Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
The response of the applicant has been read and given careful consideration. Rejection of the previous action, not repeated below are withdrawn based upon the amendment and arguments of the applicant. Responses to the arguments of the applicant are presented after the first rejection they are directed to.
The following is a quotation of the first paragraph of 35 U.S.C. 112(a):
(a) IN GENERAL.—The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor or joint inventor of carrying out the invention.
The following is a quotation of the first paragraph of pre-AIA 35 U.S.C. 112:
The specification shall contain a written description of the invention, and of the manner and process of making and using it, in such full, clear, concise, and exact terms as to enable any person skilled in the art to which it pertains, or with which it is most nearly connected, to make and use the same, and shall set forth the best mode contemplated by the inventor of carrying out his invention.
Claims 1-7 and 9-12 are rejected under 35 U.S.C. 112(a) or 35 U.S.C. 112 (pre-AIA ), first paragraph, as failing to comply with the written description requirement. The claim(s) contains subject matter which was not described in the specification in such a way as to reasonably convey to one skilled in the relevant art that the inventor or a joint inventor, or for applications subject to pre-AIA 35 U.S.C. 112, the inventor(s), at the time the application was filed, had possession of the claimed invention.
The specification does not support the embodiment where both the cation and the anion are bound to polymer (A).
The following is a quotation of 35 U.S.C. 112(b):
(b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention.
The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph:
The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention.
Claims 1-7 and 9-12 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention.
In claim 1, at lines 17-20 “where in the radiation-sensitive onium cation and the organic anion are bound to polymer (A) to form a structural unit (III) and the structural unit (III) comprises a structural unit derived from a monomer that comprises the fluorine radiation-sensitive onium cation and the iodine organic anion structure” is confusing as it required both the cation and the anion to be bound to polymer (A), which is not permitted by the language of claim 1 at lines 5-8, wherein at least one of the radiation-sensitive onium cation structure and the organic anion structure is not attached to polymer (A) and wherein the radiation sensitive onium cation structure comprises”(emphasis added) and the language of claim 9 which shows the anion bound to a polymerizable group (to form the repeating unit III in polymer (A) ) and the cation unattached to the polymer (associated only by the ionic bond).
For the purposes of evaluating patent ability over prior art, the examiner assumes that claims 1-7 and 9-12 require one of the polyfluorinated cation and the iodized anion to be covalently bound to the polymer backbone.
In claim 13, “R51-COO-“ should read - - R51-COO- - - , “R51-SO3-“ should read - - R51-SO3- - - . (negative signs on the anions should be superscript)
The following is a quotation of 35 U.S.C. 112(d):
(d) REFERENCE IN DEPENDENT FORMS.—Subject to subsection (e), a claim in dependent form shall contain a reference to a claim previously set forth and then specify a further limitation of the subject matter claimed. A claim in dependent form shall be construed to incorporate by reference all the limitations of the claim to which it refers.
The following is a quotation of pre-AIA 35 U.S.C. 112, fourth paragraph:
Subject to the following paragraph [i.e., the fifth paragraph of pre-AIA 35 U.S.C. 112], a claim in dependent form shall contain a reference to a claim previously set forth and then specify a further limitation of the subject matter claimed. A claim in dependent form shall be construed to incorporate by reference all the limitations of the claim to which it refers.
Claim 9 is rejected under 35 U.S.C. 112(d) or pre-AIA 35 U.S.C. 112, 4th paragraph, as being of improper dependent form for failing to further limit the subject matter of the claim upon which it depends, or for failing to include all the limitations of the claim upon which it depends.
Claim 1 at lines 17-20 requires both the anion and the cation to be bound to polymer (A), while in formula (III) of claim 9 the cation is not.
Applicant may cancel the claim(s), amend the claim(s) to place the claim(s) in proper dependent form, rewrite the claim(s) in independent form, or present a sufficient showing that the dependent claim(s) complies with the statutory requirements.
In claim 7, the polyfluorinated cation and iodized anion is required to be attached to the polymer in claim 1, but claims 7 requires them to non-polymeric
In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention.
(a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention.
The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action:
A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made.
Claims 13-15 are rejected under 35 U.S.C. 102(a)(1) or 102(a)(2) as being fully anticipated by Hatakeyama et al. 20210149300.
Hatakeyama et al. 20210149300 illustrates PAG 17 and PAG 6 on pages 120-121.
