Prosecution Insights
Last updated: August 16, 2026

JSR Corporation

26 pending office actions • 12 art units • 20 examiners • 0 of 26 (0%) have an AI response strategy ready • 16 patents granted in the last 365 days

Portfolio Summary

26
Total Pending OAs
18
Non-Final OAs
8
Final Rejections
0
Advisory / Quayle

Response Deadline Pressure

Based on the USPTO statutory response window for each pending office action. 4 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.

0
Overdue
0
Due this week
3
Due this month
0
Due in next 60 days
1
Due later

Deadline Fire Line

Every pending office action with a known statutory deadline, placed on a days-until-due axis. Dots left of Today are overdue; the further right, the more runway. Cases that share a deadline window stack vertically. 4 of the docket's apps have a known mailing date.

-30dToday30d60d90d120d
Due ≤ 30 days (3)Due later (1)

Case Difficulty Mix

Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.

11
Hard (42%)
14
Medium (54%)
1
Easy (4%)
0
Unknown (0%)

Rejection Statute Mix

BucketCases
§101 + other1 (4%)
§103 only8 (31%)
§102 only5 (19%)
§112 only1 (4%)
Double-patenting + other1 (4%)
Multi-statute (no §101)10 (38%)

Industry Mix

How the docket's pending cases split across USPTO tech-center bands.

20
Life Sciences
77% of docket
1
Information Tech
4% of docket
0
Communications
0% of docket
0
Semiconductors
0% of docket
0
Mechanical / Eng
0% of docket
5
Business / Other
19% of docket

Time-on-OA Estimate

Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.

260 h
Manual time on pending OAs
52 h
Time saved (low, 20%)
91 h
Time saved (mid, 35%)
2.3 wks
FTE-weeks freed (mid)

Top Examiners on this docket

ExaminerApps on this docketAllow rateInterview lift
MALLOY, ANNA E 3 46.2% -4.9%
FRASER, STEWART A 2 86.0% +14.3%
EOFF, ANCA 2 80.0% +11.0%
ANGEBRANNDT, MARTIN J 2 55.4% +34.2%
TRAYWICK, ANDREW PRESTON 2 71.0% +28.5%
TRAN, BINH X 1 81.6% +11.9%
BURKHART, MICHAEL D 1 62.2% +11.5%
CHACKO DAVIS, DABORAH 1 71.9% +20.7%
MCCLENDON, SANZA L 1 80.6% +10.6%
FANG, SHANE 1 76.3% +18.8%

Quick Wins (5)

Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 5 ordered by deadline are shown.

App #TitleExaminerDue in
18870440 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD TRAN, BINH X
18574367 RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND FRASER, STEWART A
18284345 RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD MCCLENDON, SANZA L
18239399 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND EOFF, ANCA
18239373 COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER EOFF, ANCA

Hard Cases (11)

Multi-statute / §101-driven matters, or cases in front of an examiner with an allow rate under 30%. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
17614753 MACROPHAGE IMAGING AGENT WESTERBERG, NISSA M 12d
18391906 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION MALLOY, ANNA E 13d
17807079 CALCULATION METHOD, CALCULATOR SYSTEM, AND CALCULATOR KEATON, SHERROD L 76d
18613608 ORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD BURKHART, MICHAEL D
18509611 SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION FRASER, STEWART A
18551116 METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE CALDERON, DAVID ANDREW
18266061 RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN ANGEBRANNDT, MARTIN J
18198954 SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE OLADAPO, TAIWO

Interview Candidates (13)

Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 8 ordered by deadline are shown.

App #TitleExaminerDue in
18025989 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN TRAYWICK, ANDREW PRESTON 30d
18870440 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD TRAN, BINH X
18613608 ORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD BURKHART, MICHAEL D
18435001 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION CHACKO DAVIS, DABORAH
18574367 RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND FRASER, STEWART A
18509611 SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION FRASER, STEWART A
18284345 RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD MCCLENDON, SANZA L
18373415 POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT FANG, SHANE

Top Art Units

Art UnitApps
1737 8
1766 2
1722 2
1638 1
1765 1
1742 1
1771 1
1692 1
1653 1
1655 1

