamond composite wafer into a plurality of circuit containing composite block, each circuit containing composite block comprising one of the diamond blocks, a first semiconductor block diced from the first semiconductor substrate, and a second semiconductor block diced from the second semiconductor substrate. Regarding Claim 12, in Figs. 1A-5, the diamond composite wafer comprises a plurality of diamond blocks consolidated into a predetermined diameter. Regarding Claim 13, in paragraph 0076, 0077 and 0079, first re-distribution layer and the second re-distribution layer are formed on different sides of the plurality of diamond blocks consolidated with the predetermined diameter Regarding Claim 14, in paragraph 0077, dicing the circuit containing diamond composite wafer into a plurality of circuit containing composite block, each circuit containing composite block comprising one of the diamond blocks. Conclusion THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to FAZLI ERDEM whose telephone number is (571)272-1914. The examiner can normally be reached M-F, 8am-5pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Davienne Monbleau can be reached at 571-272-1945. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /FAZLI ERDEM/Primary Examiner, Art Unit 2812 3/1/2026
Read full office action

Prosecution Timeline

Aug 08, 2023
Application Filed
Oct 29, 2025
Non-Final Rejection — §102
Jan 28, 2026
Response Filed
Mar 01, 2026
Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
85%
Grant Probability
99%
With Interview (+15.9%)
2y 7m
Median Time to Grant
Moderate
PTA Risk
Based on 1050 resolved cases by this examiner. Grant probability derived from career allow rate.

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