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Resist 6 combines polymer 1, PAG 6, quencher 1 (a weak photoacid generator) and organic solvents (table 1). Resist 19 combines polymer 2 with PAG 17, quencher 2 (a weak photoacid generator) and solvents (table 1). These resists were coated on a wafer, dried, exposed using EUV, post baked and developed in TMAH [0138]. Useful PAG containing repeating units bounded by formulae f1 to f3
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where In formulae (f1) to (f3), R.sup.A is each independently hydrogen or methyl. Z.sup.1 is a single bond, phenylene group, —O—Z.sup.11—, —C(═O)—O—Z.sup.11—, or —C(═O)—NH—Z.sup.11—, wherein Z.sup.11 is a C.sub.1-C.sub.6 aliphatic hydrocarbylene group, phenylene group, naphthylene group, or a C.sub.1-C.sub.18 combination thereof which may contain a carbonyl, ester bond, ether bond or hydroxyl moiety. Z.sup.2 is a single bond, —Z.sup.21—C(═O)—O—, —Z.sup.21—O— or —Z.sup.21—O—C(═O)—, wherein Z.sup.21 is a C.sub.1-C.sub.12 saturated hydrocarbylene group which may contain a carbonyl moiety, ester bond or ether bond. Z.sup.3 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, —O—Z.sup.31—, —C(═O)O—Z.sup.31—, or —C(═O)—NH—Z.sup.31—, wherein Z.sup.31 is a C.sub.1-C.sub.6 aliphatic hydrocarbylene group, phenylene group, fluorinated phenylene group, or trifluoromethyl-substituted phenylene group, which may contain a carbonyl moiety, ester bond other bond or hydroxyl moiety. The aliphatic hydrocarbylene group may be saturated or unsaturated and straight, branched or cyclic. The saturated hydrocarbylene group may be straight, branched or cyclic. In formulae (f1) to (f3), R.sup.21 to R.sup.28 are each independently a C.sub.1-C.sub.20 hydrocarbyl group which may contain a heteroatom. The hydrocarbyl group may be saturated or unsaturated and straight, branched or cyclic. Examples include C.sub.1-C.sub.20 alkyl groups, C.sub.6-C.sub.20 aryl groups, C.sub.7-C.sub.20 aralkyl groups, and mixtures thereof. Illustrative examples are as exemplified above for R.sup.3, R.sup.4, R.sup.5, R.sup.6 and R.sup.7 in formulae (A-1) and (A-2). In these groups, some or all hydrogen atoms may be substituted by C.sub.1-C.sub.10 saturated hydrocarbyl, halogen, trifluoromethyl, cyano, nitro, hydroxyl, mercapto, C.sub.1-C.sub.10 saturated hydrocarbyloxy, C.sub.2-C.sub.10 saturated hydrocarbyloxycarbonyl, or C.sub.2-C.sub.10 saturated hydrocarbylcarbonyloxy moieties, or some carbon may be replaced by a carbonyl moiety, ether bond or ester bond. Also, a pair of R.sup.23 and R.sup.24 or R.sup.26 and R.sup.27 may bond together to form a ring with the sulfur atom to which they are attached. Examples of the ring are as exemplified above as the ring that R.sup.3 and R.sup.4, taken together, form with the sulfur atom in formula (A-1). In formula (f2), R.sup.HF is hydrogen or trifluoromethyl. In formula (f1), M.sup.− is a non-nucleophilic counter ion. Examples of the non-nucleophilic counter ion include halide ions such as chloride and bromide ions; fluoroalkylsulfonate ions such as triflate, 1,1,1-trifluoromethanesulfonate, and nonafluorobutanesulfonate; arylsulfonate ions such as tosylate, benzenesulfonate, 4-fluorobenzenesulfonate, and 1,2,3,4,5-pentafluorobenzenesulfonate; alkylsulfonate ions such as mesylate and butanesulfonate; imide ions such as bis(trifluoromethylsulfonyl)imide, bis(perfluoroethylsulfonyl)imide and bis(perfluorobutylsulfonyl)imide: methide ions such as tris(trifluoromethylsulfonyl)methide and tris(perfluoroethylsulfonyl)methide are disclosed at [0072-0087]. It is understood that a blend of two or more polymers which differ in compositional ratio, Mw or Mw/Mn is acceptable [0095] Other exemplified fluorinated onium cations include
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(page 20)
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(page 21)
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(page 24)
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(page 70)
Quenchers are bounded by formulae
