Last updated: May 29, 2026

Lam Research Corporation

95 pending office actions • 36 art units • 75 examiners • 0 of 95 (0%) have an AI response strategy ready • 230 patents granted in the last 365 days

Portfolio Summary

Total Pending OAs

Non-Final OAs

Final Rejections

Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 95 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

Overdue

Due this week

Due this month

Due in next 60 days

Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 95 of the docket's apps have a known mailing date.

Overdue (52)Due ≤ 7 days (2)Due ≤ 30 days (27)Due ≤ 60 days (8)Due later (6)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

Hard (2%)

Medium (86%)

Easy (7%)

Unknown (4%)

Rejection Statute Mix

Bucket	Cases
§101 only	2 (2%)
§103 only	76 (80%)
§102 only	4 (4%)
§112 only	7 (7%)
Double-patenting + other	2 (2%)
No statute on record	4 (4%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

Life Sciences

59% of docket

Information Tech

1% of docket

Communications

1% of docket

Semiconductors

28% of docket

Mechanical / Eng

11% of docket

Business / Other

0% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

950 h

Manual time on pending OAs

190 h

Time saved (low, 20%)

332 h

Time saved (mid, 35%)

8.3 wks

FTE-weeks freed (mid)

Top Examiners on this docket

Examiner	Apps on this docket	Allow rate	Interview lift
KENDALL, BENJAMIN R	3	32.8%	+22.7%
LAOBAK, ANDREW KEELAN	3	78.4%	+31.3%
REYES, JOSHUA NATHANIEL PI	3	42.2%	+51.6%
MCCLURE, CHRISTINA D	2	29.4%	+34.6%
CHEN, BRET P	2	84.2%	+16.7%
BENNETT, CHARLEE	2	57.6%	+36.1%
CHAN, LAUREEN	2	58.1%	+54.7%
SWEELY, KURT D	2	53.2%	+34.4%
NUCKOLS, TIFFANY Z	2	44.0%	+40.0%
TUROCY, DAVID P	2	46.7%	+36.3%

Quick Wins (2)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.

App #	Title	Examiner	Due in
18837560	LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS	CHEN, BRET P	22d
18721457	CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILANE PRECURSORS	CHEN, BRET P	84d

Hard Cases (4)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 4 ordered by deadline are shown.

App #	Title	Examiner	Due in
18847683	REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES	MCCLURE, CHRISTINA D	77d overdue
18034834	SUBSTRATE PROCESSING SYSTEM TOOLS FOR MONITORING, ASSESSING AND RESPONDING BASED ON HEALTH INCLUDING SENSOR MAPPING AND TRIGGERED DATALOGGING	BAHLS, JENNIFER E. S.	35d overdue
18011445	Systems and Methods for Analyzing and Intelligently Collecting Sensor Data	GO, RICKY	22d
18847173	SEAM-FREE AND CRACK-FREE DEPOSITION	MCCLURE, CHRISTINA D	40d

Interview Candidates (23)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #	Title	Examiner	Due in
18002788	ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE WITH SELECTIVITY TO A DIELECTRIC	LAOBAK, ANDREW KEELAN	120d overdue
18001590	REMOVAL OF TIN OXIDE IN CHAMBER CLEANING	LAOBAK, ANDREW KEELAN	111d overdue
18247060	DEPOSITION RATE ENHANCEMENT OF AMORPHOUS CARBON HARD MASK FILM BY PURELY CHEMICAL MEANS	TUROCY, DAVID P	100d overdue
17593117	PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING	REYES, JOSHUA NATHANIEL PI	91d overdue
17821107	ATOMIC LAYER ETCHING AND SMOOTHING OF REFRACTORY METALS AND OTHER HIGH SURFACE BINDING ENERGY MATERIALS	NUCKOLS, TIFFANY Z	86d overdue
18847683	REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES	MCCLURE, CHRISTINA D	77d overdue
18002289	MULTI-STATION PROCESSING TOOLS WITH STATION-VARYING SUPPORT FEATURES FOR BACKSIDE PROCESSING	BENNETT, CHARLEE	49d overdue
17927297	ATOMIC LAYER DEPOSITION COATED POWDER COATING FOR PROCESSING CHAMBER COMPONENTS	KENDALL, BENJAMIN R	45d overdue

