Prosecution Insights
Prosecution Insights
Tech Center 1700 • Art Units: 1722 1737 1795
This examiner grants 72% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18192316 | ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 18125923 | SUBSTRATE PROCESSING METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17888729 | PHOTOMASK AND CORRECTING METHOD FOR EXPOSING APPARATUS USING PHOTOMASK | Non-Final OA | Samsung Display Co., LTD. |
| 18270789 | MASK BLANK, METHOD FOR MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | Non-Final OA | HOYA CORPORATION |
| 18662967 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | Innolux Corporation |
| 18093121 | CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 18137288 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18216168 | METHOD OF FORMING PHOTOSENSITIVE ORGANOMETALLIC OXIDES BY CHEMICAL VAPOR POLYMERIZATION | Non-Final OA | Tokyo Electron Limited |
| 18022213 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17989438 | Self Aligned Multiple Patterning Method | Non-Final OA | Tokyo Electron Limited |
| 17887946 | PROVIDING A BARRIER LAYER FOR PHOTORESIST PROCESSING | Non-Final OA | Tokyo Electron Limited |
| 18234049 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18317019 | Novel Sulfonium Salt, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18316979 | Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 17905632 | STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERMETIC OVERLAYER | Final Rejection | Lam Research Corporation |
| 18012736 | EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION | Non-Final OA | NISSAN CHEMICAL CORPORATION |
| 18009874 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS | Final Rejection | NISSAN CHEMICAL CORPORATION |
| 18258453 | METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18308670 | PHOTOMASK STRUCTURE | Non-Final OA | United Microelectronics Corp. |
| 18141952 | METHOD FOR ADJUSTING LOCAL THICKNESS OF PHOTORESIST | Non-Final OA | Shanghai Huali Integrated Circuit Corporation |
| 17912202 | SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE | Non-Final OA | ASML HOLDING N.V. |
| 18088843 | AZASTANNATRANES, STANNATRANES, AND METHODS OF PREPARATION AND USE THEREOF | Non-Final OA | Gelest, Inc. |
| 18123420 | LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR MAKING LOW INTENSITY PHOTOMASK FOR USE IN FLAT PANEL DISPLAY LITHOGRAPHY | Non-Final OA | PHOTRONICS, INC. |
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