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and include carboxylic acid anions and sulfonic acid anions where the alpha carbon is not fluorinated. R.sup.101 is hydrogen or a C.sub.1-C.sub.40 hydrocarbyl group which may contain a heteroatom, exclusive of the hydrocarbyl group in which the hydrogen bonded to the carbon atom at α-position of the sulfone group is substituted by fluorine or fluoroalkyl.. In the foregoing groups, some hydrogen may be substituted by a moiety containing a heteroatom such as oxygen, sulfur, nitrogen or halogen, and some carbon may be replaced by a moiety containing a heteroatom such as oxygen, sulfur or nitrogen, so that the group may contain a hydroxyl moiety, cyano moiety, carbonyl moiety, ether bond, ester bond, sulfonic acid ester bond, carbonate bond, lactone ring, sultone ring, carboxylic anhydride, or haloalkyl moiety. Examples of the heteroatom-containing hydrocarbyl group include alkoxyphenyl groups such as 4-hydroxyphenyl, 4-methoxyphenyl 3-methoxyphenyl, 2-methoxyphenyl 4-ethoxyphenyl, 4-tert-butoxyphenyl, and 3-tert-butoxyphenyl; alkoxynaphthyl groups such as methoxynaphthyl ethoxynaphthyl, n-propoxynaphthyl and n-butoxynaphthyl; dialkoxynaphthyl groups such as dimethoxynaphthyl and diethoxynaphthyl; and aryloxoalkyl groups, typically 2-aryl-2-oxoethyl groups such as 2-phenyl-2-oxoethyl, 2-(1-naphthyl)-2-oxoethyl, and 2-(2-naphthyl)-2-oxoethyl.
In formula (C), R.sup.102 is a C.sub.1-C.sub.20 hydrocarbyl group which may contain a heteroatom. Examples of the hydrocarbyl group R.sup.102 are as exemplified above for the hydrocarbyl group R.sup.101. Also included are fluorinated alkyl groups such as trifluoromethyl, trifluoroethyl. 2,2,2-trifluoro-1-methyl-1-hydroxyethyl, 2,2,2-trifluoro-1-trifluoromethyl-1-hydroxyethyl, and fluorinated aryl groups such as pentafluorophenyl and 4-trifluoromethylphenyl [0107-0115].
The polymer 2, the fluorinated cation of PAG 17 and the iodized anion of quencher 2 meet the claims. In the solution/composition, ion exchange inherently occurs so that the cation of PAG17 and the anion of quencher 2 are ionically linked/bound and thus form a single compound. In PAG, the fluorinated groups are bound to two different aromatic rings. The open “comprising” language of the claims
Claims 1-4,6,7 and 10-20 are rejected under 35 U.S.C. 102(a)(1) or 102(a)(2) as being fully anticipated by Hatakeyama et al. 20210149300
Hatakeyama et al. 20210149300 does not exemplify to full range of photoacid generators in the resist composition.
With respect to claim 13-15, it would have been obvious to modify the resist composition by replacing at least a portion of the polyfluorinated onium salt PAG 17 with other polyfluorinated PAG salts such as PAG 6 with a reasonable expectation of forming a useful photoresist based upon their disclosed equivalence. Further, when the resulting resist is exposed and developed as in the examples, there is a reasonable expectation that the resultant resist would form a useful resist pattern.
With respect to claim 13-16, it would have been obvious to modify the resist composition by replacing at least a portion of the iodized carboxylic anion of quencher 2 with other iodized carboxylic acid anions or iodized (non-fluorinated) sulfonic acid based upon the disclosure of the (non-fluorinated) halogenation of these anions and the equivalence of these carboxylic and/or sulfonic acid anions bounded by formulae B and C at [0107-0115] with a reasonable expectation of forming a useful photoresist based upon their disclosed equivalence. Further, when the resulting resist is exposed and developed as in the examples, there is a reasonable expectation that the resultant resist would form a useful resist pattern.
With respect to claims 17-20, it would have been obvious to one skilled in the art to modify the resists 6 or 19 by replacing the di/polyfluorinated PAG cations of PAG 17 or PAG 6 with other exemplified PAG cations disclosed such as
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(page 21)
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(page 24) other polyfluorinated cations with a reasonable expectation of forming a useful resist Further, when the resulting resist is exposed and developed as in the examples, there is a reasonable expectation that the resultant resist would form a useful resist pattern.
With respect to claims 1-4,6,7, and 10-12, it would have been obvious to one skilled in the art to modify resist 19 by replacing the bound onium salt with one bounded by
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, where R21 and/or R22 are a hydrocarbyl group, such as a aryl group where two or more of the hydrogens are replaced with a trifluoromethyl or fluorine group based upon the disclosed equivalence at [0071-0087]. For the purposes of evaluating patent ability over prior art, the examiner assumes that claims 1-7 and 9-12 require one of the polyfluorinated cation and the iodized anion to be covalently bound to the polymer backbone. The anion of PAG17 is the iodized anion which will become associated the bound sulfonium cation during ion exchange.
