Tech Center 2600 • Art Units: 1713 1716 1718 1792 2615
This examiner grants 40% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18380144 | SEMICONDUCTOR PROCESSING APPARATUS | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18136448 | PLASMA PROCESSING APPARATUS | Final Rejection | SAMSUNG ELECTRONICS CO., LTD. |
| 18354058 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Final Rejection | Panasonic Intellectual Property Management Co., Ltd. |
| 17147827 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD FOR MONITORING INTEGRATED VALUE | Non-Final OA | ASM IP Holding B.V. |
| 17278423 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD | Non-Final OA | Hitachi High-Tech Corporation |
| 18512146 | WAFER CHUCK ASSEMBLY | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18630981 | BACKING PLATE AND DIFFUSER PLATE ASSEMBLY | Non-Final OA | Applied Materials, Inc. |
| 18206847 | CCP GAS DELIVERY NOZZLE | Final Rejection | Applied Materials, Inc. |
| 18201698 | EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE | Final Rejection | Applied Materials, Inc. |
| 18647077 | PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 18589071 | RESONANT PHASE-CONTROLLED OSCILLATOR | Non-Final OA | Tokyo Electron Limited |
| 18345665 | GAS FLOW DIFFUSORS FOR REMOTE PLASMA SOURCES | Final Rejection | Advanced Energy Industries, Inc. |
| 18682021 | SUBSTRATE PROCESSING SYSTEM INCLUDING RF MATCHING CIRCUIT FOR MULTI-FREQUENCY, MULTI-LEVEL, MULTI-STATE PULSING | Non-Final OA | LAM RESEARCH CORPORATION |
| 18013475 | CONTROLLING TEMPERATURE PROFILES OF PLASMA CHAMBER COMPONENTS USING STRESS ANALYSIS | Non-Final OA | LAM RESEARCH CORPORATION |
| 17795843 | ETCHING AND PLASMA UNIFORMITY CONTROL USING MAGNETICS | Non-Final OA | Lam Research Corporation |
| 18341782 | DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING THE SAME | Final Rejection | NANYA TECHNOLOGY CORPORATION |
| 16971012 | METHOD AND APPARATUS FOR FORMING A PATTERNED LAYER OF MATERIAL | Non-Final OA | ASML NETHERLANDS B.V. |
| 18142442 | SUBSTRATE PROCESSING APPARATUS | Final Rejection | SEMES CO., LTD. |
| 17895266 | APPARATUS FOR TREATING SUBSTRATES AND TEMPERATURE CONTROL METHOD OF HEATING ELEMENTS | Final Rejection | SEMES CO., LTD. |
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