Prosecution Insights
Last updated: April 19, 2026
Application No. 18/336,358

Semiconductor Package

Non-Final OA §103
Filed
Jun 16, 2023
Examiner
VALENZUELA, PATRICIA D
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Wolfspeed, Inc.
OA Round
1 (Non-Final)
90%
Grant Probability
Favorable
1-2
OA Rounds
2y 4m
To Grant
92%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allow Rate
645 granted / 715 resolved
+22.2% vs TC avg
Minimal +2% lift
Without
With
+2.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
63 currently pending
Career history
778
Total Applications
across all art units

Statute-Specific Performance

§101
1.3%
-38.7% vs TC avg
§103
60.1%
+20.1% vs TC avg
§102
19.9%
-20.1% vs TC avg
§112
8.6%
-31.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 715 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of claims 1-7, 9-11, 16, 18-23, 25, and 28 in the reply filed on 11/04/25 is acknowledged. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-7, 9-11, 16, 18-23, 25, and 28 is/are rejected under 35 U.S.C. 103 as being unpatentable over Chen(USPGPUB DOCUMENT: 2018/0342438, hereinafter Chen) in view of Watts (USPGPUB DOCUMENT: 2021/0313286, hereinafter Watts). Re claim 1 Chen discloses in Fig 2a/2b/2c, rotated 180 degrees, a semiconductor package, comprising: a submount(130) having a first surface(top/bottom) and a second surface(top/bottom) opposing the first surface(top/bottom); at least one semiconductor die(120) attached to the second surface(top/bottom) of submount(130); an insulating portion(150)[0038] on the second surface(top/bottom) of the submount(130) and on the at least one semiconductor die(120), the insulating portion(150)[0038] forming a first external surface(surface formed from 130/150) of the semiconductor package; and at least one through-mold terminal(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to at least one of the semiconductor die(120) or the submount(130). Chen does not disclose through-mold via Watts discloses in Fig 2a, rotated 180 degrees, through-mold via(left/middle/right 290) It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Watts to the teachings of Chen in order to increase the output power and current handling capabilities [0005, Watts]. Re claim 2 Chen and Watts disclose the semiconductor package of claim 1, wherein the first surface(top/bottom) of the submount(130) is a second external surface(surface formed from 130/150) of the semiconductor package, the second external surface(surface formed from 130/150) opposing the first external surface(surface formed from 130/150). Re claim 3 Chen and Watts disclose the semiconductor package of claim 2, wherein the at least one through-mold via(213/217/215) comprises a plurality of through-mold via(213/217/215)s, wherein the semiconductor package further comprises a plurality of interconnect structures, each interconnect structure coupled to at least one of the plurality of through-mold via(213/217/215)s, each interconnect structure on the first external surface(surface formed from 130/150) of the semiconductor package. Re claim 4 Chen and Watts disclose the semiconductor package of claim 3, wherein all interconnect structures for the semiconductor package are on the first external surface(surface formed from 130/150) to provide a flip-chip configuration for the semiconductor package. Re claim 5 Chen and Watts disclose the semiconductor package of claim 3, wherein each interconnect structure comprises a solder pad or a solder bump[0060 of Watts]. Re claim 6 Chen and Watts disclose the semiconductor package of claim 1, wherein the at least one semiconductor die(120) comprises a first die surface(top/bottom) and a second die surface(top/bottom) opposing the first die surface(top/bottom), the first die surface(top/bottom) having a first die contact and the second die surface(top/bottom) having a second die contact. Re claim 7 Chen and Watts disclose the semiconductor package of claim 6, wherein the first die contact is coupled to the submount(130). Re claim 9 Chen and Watts disclose the semiconductor package of claim 6, wherein the at least one through-mold via(213/217/215) is coupled to the second die contact. Re claim 10 Chen and Watts disclose the semiconductor package of claim 6, wherein the at least one through- mold via(213/217/215) comprises:a first through-mold via(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to the second die contact on the at least one semiconductor die(120); anda second through-mold via(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to the submount(130), the second through-mold via(213/217/215) electrically coupled to the first die contact through the submount(130). Re claim 11 Chen and Watts disclose the semiconductor package of claim 10, wherein the at least one semiconductor die(120) comprises a third die contact on the second die;wherein the at least one through-mold via(213/217/215) comprises: a third through-mold via(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to the third die contact. Re claim 16 Chen and Watts disclose the semiconductor package of claim 1, wherein