Pending Office Actions

App #TitleExaminerArt UnitStatutesStatusDue inAIFiled
18870440 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD TRAN, BINH X §103 Non-Final OA Pending Nov 28, 2024
18613608 ORGANOID PRODUCTION METHOD, CULTURE MEDIUM FOR ORGANOID PRODUCTION, ORGANOID, AND TEST SUBSTANCE EVALUATION METHOD BURKHART, MICHAEL D 1638 §102§112 Non-Final OA Pending Mar 22, 2024
18435001 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION CHACKO DAVIS, DABORAH §103 Non-Final OA Pending Feb 07, 2024
18574367 RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND FRASER, STEWART A §103 Non-Final OA Pending Dec 27, 2023
18391906 METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION MALLOY, ANNA E 1737 §102§103 Final Rejection 13d Pending Dec 21, 2023
18528951 SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION MALLOY, ANNA E §102§103DP Non-Final OA Pending Dec 05, 2023
18509611 SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION FRASER, STEWART A §102§103Other Non-Final OA Pending Nov 15, 2023
18284345 RADIATION-SENSITIVE COMPOSITION FOR FORMING INSULATION FILM, RESIN FILM HAVING PATTERN, AND SEMICONDUCTOR CIRCUIT BOARD MCCLENDON, SANZA L 1765 §102 Non-Final OA Pending Sep 27, 2023
18373415 POLYMER, COMPOSITION, CURED PRODUCT, LAMINATE, AND ELECTRONIC COMPONENT FANG, SHANE 1766 §103 Non-Final OA Pending Sep 27, 2023
18551116 METHOD FOR PRODUCING CARRIER FOR CHROMATOGRAPHIC USE, METHOD FOR PRODUCING CHROMATOGRAPHY COLUMN, AND CARRIER FOR CHROMATOGRAPHIC USE CALDERON, DAVID ANDREW 1742 §102§103§112 Non-Final OA Pending Sep 18, 2023
18244460 COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER NGUYEN, HA S 1766 §102 Non-Final OA Pending Sep 11, 2023
18239399 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND EOFF, ANCA 1722 §102 Non-Final OA Pending Aug 29, 2023
18239373 COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLYMER, AND METHOD FOR MANUFACTURING POLYMER EOFF, ANCA 1722 §102 Non-Final OA Pending Aug 29, 2023
18266061 RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN ANGEBRANNDT, MARTIN J 1737 §102§103§112 Final Rejection Pending Jun 08, 2023
18198954 SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE OLADAPO, TAIWO 1771 §102§103 Final Rejection Pending May 18, 2023
18198971 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND ANGEBRANNDT, MARTIN J 1737 §103 Final Rejection Pending May 18, 2023
18197225 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND CUTLIFF, YATE KAI RENE 1692 §112 Non-Final OA Pending May 15, 2023
18135838 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND MALLOY, ANNA E 1737 §102§103§112 Final Rejection Pending Apr 18, 2023
18025989 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN TRAYWICK, ANDREW PRESTON 1737 §103 Final Rejection 30d Pending Mar 13, 2023
17800784 COMPOSITION FOR ALLEVIATING PULMONARY HYPERTENSION, METHOD FOR PREDICTING PROGNOSIS OF PULMONARY HYPERTENSION, METHOD FOR ASSISTING IN DETERMINING SEVERITY OF PULMONARY HYPERTENSION, AND METHOD FOR ASSISTING IN DIAGNOSING PULMONARY HYPERTENSION IANNUZO, NATALIE NMN 1653 §102§103 Non-Final OA Pending Feb 23, 2023
18100031 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND ROBINSON, CHANCEITY N 1737 §102 Non-Final OA Pending Jan 23, 2023
17961611 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE TRAYWICK, ANDREW PRESTON 1737 §103 Non-Final OA Pending Oct 07, 2022
17792348 KIDNEY REGENERATION ACCELERATOR AND PRODUCTION METHOD FOR SAME MELLER, MICHAEL V 1655 §103 Non-Final OA Pending Jul 12, 2022
17807079 CALCULATION METHOD, CALCULATOR SYSTEM, AND CALCULATOR KEATON, SHERROD L 2148 §101§103Other Non-Final OA 76d Pending Jun 15, 2022
17614753 MACROPHAGE IMAGING AGENT WESTERBERG, NISSA M 1618 §103§112 Final Rejection 12d Pending Nov 29, 2021
17506740 PHOTOSENSITIVE RESIN COMPOSITION CHAMPION, RICHARD DAVID 1737 §103§112 Final Rejection Pending Oct 21, 2021

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