Top Art Units

Art Unit	Apps
1716	19
1718	18
1713	7
1717	4
3753	3
2844	3
1794	3
2896	3
2842	2
2838	2

Pending Office Actions

App #	Title	Examiner	Art Unit	Statutes	Status	Due in	AI	Filed
18865913	THROTTLE VALVE FOR SUBSTRATE PROCESSING SYSTEMS	JELLETT, MATTHEW WILLIAM	3753	§103	Non-Final OA	43d overdue	Pending	Nov 14, 2024
18936877	UNIFORMITY CONTROL CIRCUIT FOR IMPEDANCE MATCH	HOUSTON, ADAM D	2842	Other	Non-Final OA	22d	Pending	Nov 04, 2024
18932475	VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS	MAYY, MOHAMMAD	1718	§103	Non-Final OA	31d overdue	Pending	Oct 30, 2024
18928852	Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System	KAISER, SYED M	2831	Other	Non-Final OA	5d overdue	Pending	Oct 28, 2024
18854754	HEAT GUARD	WANG, XIAOBEI	1784	§112	Non-Final OA	20d	Pending	Oct 07, 2024
18847683	REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES	MCCLURE, CHRISTINA D	1718	§103	Non-Final OA	77d overdue	Pending	Sep 17, 2024
18847652	LOW-K DIELECTRIC PROTECTION DURING PLASMA DEPOSITION OF SILICON NITRIDE	GAMBETTA, KELLY M	1718	§103	Non-Final OA	23d overdue	Pending	Sep 16, 2024
18847308	FEEDBACK CONTROL SYSTEMS FOR IMPEDANCE MATCHING	FERNANDEZ, PEDRO C	2844	§102	Non-Final OA	24d overdue	Pending	Sep 16, 2024
18847173	SEAM-FREE AND CRACK-FREE DEPOSITION	MCCLURE, CHRISTINA D	1718	§103	Non-Final OA	40d	Pending	Sep 13, 2024
18837560	LOW RESISTANCE MOLYBDENUM DEPOSITION FOR LOGIC SOURCE/DRAIN CONTACTS	CHEN, BRET P	1718	§103	Non-Final OA	22d	Pending	Aug 09, 2024
18836329	SYSTEMS AND METHODS FOR CENTRAL FREQUENCY TUNING	SATHIRAJU, SRINIVAS	2844	§102	Non-Final OA	10d overdue	Pending	Aug 06, 2024
18834982	METHOD AND APPARATUS FOR RADIO FREQUENCY GRID DESIGN IN AN ESC TO REDUCE FILM ASYMMETRY	PATEL, DHARTI HARIDAS	2838	§103	Non-Final OA	2d overdue	Pending	Jul 31, 2024
18767915	RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN RESPONSE TO SUBSTRATE BULK RESISTIVITY VARIATIONS	BENNETT, CHARLEE	1718	Other	Non-Final OA	21d	Pending	Jul 09, 2024
18727065	PLASMA RADICAL EDGE RING BARRIER SEAL	BYRD, EUGENE G	3675	§103	Non-Final OA	31d overdue	Pending	Jul 05, 2024
18725961	COMPOSITION MIXTURE CONTROL OF EFEM ENVIRONMENT	GRAY, PAUL J	3753	§103	Non-Final OA	56d	Pending	Jul 01, 2024
18757184	ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTRAVIOLET LITHOGRAPHY RESIST IMPROVEMENT	DEO, DUY VU NGUYEN	1713	Other	Non-Final OA	20d	Pending	Jun 27, 2024
18747743	Method for Manufacturing ScAlN Target	LIANG, ANTHONY M	1734	§103	Non-Final OA	30d	Pending	Jun 19, 2024
18721457	CONFORMAL SILICON OXIDE DEPOSITION USING AMINOSILANE AND CHLOROSILANE PRECURSORS	CHEN, BRET P	1718	§103	Final Rejection	84d	Pending	Jun 18, 2024
