26 pending office actions • 12 art units • 20 examiners • 0 of 26 (0%) have an AI response strategy ready • 16 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §101 + other | 1 (4%) |
| §103 only | 8 (31%) |
| §102 only | 5 (19%) |
| §112 only | 1 (4%) |
| Double-patenting + other | 1 (4%) |
| Multi-statute (no §101) | 10 (38%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| MALLOY, ANNA E | 3 | 46.2% | -4.9% |
| FRASER, STEWART A | 2 | 86.0% | +14.3% |
| EOFF, ANCA | 2 | 80.0% | +11.0% |
| ANGEBRANNDT, MARTIN J | 2 | 55.4% | +34.2% |
| TRAYWICK, ANDREW PRESTON | 2 | 71.0% | +28.5% |
| TRAN, BINH X | 1 | 81.6% | +11.9% |
| BURKHART, MICHAEL D | 1 | 62.2% | +11.5% |
| CHACKO DAVIS, DABORAH | 1 | 71.9% | +20.7% |
| MCCLENDON, SANZA L | 1 | 80.6% | +10.6% |
| FANG, SHANE | 1 | 76.3% | +18.8% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 5 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | — |
| 18239399 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | EOFF, ANCA | — |
| 18239373 | COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER | EOFF, ANCA | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17614753 | MACROPHAGE IMAGING AGENT | WESTERBERG, NISSA M | 12d |
| 18391906 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | MALLOY, ANNA E | 13d |
| 17807079 | CALCULATION METHOD, CALCULATOR SYSTEM, AND CALCULATOR | KEATON, SHERROD L | 76d |
| 18613608 | ORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD | BURKHART, MICHAEL D | — |
| 18509611 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | FRASER, STEWART A | — |
| 18551116 | METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE | CALDERON, DAVID ANDREW | — |
| 18266061 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ANGEBRANNDT, MARTIN J | — |
| 18198954 | SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | OLADAPO, TAIWO | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | TRAYWICK, ANDREW PRESTON | 30d |
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — |
| 18613608 | ORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD | BURKHART, MICHAEL D | — |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — |
| 18509611 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | FRASER, STEWART A | — |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | — |
| 18373415 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT | FANG, SHANE | — |
| Art Unit | Apps |
|---|---|
| 1737 | 8 |
| 1766 | 2 |
| 1722 | 2 |
| 1638 | 1 |
| 1765 | 1 |
| 1742 | 1 |
| 1771 | 1 |
| 1692 | 1 |
| 1653 | 1 |
| 1655 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — | §103 | Non-Final OA | — | Pending | Nov 28, 2024 |
| 18613608 | ORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD | BURKHART, MICHAEL D | 1638 | §102§112 | Non-Final OA | — | Pending | Mar 22, 2024 |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — | §103 | Non-Final OA | — | Pending | Feb 07, 2024 |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — | §103 | Non-Final OA | — | Pending | Dec 27, 2023 |
| 18391906 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | MALLOY, ANNA E | 1737 | §102§103 | Final Rejection | 13d | Pending | Dec 21, 2023 |
| 18528951 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | MALLOY, ANNA E | — | §102§103DP | Non-Final OA | — | Pending | Dec 05, 2023 |
| 18509611 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | FRASER, STEWART A | — | §102§103Other | Non-Final OA | — | Pending | Nov 15, 2023 |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | 1765 | §102 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18373415 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT | FANG, SHANE | 1766 | §103 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18551116 | METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE | CALDERON, DAVID ANDREW | 1742 | §102§103§112 | Non-Final OA | — | Pending | Sep 18, 2023 |
| 18244460 | COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER | NGUYEN, HA S | 1766 | §102 | Non-Final OA | — | Pending | Sep 11, 2023 |
| 18239399 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | EOFF, ANCA | 1722 | §102 | Non-Final OA | — | Pending | Aug 29, 2023 |
| 18239373 | COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER | EOFF, ANCA | 1722 | §102 | Non-Final OA | — | Pending | Aug 29, 2023 |
| 18266061 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ANGEBRANNDT, MARTIN J | 1737 | §102§103§112 | Final Rejection | — | Pending | Jun 08, 2023 |
| 18198954 | SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | OLADAPO, TAIWO | 1771 | §102§103 | Final Rejection | — | Pending | May 18, 2023 |
| 18198971 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | ANGEBRANNDT, MARTIN J | 1737 | §103 | Final Rejection | — | Pending | May 18, 2023 |
| 18197225 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | CUTLIFF, YATE KAI RENE | 1692 | §112 | Non-Final OA | — | Pending | May 15, 2023 |
| 18135838 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | MALLOY, ANNA E | 1737 | §102§103§112 | Final Rejection | — | Pending | Apr 18, 2023 |
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Final Rejection | 30d | Pending | Mar 13, 2023 |
| 17800784 | COMPOSITION FOR ALLEVIATING PULMONARY HYPERTENSION, METHOD FOR PREDICTING PROGNOSIS OF PULMONARY HYPERTENSION, METHOD FOR ASSISTING IN DETERMINING SEVERITY OF PULMONARY HYPERTENSION, AND METHOD FOR ASSISTING IN DIAGNOSING PULMONARY HYPERTENSION | IANNUZO, NATALIE NMN | 1653 | §102§103 | Non-Final OA | — | Pending | Feb 23, 2023 |
| 18100031 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | ROBINSON, CHANCEITY N | 1737 | §102 | Non-Final OA | — | Pending | Jan 23, 2023 |
| 17961611 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Non-Final OA | — | Pending | Oct 07, 2022 |
| 17792348 | KIDNEY REGENERATION ACCELERATOR AND PRODUCTION METHOD FOR SAME | MELLER, MICHAEL V | 1655 | §103 | Non-Final OA | — | Pending | Jul 12, 2022 |
| 17807079 | CALCULATION METHOD, CALCULATOR SYSTEM, AND CALCULATOR | KEATON, SHERROD L | 2148 | §101§103Other | Non-Final OA | 76d | Pending | Jun 15, 2022 |
| 17614753 | MACROPHAGE IMAGING AGENT | WESTERBERG, NISSA M | 1618 | §103§112 | Final Rejection | 12d | Pending | Nov 29, 2021 |
| 17506740 | PHOTOSENSITIVE RESIN COMPOSITION | CHAMPION, RICHARD DAVID | 1737 | §103§112 | Final Rejection | — | Pending | Oct 21, 2021 |
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