the submount(130) comprises a plurality of metal layers[0063 of Watts] with an isolating layer between the plurality of metal layers[0063 of Watts]. Re claim 18 Chen and Watts disclose the semiconductor package of claim 1, wherein the submount(130) forms a thermally conductive cooling layer[0009 of Watts] for the semiconductor package. Re claim 19 Chen and Watts disclose the semiconductor package of claim 1, wherein the semiconductor package comprises a plurality of semiconductor die(120), wherein the semiconductor package further comprises a redistribution layer[0064 of Watts] coupling the at least one through-mold via(213/217/215) to the plurality of semiconductor die(120). Re claim 20 Chen and Watts disclose the semiconductor package of claim 1, wherein the semiconductor package does not include any wire bonds to the at least one semiconductor die(120). Re claim 21 Chen and Watts disclose the semiconductor package of claim 1, wherein the insulating portion(150)[0038] covers the at least one semiconductor die(120). Re claim 22 Chen and Watts disclose the semiconductor package of claim 1, wherein the insulating portion(150)[0038] comprises an epoxy mold compound[0036]. Re claim 23 Chen and Watts disclose the semiconductor package of claim 1, wherein the at least one semiconductor die(120) comprises a wide band gap semiconductor, wherein the wide band gap semiconductor is silicon carbide or a Group III-nitride[0024 of Watts]. Re claim 25 Chen and Watts disclose the semiconductor package of claim 1, wherein the at least one semiconductor die(120) comprises a silicon carbide-based MOSFET, a silicon carbide-based Schottky diode[0066 of Watts], or a Group III-nitride[0024 of Watts] based high electron mobility transistor. Re claim 28 Chen discloses in Fig 2a/2b/2c, rotated 180 degrees, a semiconductor package, comprising: a submount(130) having a first surface(top/bottom) and a second surface(top/bottom), the second surface(top/bottom) opposing the first surface(top/bottom); at least one semiconductor die(120), the at least one semiconductor die(120) comprising a first die surface(top/bottom) and a second die surface(top/bottom) having a source contact[0061] and a gate contact[0064], the drain contact being coupled to the first surface(top/bottom) of the submount(130); an insulating portion(150)[0038] on the submount(130) and on the semiconductor die(120), the insulating portion(150)[0038] forming a first external surface(surface formed from 130/150) of the semiconductor package; a first through-mold terminal(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to the gate contact[0064]; a second through-mold terminal(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038]; and a third through-mold terminal(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to the submount(130), Chen does not disclose the at least one semiconductor die(120) comprising a first die surface(top/bottom) having a drain contact; a second through-mold via(213/217/215) extending from the first external surface(surface formed from 130/150) through the insulating portion(150)[0038] to the drain contact; wherein the drain contact is coupled to the third through-mold via(213/217/215) with the submount(130). Watts discloses in Fig 2a, rotated 180 degrees, the at least one semiconductor die(210) comprising a first die surface(top/bottom) having a drain contact(253); a second through-mold via(left/middle/right 290) It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Watts to the teachings of Chen in order to increase the output power and current handling capabilities [0005, Watts]. In doing so, a second through-mold via(left/middle/right 290 of Watts) extending from the first external surface(surface formed from 130/150 of Chen) through the insulating portion(150)[0038 of Chen] to the drain contact(253 of Watts); wherein the drain contact(253 of Watts) is coupled to the third through-mold via(213/217/215 of Chen) with the submount(130 of Chen). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to PATRICIA D VALENZUELA whose telephone number is (571)272-9242. The examiner can normally be reached Monday-Friday 10am-6pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William Partridge can be reached at 571-270-1402. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /PATRICIA D VALENZUELA/Primary Examiner, Art Unit 2812
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Prosecution Timeline

Jun 16, 2023
Application Filed
Feb 07, 2026
Non-Final Rejection — §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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SEMICONDUCTOR CHIP AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME
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ELECTRICALLY ISOLATED DISCRETE PACKAGE WITH HIGH PERFORMANCE CERAMIC SUBSTRATE
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
90%
Grant Probability
92%
With Interview (+2.1%)
2y 4m
Median Time to Grant
Low
PTA Risk
Based on 715 resolved cases by this examiner. Grant probability derived from career allow rate.

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