18740501	Voltage Transient Detector and Current Transient Detector	BAUER, SCOTT ALLEN	2838	§103	Non-Final OA	9d overdue	Pending	Jun 11, 2024
18655124	MULTI-LAYER FEATURE FILL	SARKAR, ASOK K	2891	DPOther	Non-Final OA	70d	Pending	May 03, 2024
18701808	MICROCHANNEL ASSEMBLY COOLED POWER CIRCUITS FOR POWER BOXES OF SUBSTRATE PROCESSING SYSTEMS	VORTMAN, ANATOLY	2835	§103	Non-Final OA	3d overdue	Pending	Apr 16, 2024
18637111	ELECTROSTATIC CHUCK (ESC) PEDESTAL VOLTAGE ISOLATION	CHAN, LAUREEN	1716	§103	Non-Final OA	3d overdue	Pending	Apr 16, 2024
18689007	Junction System for Direct-Drive Radiofrequency Power Supply	WELLS, KENNETH B	2842	§112	Non-Final OA	70d	Pending	Mar 04, 2024
18581084	TRANSFER ROBOT FOR REDUCED FOOTPRINT PLATFORM ARCHITECTURE	KEENAN, JAMES W	3655	§112	Non-Final OA	27d	Pending	Feb 19, 2024
18684086	SHOWERHEAD TO PEDESTAL GAPPING WITH DIFFERENTIAL CAPACITIVE SENSOR SUBSTRATE	VELEZ, ROBERTO	2858	§103	Non-Final OA	62d	Pending	Feb 15, 2024
18683501	METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER	TRAN, BINH X	1713	§103	Non-Final OA	8d overdue	Pending	Feb 13, 2024
18682869	ION BEAM ETCH SYSTEM AND METHOD	SWEELY, KURT D	1718	§103	Non-Final OA	56d	Pending	Feb 09, 2024
18572075	IMAGE ANALYSIS OF PLASMA CONDITIONS	JIA, XIN	2663	§103	Non-Final OA	22d	Pending	Dec 19, 2023
18570061	IN-LINE MACHINE VISION SYSTEM FOR PART TRACKING OF SUBSTRATE PROCESSING SYSTEM	COLLINS, MICHAEL	3655	§103	Non-Final OA	12d	Pending	Dec 13, 2023
18557250	APPARATUSES FOR MEASURING GAP BETWEEN A SUBSTRATE SUPPORT PLANE AND GAS DISTRIBUTION DEVICE	HO, ANTHONY	2817	§103	Non-Final OA	19d overdue	Pending	Oct 25, 2023
18379397	PRECURSORS FOR DEPOSITION OF MOLYBDENUM-CONTAINING FILMS	HERNANDEZ-KENNEY, JOSE	1717	§103	Non-Final OA	4d overdue	Pending	Oct 12, 2023
18282021	CONDUCTIVE COOLING OF A LOW TEMPERATURE PEDESTAL OPERATING IN A HIGH TEMPERATURE DEPOSITION SEQUENCE	BERMAN, JASON	1794	§103	Non-Final OA	16d overdue	Pending	Sep 14, 2023
18244905	REFLECTOMETER TO MONITOR SUBSTRATE MOVEMENT	MALKOWSKI, KENNETH J	3667	§103	Non-Final OA	29d	Pending	Sep 11, 2023
18463647	TOOL FOR PREVENTING OR SUPPRESSING ARCING	NUCKOLS, TIFFANY Z	1716	§103	Non-Final OA	12d	Pending	Sep 08, 2023
18256665	MACHINE-LEARNING IN MULTI-STEP SEMICONDUCTOR FABRICATION PROCESSES	AZAD, MD ABUL K	2119	§103	Non-Final OA	5d	Pending	Jun 09, 2023
18265825	ATOMIC LAYER DEPOSITION WITH MULTIPLE UNIFORMLY HEATED CHARGE VOLUMES	THOMAS, BINU	1717	§102	Non-Final OA	30d overdue	Pending	Jun 07, 2023
18327558	WAFER LEVEL UNIFORMITY CONTROL IN REMOTE PLASMA FILM DEPOSITION	TUROCY, DAVID P	1718	DPOther	Non-Final OA	77d	Pending	Jun 01, 2023
18253038	LOW RESISTIVITY CONTACTS AND INTERCONNECTS	LOUIE, MANDY C	1718	§103	Final Rejection	26d	Pending	May 16, 2023
