Prosecution Insights
Prosecution Insights
Technology areas: Biotechnology & Pharmaceuticals • Chemistry & Materials
26 pending office actions • 12 art units • 21 examiners • 0 of 26 (0%) have an AI response strategy ready • 15 patents granted in the last 365 days
JSR Corporation maintains a prosecution presence with 24 pending office actions in the Chemistry & Materials technology area. These actions are distributed across 12 distinct art units, reflecting a range of chemical and material science applications. The company is currently engaged with 20 distinct examiners, suggesting exposure to different examination styles across its portfolio. The count of 24 pending office actions reflects the scale of the company's current engagement with the patent office.
ANNA E MALLOY is the busiest examiner for JSR Corporation, with 3 pending office actions currently under her review. The remaining pending office actions are distributed among the other examiners. With 12 distinct art units involved, the company must manage a prosecution landscape that requires coordination across many different technical groups and individual examiner preferences. The distribution of the pending office actions among the examiners means that the company must be prepared for a variety of procedural approaches within the Chemistry & Materials sector.
Based on the USPTO statutory response window for each pending office action. 6 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 6 of the docket's apps have a known mailing date.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 7 (27%) |
| §102 only | 2 (8%) |
| §112 only | 1 (4%) |
| Double-patenting + other | 2 (8%) |
| Multi-statute (no §101) | 14 (54%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| MALLOY, ANNA E | 3 | 46.5% | -3.9% |
| CHU, JOHN S Y | 2 | 76.8% | +5.4% |
| CHAMPION, RICHARD DAVID | 2 | 45.7% | +11.9% |
| ANGEBRANNDT, MARTIN J | 2 | 55.5% | +34.0% |
| TRAN, BINH X | 1 | 81.7% | +12.0% |
| WALKE, AMANDA C | 1 | 88.4% | +8.6% |
| CHACKO DAVIS, DABORAH | 1 | 72.1% | +20.6% |
| FRASER, STEWART A | 1 | 85.9% | +14.5% |
| MCCLENDON, SANZA L | 1 | 80.5% | +10.7% |
| FANG, SHANE | 1 | 76.6% | +18.5% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 2 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18685539 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | WALKE, AMANDA C | — |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | — |
Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 17614753 | MACROPHAGE IMAGING AGENT | WESTERBERG, NISSA M | 12d |
| 18391906 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | MALLOY, ANNA E | 13d |
| 18125934 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | ZHANG, RUIYUN | 72d |
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — |
| 18372163 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | COSGROVE, JAYSON D | — |
| 18551116 | METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE | CALDERON, DAVID ANDREW | — |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | — |
| 18373415 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT | FANG, SHANE | — |
| 18270256 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | CHAMPION, RICHARD DAVID | — |
| 18266061 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ANGEBRANNDT, MARTIN J | — |
| 18198971 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | ANGEBRANNDT, MARTIN J | — |
| Art Unit | Apps |
|---|---|
| 1737 | 10 |
| 1765 | 1 |
| 1766 | 1 |
| 1773 | 1 |
| 1742 | 1 |
| 1722 | 1 |
| 1631 | 1 |
| 1624 | 1 |
| 1692 | 1 |
| 1782 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | TRAN, BINH X | — | §102§103 | Non-Final OA | — | Pending | Nov 28, 2024 |
| 18685539 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | WALKE, AMANDA C | — | §103 | Non-Final OA | — | Pending | Feb 22, 2024 |
| 18435001 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | CHACKO DAVIS, DABORAH | — | §102§103 | Non-Final OA | — | Pending | Feb 07, 2024 |
| 18574367 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | FRASER, STEWART A | — | §102§103 | Non-Final OA | — | Pending | Dec 27, 2023 |
| 18391906 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | MALLOY, ANNA E | 1737 | §102§103 | Final Rejection | 13d | Pending | Dec 21, 2023 |
| 18528951 | SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION | MALLOY, ANNA E | — | §102§103DP | Non-Final OA | — | Pending | Dec 05, 2023 |
| 18284345 | RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD | MCCLENDON, SANZA L | 1765 | §102 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18373415 | POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT | FANG, SHANE | 1766 | §103 | Non-Final OA | — | Pending | Sep 27, 2023 |
| 18372163 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | COSGROVE, JAYSON D | 1737 | §102§103 | Final Rejection | — | Pending | Sep 25, 2023 |
| 18551755 | METHOD FOR PRODUCING CHROMATOGRAPHY CARRIER, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CHROMATOGRAPHY CARRIER | MCGANN, BERNADETTE KAREN | 1773 | §102§103§112DP | Non-Final OA | — | Pending | Sep 21, 2023 |
| 18551116 | METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE | CALDERON, DAVID ANDREW | 1742 | §102§103§112 | Non-Final OA | — | Pending | Sep 18, 2023 |
| 18239399 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND | EOFF, ANCA | 1722 | §102 | Non-Final OA | — | Pending | Aug 29, 2023 |
| 18277113 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | CHU, JOHN S Y | 1737 | §103 | Final Rejection | 30d | Pending | Aug 14, 2023 |
| 18271715 | METHOD FOR CULTURING HUMAN HEPATIC PARENCHYMAL CELL, CULTURED HUMAN HEPATIC PARENCHYMAL CELL, CULTURE MEDIUM AND METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING CULTURE SUPERNATANT OF HUMAN HEPATIC NONPARENCHYMAL CELL | LEONARD, ARTHUR S | 1631 | §103 | Final Rejection | 29d | Pending | Jul 11, 2023 |
| 18218193 | COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE | CHU, JOHN S Y | 1737 | §103§112 | Non-Final OA | — | Pending | Jul 05, 2023 |
| 18270256 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | CHAMPION, RICHARD DAVID | 1737 | §102§103 | Final Rejection | — | Pending | Jun 29, 2023 |
| 18209751 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | KIFLE, BRUCK | 1624 | §102§112 | Final Rejection | — | Pending | Jun 14, 2023 |
| 18266061 | RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN | ANGEBRANNDT, MARTIN J | 1737 | §102§103§112 | Final Rejection | — | Pending | Jun 08, 2023 |
| 18198971 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | ANGEBRANNDT, MARTIN J | 1737 | §103 | Final Rejection | — | Pending | May 18, 2023 |
| 18197225 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND | CUTLIFF, YATE KAI RENE | 1692 | §112 | Non-Final OA | — | Pending | May 15, 2023 |
| 18135838 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | MALLOY, ANNA E | 1737 | §102§103§112 | Final Rejection | — | Pending | Apr 18, 2023 |
| 18125934 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | ZHANG, RUIYUN | 1782 | §102§103§112 | Final Rejection | 72d | Pending | Mar 24, 2023 |
| 18025989 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | TRAYWICK, ANDREW PRESTON | 1737 | §103 | Final Rejection | 30d | Pending | Mar 13, 2023 |
| 17792348 | KIDNEY REGENERATION ACCELERATOR AND PRODUCTION METHOD FOR SAME | MELLER, MICHAEL V | 1655 | §103 | Non-Final OA | — | Pending | Jul 12, 2022 |
| 17614753 | MACROPHAGE IMAGING AGENT | WESTERBERG, NISSA M | 1618 | §103§112 | Non-Final OA | 12d | Pending | Nov 29, 2021 |
| 17506740 | PHOTOSENSITIVE RESIN COMPOSITION | CHAMPION, RICHARD DAVID | 1737 | §103§112 | Final Rejection | — | Pending | Oct 21, 2021 |
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