Prosecution Insights
Last updated: April 19, 2026
Application No. 18/250,740

Wear Compensating Confinement Ring

Non-Final OA §103
Filed
Apr 26, 2023
Examiner
KACKAR, RAM N
Art Unit
1716
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Lam Research Corporation
OA Round
1 (Non-Final)
39%
Grant Probability
At Risk
1-2
OA Rounds
4y 0m
To Grant
98%
With Interview

Examiner Intelligence

Grants only 39% of cases
39%
Career Allow Rate
197 granted / 501 resolved
-25.7% vs TC avg
Strong +59% interview lift
Without
With
+58.9%
Interview Lift
resolved cases with interview
Typical timeline
4y 0m
Avg Prosecution
35 currently pending
Career history
536
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
56.1%
+16.1% vs TC avg
§102
14.1%
-25.9% vs TC avg
§112
23.5%
-16.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 501 resolved cases

Office Action

§103
DETAILED ACTION The present application, filed on (4/26/2023), is being examined under the first inventor to file provisions of the AIA . Claims (1-21) are pending and being examined. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claims 1-21 are rejected under 35 U.S.C. 103 as being unpatentable over Michael Kellogg (US 20150044873) in view of Lee et al (US 20110042009) and Sugiyama et al (US 6733620). Michael Kellogg discloses a confinement ring (305); a lower horizontal section (305c); a downwardly extending section (335); radially extending slots (226); each of the slots preferably having a length of at least 1.0 inch, and a width of about 0.01 to 0.2 inch; upper horizontal section (305a); a vertical section (305b) extending downwardly from an outer end of the upper annular section (305a) (see paragraphs 15-17, and Fig 2B). Michael Kellogg does not disclose "an inner slot radius of each slot at the inner diameter is less than an outer slot radius of each slot at the outer diameter" Lee et al disclose a baffle plate including first vents (22) parts through which reaction gas passes. Lee teaches that vents (22) are not limited to a slot shape, and may be formed in various shapes considering a plasma environment condition (see paragraphs 56-57, and figure 2). The slots appear to be tapered as in Fig 3. However, Sugiyama et al disclose tapered slot more explicitly (Fig 11). It is noted that the claim 1 requires slot radius smaller at the near diameter. This effectively a tapered slot with rounded edges. Sugiyama et al discloses taper more explicitly in Fig 11 while rounded edge is disclosed in Fig 4A or 4B. Therefore, having claimed shape for plasma spatial environment control would have been obvious. Regarding claims 2 and 10 the taper as defined by the radius is discussed above. Regarding claims 3, 5 and 13 inner upper radius is greater. Regarding claims 4 and 14, step is disclosed in 2A and 2B. Regarding claim 6 slot length is disclosed more than 1.0 inch (Para 17). Regarding claims 7 and 15 fastening holes are disclosed at 338 in Michael Kellogg. Regarding claims 8 and 16 lower extension 335 of horizontal section sits on outer ring 400 (Fig 2A). Regarding claim 9 and 12 the confinement ring is a C shaped structure in Kellogg. Regarding claim 11 limitations additional to those of claim 1 are Upper and lower electrodes and ground ring. These are however disclosed in Kellogg as chamber (300), upper electrode (303), lower electrode (317) and ground ring (400). Regarding claim 17 the confinement ring contains silicon (Abstract). Regarding claims 18 and 19 the dimensions of the confinement ring are made according to the gap between the upper and lower electrode in order to confine the plasma therein (Para 32). Regarding claim 20 extension section is integral with lower horizontal section in Kellogg. Regarding claim 21the slots provide for evacuation of gas during processing (Para 5). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Chen et al (US 20200051792) discloses a similar confinement ring (Fig 1 and 2A). Canniff (US 20180040479) discloses another similar confinement ring (Fig 2). Kellogg et al (US 2012000608) discloses another similar confinement ring (Fig 4A-4C). Any inquiry concerning this communication or earlier communications from the examiner should be directed to RAM N KACKAR whose telephone number is (571)272-1436. The examiner can normally be reached 09:00 AM-05:00 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Parviz Hassanzadeh can be reached at 5712721435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. RAM N. KACKAR Primary Examiner Art Unit 1716 /RAM N KACKAR/Primary Examiner, Art Unit 1716
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Prosecution Timeline

Apr 26, 2023
Application Filed
Feb 06, 2026
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12603251
HYBRID CHAMBER
2y 5m to grant Granted Apr 14, 2026
Patent 12597586
PLASMA PROCESSING APPARATUS AND MATCHING METHOD
2y 5m to grant Granted Apr 07, 2026
Patent 12594577
ROTARY REACTOR FOR DEPOSITION OF FILMS ONTO PARTICLES
2y 5m to grant Granted Apr 07, 2026
Patent 12571097
LIQUID SOURCE VAPORIZATION APPARATUS, CONTROL METHOD FOR A LIQUID SOURCE VAPORIZATION APPARATUS AND PROGRAM RECORDING MEDIUM ON WHICH IS RECORDED A PROGRAM FOR A LIQUID SOURCE VAPORIZATION APPARATUS
2y 5m to grant Granted Mar 10, 2026
Patent 12555748
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2y 5m to grant Granted Feb 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
39%
Grant Probability
98%
With Interview (+58.9%)
4y 0m
Median Time to Grant
Low
PTA Risk
Based on 501 resolved cases by this examiner. Grant probability derived from career allow rate.

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