18035200	PEDESTAL INCLUDING SEAL	CHEN, KEATH T	1716	§103	Non-Final OA	3d overdue	Pending	May 03, 2023
18034834	SUBSTRATE PROCESSING SYSTEM TOOLS FOR MONITORING, ASSESSING AND RESPONDING BASED ON HEALTH INCLUDING SENSOR MAPPING AND TRIGGERED DATALOGGING	BAHLS, JENNIFER E. S.	2853	§101	Non-Final OA	35d overdue	Pending	May 01, 2023
18250740	Wear Compensating Confinement Ring	KACKAR, RAM N	1716	§103	Non-Final OA	17d overdue	Pending	Apr 26, 2023
18250349	LOCALIZED PLASMA ARC PREVENTION VIA PURGE RING	CHEN, KEATH T	1716	§103	Final Rejection	30d overdue	Pending	Apr 24, 2023
18032154	COLD EDGE LOW TEMPERATURE ELECTROSTATIC CHUCK	CHAN, LAUREEN	1716	§103	Final Rejection	23d overdue	Pending	Apr 14, 2023
18029963	SHOWERHEAD WITH INTEGRAL DIVERT FLOW PATH	ZERVIGON, RUDY	1716	§103	Non-Final OA	47d	Pending	Apr 03, 2023
18247724	SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER	MCDONALD, RODNEY GLENN	1794	§102	Non-Final OA	25d overdue	Pending	Apr 03, 2023
18247060	DEPOSITION RATE ENHANCEMENT OF AMORPHOUS CARBON HARD MASK FILM BY PURELY CHEMICAL MEANS	TUROCY, DAVID P	1718	§103	Non-Final OA	100d overdue	Pending	Mar 28, 2023
18028638	PREPLATING EDGE DRY	KURPLE, KARL	1717	§103	Non-Final OA	78d overdue	Pending	Mar 27, 2023
18246849	COATED CONDUCTOR FOR HEATER EMBEDDED IN CERAMIC	WOLCOTT, BRIAN P	3711	§103	Non-Final OA	23d overdue	Pending	Mar 27, 2023
18187342	ELECTRON EXCITATION ATOMIC LAYER ETCH	KLUNK, MARGARET D	1716	§103	Non-Final OA	16d overdue	Pending	Mar 21, 2023
18026431	AXIALLY COOLED METAL SHOWERHEADS FOR HIGH TEMPERATURE PROCESSES	LEE, AIDEN Y	1718	§112	Non-Final OA	31d overdue	Pending	Mar 15, 2023
18026322	HEAT-TRANSFERRING VALVE FLEXURE AND METHODS	BASTIANELLI, JOHN	3753	§103	Non-Final OA	23d	Pending	Mar 14, 2023
18044336	TEMPORARY CAPPING MATERIAL FOR OXIDE PREVENTION IN LOW TEMPERATURE DIRECT METAL-METAL BONDING	PHAM, THOMAS T	1713	§103	Non-Final OA	60d overdue	Pending	Mar 07, 2023
18041391	COMBINED SELF-FORMING BARRIER AND SEED LAYER BY ATOMIC LAYER DEPOSITION	KEBEDE, BROOK	2818	§103	Non-Final OA	112d overdue	Pending	Feb 10, 2023
18006531	HIGH-CONDUCTANCE VACUUM VALVES FOR WAFER PROCESSING SYSTEMS	KACKAR, RAM N	1716	§103	Final Rejection	63d	Pending	Jan 23, 2023
18006552	LOW CEILING TEMPERATURE HOMOPOLYMERS AS SACRIFICIAL PROTECTION LAYERS FOR ENVIRONMENTALLY SENSITIVE SUBSTRATES	KIELIN, ERIK J	2814	§112	Non-Final OA	48d	Pending	Jan 23, 2023
18017208	THIN SHADOW RING FOR LOW-TILT TRENCH ETCHING	FORD, NATHAN K	1716	§103	Non-Final OA	99d overdue	Pending	Jan 20, 2023
18003894	REMOVABLE CVD POLYMER FILM FOR SURFACE PROTECTION AND QUEUE PERIOD EXTENSION	PHAM, THOMAS T	1713	§103	Final Rejection	14d	Pending	Dec 29, 2022
18013742	FRICTION STIR PROCESSING FOR CORROSION RESISTANCE	STONER, KILEY SHAWN	1735	§103	Non-Final OA	12d	Pending	Dec 29, 2022