With respect to claims 1-4,6,7, 10-12 and 17-20 it would have been obvious to one skilled in the art to modify resist 19 by replacing the bound onium salt with one bounded by
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, where R21 and/or R22 are a hydrocarbyl group, such as a aryl group where four or more of the hydrogens are replaced with a trifluoromethyl or fluorine group based upon the disclosed equivalence at [0071-0087]. For the purposes of evaluating patent ability over prior art, the examiner assumes that claims 1-7 and 9-12 require one of the polyfluorinated cation and the iodized anion to be covalently bound to the polymer backbone. The anion of PAG17 is the iodized anion which will become associated the bound sulfonium cation during ion exchange.
The rejection has been modified to describe the cation being polymer bound, which allows for the rejection of claims excepting claim 9. The examiner has interpreted this claims as requiring one of the cation or the anion to be polymer bound.
Claims 1-7 and 10-20 are rejected under 35 U.S.C. 102(a)(1) or 102(a)(2) as being fully anticipated by Hatakeyama et al. 20210149300, in view of Kaneko et al. JP 2007297590
Kaneko et al. JP 2007297590 (machine translation attached) teaches resist with a fluorinated polymer additive. Polymer 13 is an example of this
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(page 66)
Hatakeyama et al. 20210149300 does not exemplify a second polymer, which is fluorinated and has an acid labile group in the resist disclosed..
In addition to the basis above, it would have been obvious to one skilled in the art to modify the resists exemplified/anticipated or rendered obvious by Hatakeyama et al. 20210149300 by adding a fluorinated polymer such as polymer 13 of Kaneko et al. JP 2007297590 based upon the direction to the polymers in Kaneko et al. JP 2007297590 at [0116] of Hatakeyama et al. 20210149300 with a reasonable expectation of forming a useful resist composition. Further, when the resist is exposed and developed, there is a reasonable expectation that the resultant resist would form a useful resist pattern.
Claims 13-15 are rejected under 35 U.S.C. 102(a)(2) as being fully anticipated by Hatakeyama et al. 20220107559
Hatakeyama et al. 20220107559 exemplifies quenchers Q-23 and Q-12,
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Resist 12 combines resist polymer P-1, PAG-1, quencher Q-12, and PGMEA (solvent) (table 1)
Resist 37 combines polymer P-5, PAG 20, quencher Q-23 and PGMEA (table 3). These are coated upon a silicon substrate, exposed using EUV, post baked, developed and evaluated [0193-0195]. Useful iodized anion monomers to be part of the resist polymer are disclosed at [0138] (pages 130-136) such as
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. Useful cations counterions disclosed include
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(page 125) and
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(page 124). Useful quenchers are carboxylic acids, sulfonamide, and nonfluorinated sulfonic acids, including
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[0078-0093]. Useful cations include polyfluorinated sulfonium cations such as
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(pages 63-71). Fluorinated polymers for improving water repellancy are disclosed [0163].
Claims 1-4,6-7 and 9-20 are rejected under 35 U.S.C. 103 as being unpatentable over Hatakeyama et al. 20220107559
With respect to claims 1-4,6,7 and 9-16, it would have been obvious to one skilled in the art to modify resists 12 or 37 by replacing at least a portion of the polymer bound sulfonic acid anion with an iodized polymer bound sulfonic acid anion, such as at that identified above with a reasonable expectation fo forming a useful resist and when patterned using the processes of the examples resist pattern.
With respect to claims 17-20, in addition to the basis above, it would have been obvious to one skilled in the art to modify the resists exemplified/anticipated or rendered obvious by Hatakeyama et al. 20220107559 by replacing the fluorinated sulfonium cation with other disclosed such as the tetra-, penta- or hexa- fluorinated exemplified in the Hatakeyama et al. 20220107559 based upon their equivalence.
Claims 1-7 and 9-20 are rejected under 35 U.S.C. 103 as being unpatentable over Hatakeyama et al. 20220107559, in view of Kaneko et al. JP 2007297590
in addition to the basis above, it would have been obvious to one skilled in the art to modify the resists exemplified/anticipated or rendered obvious by Hatakeyama et al. 20220107559 by adding a fluorinated polymer such as polymer 13 of Kaneko et al. JP 2007297590 as the water repellant polymer with a reasonable expectation of forming a useful resist composition. Further, when the resist is exposed and developed, there is a reasonable expectation that the resultant resist would form a useful resist pattern.
