DETAILED ACTION
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Claim Rejections - 35 USC § 102
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention.
Claim(s) 1-8, is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by U. S. Patent Application Publication No. 2021/0096465 (hereinafter referred to as Fukushima).
Fukushima, in abstract, [0005], [0012]-[0017], [0021]-[0026], discloses a chemically amplified resist composition that comprises a polymer that has acid labile groups i.e., the groups, under the action of acid, increases its solubility in an alkaline developer, wherein the polymer has the following recurring unit (a), see below,
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198
193
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Greyscale
wherein AL1, includes (a2), see below,
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147
261
media_image2.png
Greyscale
And R8 is a hydrocarbyl, and Fukushima in [0051], discloses that the polymer with the (a2) recurring unit can include the following,
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403
354
media_image3.png
Greyscale
,
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398
372
media_image4.png
Greyscale
,
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329
386
media_image5.png
Greyscale
,
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297
384
media_image6.png
Greyscale
, and is the same structure recited as (A1). Fukushima, in [0017], discloses that the polymer includes recurring units, see below,
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201
164
media_image7.png
Greyscale
and is the same as the claimed (B1). Fukushima, in [0056], and [0097]-[0098], discloses that the recurring unit adapted to generate acid upon exposure can be in an amount of 0.01 fractional unit and is approximately zero i.e., the polymer can be easily adapted to lack repeat units that generate acid upon exposure. Fukushima, in [0116], discloses that the chemically amplified resist composition includes a photoacid generator, and in [0117]-[0122], and [0124], discloses the following as the photoacid generator in the composition, see below,
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137
187
media_image8.png
Greyscale
and is the same cation as the Xa+ recited as (Xa-1) in claim 2, wherein the anion X-, includes, see below,
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95
279
media_image9.png
Greyscale
wherein R104 can be CF3, and R105 can be a hydrocarbyl, and is the same as the formula recited as (PAG-a), and discloses the following structures as the anion of the photoacid generator, see below,
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121
219
media_image10.png
Greyscale
,
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87
213
media_image11.png
Greyscale
,
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media_image12.png
111
259
media_image12.png
Greyscale
,
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108
310
media_image13.png
Greyscale
etc.
Fukushima, in [0131]-[0138], discloses that the resist composition can include photoacid generator of the following formula, see below,
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164
354
media_image14.png
Greyscale
and is the same as the structure recited as (PAG-b) (claim 1). Fukushima, in [0021],[0081]-[0091], discloses that the polymer in the chemically amplified resist composition, includes recurring units, see below,
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189
192
media_image15.png
Greyscale
,
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187
190
media_image16.png
Greyscale
and is the same as the claimed (a1) and (a2) recited in claim 3, wherein AL2 and AL3 are acid labile groups that are free of multiple bonds (do not have triple bond). Fukushima, in [0022], [0092]-[0094], discloses that the polymer in the resist composition further includes a recurring unit, see below,
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203
201
media_image17.png
Greyscale
wherein Ap includes a phenolic hydroxy moiety or a lactone ring or carbonate bond or ester bond or ether bond or carboxylic anhydride and is the same as the structure recited as (C1) in claim 4. Fukushima, in [0024], discloses that the resist composition includes an organic solvent, a quencher and a surfactant (claims 5-7). Fukushima, in [0025]-[0026], discloses forming a pattern using the resist composition by applying the resist composition to a substrate to form a resist film and exposing the resist film to high energy radiation such as the claimed EUV or EB or KrF excimer laser or ArF excimer laser, followed by developing the exposed resist film in a developer (claim 8).
Conclusion
Any inquiry concerning this communication or earlier communications from the examiner should be directed to Daborah Chacko-Davis whose telephone number is (571) 272-1380. The examiner can normally be reached on 9:30AM-6:00PM EST Mon-Fri. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Sally A. Merkling can be reached on (571) 272-6297. The fax phone number for the organization where this application or proceeding is assigned is 571-272-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000.
/DABORAH CHACKO-DAVIS/Primary Examiner, Art Unit 1737 June 10, 2026.
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