18013768	SUBSTRATE SUPPORT WITH UNIFORM TEMPERATURE ACROSS A SUBSTRATE	FREY, KIMBERLY NEWMAN	2817	§103	Non-Final OA	7d	Pending	Dec 29, 2022
18013445	SUBSTRATE SUPPORTS WITH MULTILAYER STRUCTURE INCLUDING COUPLED HEATER ZONES WITH LOCAL THERMAL CONTROL	LEE JR, WOODY A	3761	§103	Non-Final OA	12d	Pending	Dec 28, 2022
18013429	MOVABLE DISK WITH APERTURE FOR ETCH CONTROL	KENDALL, BENJAMIN R	2896	§103	Non-Final OA	2d overdue	Pending	Dec 28, 2022
18003137	LOW RESISTANCE GATE OXIDE METALLIZATION LINER	TRAN, TIEN	2812	§103	Final Rejection	14d	Pending	Dec 22, 2022
18002788	ATOMIC LAYER ETCHING OF A SEMICONDUCTOR, A METAL, OR A METAL OXIDE WITH SELECTIVITY TO A DIELECTRIC	LAOBAK, ANDREW KEELAN	1713	§103	Final Rejection	120d overdue	Pending	Dec 21, 2022
18002289	MULTI-STATION PROCESSING TOOLS WITH STATION-VARYING SUPPORT FEATURES FOR BACKSIDE PROCESSING	BENNETT, CHARLEE	1718	§103	Non-Final OA	49d overdue	Pending	Dec 19, 2022
18011445	Systems and Methods for Analyzing and Intelligently Collecting Sensor Data	GO, RICKY	1716	§101	Non-Final OA	22d	Pending	Dec 19, 2022
18009903	MATCHED CHEMISTRY COMPONENT BODY AND COATING FOR A SEMICONDUCTOR PROCESSING CHAMBER	SWEELY, KURT D	1718	§103	Final Rejection	36d overdue	Pending	Dec 12, 2022
18001590	REMOVAL OF TIN OXIDE IN CHAMBER CLEANING	LAOBAK, ANDREW KEELAN	1713	§103	Non-Final OA	111d overdue	Pending	Dec 12, 2022
17928426	PHOTOELECTRON ASSISTED PLASMA IGNITION	YU, YUECHUAN	1718	§103	Final Rejection	12d	Pending	Nov 29, 2022
17927297	ATOMIC LAYER DEPOSITION COATED POWDER COATING FOR PROCESSING CHAMBER COMPONENTS	KENDALL, BENJAMIN R	2896	§103	Final Rejection	45d overdue	Pending	Nov 22, 2022
17927328	DISTRIBUTED PLASMA SOURCE ARRAY	ALEJANDRO MULERO, LUZ L	1716	§103	Non-Final OA	30d overdue	Pending	Nov 22, 2022
17999255	LOW RESISTIVITY CONTACTS AND INTERCONNECTS	TRAN, TONY	2893	§103	Final Rejection	60d	Pending	Nov 18, 2022
17926093	WET FUNCTIONALIZATION OF DIELECTRIC SURFACES	JEFFERSON, QUOVAUNDA	2899	§103	Non-Final OA	23d	Pending	Nov 17, 2022
17924354	MID-CHAMBER FLOW OPTIMIZER	KENDALL, BENJAMIN R	2896	§103	Final Rejection	14d	Pending	Nov 09, 2022
17997802	INCREASING PLASMA UNIFORMITY IN A RECEPTACLE	LEE, WILSON	2844	§103	Non-Final OA	12d	Pending	Nov 02, 2022
17921930	BLENDED CONTACT FINGERS FOR PREVENTING CRACKS DURING THIN SUBSTRATE HANDLING	CONTRERAS, CIEL P	1794	§103	Non-Final OA	28d overdue	Pending	Oct 27, 2022
17995461	LOSS PREVENTION DURING ATOMIC LAYER DEPOSITION	FAYETTE, NATHALIE RENEE	2812	§103	Non-Final OA	22d	Pending	Oct 04, 2022
17995290	SELECTIVE PRECISION ETCHING OF SEMICONDUCTOR MATERIALS	LAOBAK, ANDREW KEELAN	1713	§103	Non-Final OA	38d overdue	Pending	Sep 30, 2022
