DETAILED CORRESPONDENCE
This Office action is in response to the application received August 14, 2023.
Claim Rejections - 35 USC § 102
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention.
(a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention.
Claim Rejections - 35 USC § 103
The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action:
A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made.
The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows:
1. Determining the scope and contents of the prior art.
2. Ascertaining the differences between the prior art and the claims at issue.
3. Resolving the level of ordinary skill in the pertinent art.
4. Considering objective evidence present in the application indicating obviousness or nonobviousness.
Claims 1-9 are rejected under 35 U.S.C. 103 as being unpatentable over the combination of TAKEDA et al (2002/0039701), HATAKEYAMA et al, (2021/0080828) KATO et al (2020/0393756).
The claimed invention recites the following:
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TAKEDA et al report a positive photosensitive resin composition comprising a polymer comprising a benzyl cyclopentyl methacrylate with a hydroxystyrene the composition further contains a photoacid generator and basic compound, see page 10, column [0138] to [0140]:
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.
TAKEDA et al lack additional recite comonomers such as a lactone methacrylate as recited in claim 6 and a photoacid generator having iodine substituents.
HATAKEYAMA et al disclose a resist composition comprising a copolymer having lactone ring containing (meth)acrylate monomers, see page 88. These monomers provide adhesive properties to the copolymer to adhere to the substrate.
HATAKEYAMA et al further disclose iodine substituted photoacid generators shown on page 88, para. [0185] to PAG 2:
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Claims 2-5 are met by the disclose PAG2 above having an iodine substituent, the anion being a sulfonate, and the comonomer in TAKEDA et al being benzyl cyclopentyl methacrylate and the comonomer in TAKEDA et al being a hydroxystyrene.
Claims 6 for the lactone methacrylate as disclosed by HATAKEYAMA et al as seen in Polymer 4 on page 88:
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Claims 7 is met by the disclosure in KATO et al (2020/0393756) for the hydrophobic resin found on page 41, Table 1, Examples 1-4 shown below:
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Claims 8 and 9 are met by the method as disclosed in either of TAKEDA et al at para. [0158] to [0159] and/or HATAKEYAMA et al, para. [0188] and the exposure to EUV or EB as disclosed in para. [0168]:
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It would have been prima facie obvious to one of ordinary skill in the art of photosensitive composition having a copolymer as disclosed in TAKEDA et al for a photoresist composition and add known comonomers such as a butyrolactone methacrylate to improve adhesion of the copolymer to the substrate, add an iodine substituted photoacid generator to give improved sensitivity to EUV and EB radiation with the reasonable expectation of same or similar results for high sensitivity, suppression of acid diffusion, improved resolution LWR and CDU.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex.
If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Mark Huff, can be reached at telephone number 571-272-1385. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
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Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
/John S. Chu/ Primary Examiner, Art Unit 1737
J. Chu
March 21, 2026
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