Claims 1-4,6,7 and 9-16 are rejected under 35 U.S.C. 102(a)(2) as being fully anticipated by Hatakeyama et al. 20220066319
Hatakeyama et al. 20220066319 exemplifies iodized quenchers Q28, Q26, Q-17, Q-16, Q-15, Q-12 and sulfonamide quenchers Q-10. The combination of an iodized PAG anion and a trifluorinated sulfonium cation is exemplified (polymer 4).
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In example 15 polymer P-4 is combined with quencher Q-4 and PGMEA (table 1).The iodized quenchers are combined with polymers in examples 11,27,28,38 and 40 (tables 1 and 2). These are coated upon a silicon wafer, dried, exposed using EUV, post baked, develop[ed and evaluated [0208-0211]. Useful polyfluorinated cations include
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(pages 56-80]. Useful quenchers including carboxylic acids, sulfonamides and non-fluorinated sulfonate acids are bounded by formulae I-1, I-2 and I-4 and may be include a halogen atom [0105-0107].
The examiner with polymer 4 meet the limitation of claims 1-7 and 9-12
The examiner including the iodized quenchers meet claims 13-16
Claims 1-4,6-7 and 9-20 are rejected under 35 U.S.C. 103 as being unpatentable over Hatakeyama et al. 20220066319
in addition to the basis above, it would have been obvious to one skilled in the art to modify the resists exemplified/anticipated or rendered obvious by Hatakeyama et al. 20220066319 by replacing the fluorinated sulfonium cation with other disclosed such as the tetra-, penta- or hexa- fluorinated exemplified in the Hatakeyama et al. 20220066319 based upon their equivalence.
Claims 1-7 and 9-20 are rejected under 35 U.S.C. 103 as being unpatentable over Hatakeyama et al. 20220066319, in view of Kaneko et al. JP 2007297590
in addition to the basis above, it would have been obvious to one skilled in the art to modify the resists exemplified/anticipated or rendered obvious by Hatakeyama et al. 20220066319 as the water repellant polymer with a reasonable expectation of forming a useful resist composition. Further, when the resist is exposed and developed, there is a reasonable expectation that the resultant resist would form a useful resist pattern.
Claims 13 and 16 are rejected under 35 U.S.C. 102(a)(2) as being fully anticipated by Hatakeyama et al. 20220043343.
Hatakeyama et al. 20220043343 exemplifies quenchers Q-15, Q-20, Q-22 to Q24, Q-26 to Q-27
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These are combined with resist polymers and polymeric or non-polymeric photoacid generators (see resist composition in table 1-3). These are coated, exposed, post baked, developed and the resulting patterns evaluated [0206-0208]. Useful sulfonium cations include polyfluorinated sulfonium cations such as
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(see pages 131-132).
Claims 1,4,6,7 and 11-16 are rejected under 35 U.S.C. 102(a)(2) as being fully anticipated by Hatakeyama 20220026803
Hatakeyama 20220026803 exemplifies quencher Q-4 (see page 127) used in the examples.
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exemplified polymer
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(see other polymers as well include multiple fluorine moieties and an iodized anion. These are combined with the ingredients as in tables 1 and 2 . The resists are coated, exposure using EUV, post baked and developed and evaluated as in tables 1-2 [0220-0228].
Claims 13-16 are rejected under 35 U.S.C. 102(a)(2) as being fully anticipated by Hatakeyama et al. 20210294211
Hatakeyama et al. 20210294211 exemplifies quencher SQ-5
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Resist 6 combines this with polymer 1, PAG 1, and PGMEA. (table 1). The resists are coated, exposed using EUV, post balked, developed and the patterns evaluated [0197-0200].
The prior art made of record and not relied upon is considered pertinent to applicant's disclosure.
Hatakeyama et al. 20210116808 exemplifies polymers 3 and 4
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These are coated, exposed using EUV, developed and evaluated [0206-0208]. Useful sulfonium cations are disclosed
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(pages 61-62)
Hatakeyama et al. 20220050378 exemplifies an iodized anion with sulfonic acid counterion which ius used in the examples (page 111)
Hatakeyama et al. 20180335696 exemplifies resist polymers with iodized and fluorinated cationic anions.
Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to Martin J Angebranndt whose telephone number is (571)272-1378. The examiner can normally be reached 7-3:30 pm EST.
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MARTIN J. ANGEBRANNDT
Primary Examiner
Art Unit 1737
/MARTIN J ANGEBRANNDT/Primary Examiner, Art Unit 1737 April 15, 2026
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