17995243	ELECTROFILL FROM ALKALINE ELECTROPLATING SOLUTIONS	WITTENBERG, STEFANIE S	1795	§103	Non-Final OA	27d	Pending	Sep 30, 2022
17915573	EDGE RING FOR LOCALIZED DELIVERY OF TUNING GAS	REYES, JOSHUA NATHANIEL PI	1718	§103	Final Rejection	14d	Pending	Sep 29, 2022
17914499	SUBSTRATE SUPPORT TEMPERATURE PROBE DIAGNOSTICS AND MANAGEMENT	LIN, ERICA S Y	2853	§103	Non-Final OA	67d overdue	Pending	Sep 26, 2022
17912358	CERAMIC ADDITIVE MANUFACTURING TECHNIQUES FOR GAS INJECTORS	KLUNK, MARGARET D	1716	§112	Final Rejection	41d	Pending	Sep 16, 2022
17905632	STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERMETIC OVERLAYER	CHACKO DAVIS, DABORAH	1737	§103	Final Rejection	26d overdue	Pending	Sep 02, 2022
17905321	CONTROL OF WAFER BOW DURING INTEGRATED CIRCUIT PROCESSING	STEVENSON, ANDRE C	2899	§103	Non-Final OA	34d	Pending	Aug 30, 2022
17907959	REACTANT GAS PULSE DELIVERY	LAW, NGA LEUNG V	1717	§103	Final Rejection	147d overdue	Pending	Aug 29, 2022
17821107	ATOMIC LAYER ETCHING AND SMOOTHING OF REFRACTORY METALS AND OTHER HIGH SURFACE BINDING ENERGY MATERIALS	NUCKOLS, TIFFANY Z	1716	§103	Final Rejection	86d overdue	Pending	Aug 19, 2022
17800168	PLANAR MULTI-LAYER RADIO FREQUENCY FILTERS INCLUDING STACKED COILS WITH STRUCTURAL CAPACITANCE	ALEJANDRO MULERO, LUZ L	1716	§103	Non-Final OA	44d overdue	Pending	Aug 16, 2022
17904005	COOLING PLATE FOR SEMICONDUCTOR PROCESSING CHAMBER WINDOW	FORD, NATHAN K	1716	§103	Non-Final OA	29d overdue	Pending	Aug 10, 2022
17759673	ELECTROHYDRODYNAMIC EJECTION PRINTING AND ELECTROPLATING FOR PHOTORESIST-FREE FORMATION OF METAL FEATURES	FORTIN, RYAN TIMOTHY	2897	§103	Final Rejection	9d	Pending	Jul 28, 2022
17790009	MIXED METAL BASEPLATES FOR IMPROVED THERMAL EXPANSION MATCHING WITH THERMAL OXIDE SPRAYCOAT	MACARTHUR, SYLVIA	1716	§103	Non-Final OA	37d overdue	Pending	Jun 29, 2022
17781447	PRESSURE BATCH COMPENSATION TO STABILIZE CD VARIATION FOR TRIM AND DEPOSITION PROCESSES	ZERVIGON, RUDY	1716	§103	Non-Final OA	317d overdue	Pending	Jun 01, 2022
17671211	MOVEABLE EDGE RINGS WITH REDUCED CAPACITANCE VARIATION FOR SUBSTRATE PROCESSING SYSTEMS	MCCONNELL, AARON R	3723	§103	Non-Final OA	16d overdue	Pending	Feb 14, 2022
17612536	SHOWERHEAD INSERT FOR UNIFORMITY TUNING	REYES, JOSHUA NATHANIEL PI	1718	§103	Non-Final OA	22d	Pending	Nov 18, 2021
17605264	HIGH TEMPERATURE HEATING OF A SUBSTRATE IN A PROCESSING CHAMBER	MOORE, KARLA A	1716	§112	Final Rejection	25d overdue	Pending	Oct 21, 2021
17593117	PLASMA ETCH TOOL FOR HIGH ASPECT RATIO ETCHING	REYES, JOSHUA NATHANIEL PI	1718	§103	Final Rejection	91d overdue	Pending	Sep 09, 2021
17429909	ELECTROSTATIC CHUCK WITH POWDER COATING	DINH, TUAN T	2847	§103	Non-Final OA	19d overdue	Pending	Aug 10, 2021

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