Tech Center 1700 • Art Units: 1722 1737 1795
This examiner grants 72% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18312825 | CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE PHOTORESIST COMPOSITION | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18192316 | ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME | Non-Final OA | Samsung Electronics Co., Ltd. |
| 18191597 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | FUJIFILM Corporation |
| 18093121 | CHARACTERIZATION OF PHOTOSENSITIVE MATERIALS | Non-Final OA | Applied Materials, Inc. |
| 18200495 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMPOSITION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18137288 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18662967 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE | Final Rejection | Innolux Corporation |
| 18022213 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | Tokyo Electron Limited |
| 17943926 | PATTERNING A SEMICONDUCTOR WORKPIECE | Non-Final OA | Tokyo Electron Limited |
| 17943729 | Hybrid Development of EUV Resists | Non-Final OA | Tokyo Electron Limited |
| 17887946 | PROVIDING A BARRIER LAYER FOR PHOTORESIST PROCESSING | Non-Final OA | Tokyo Electron Limited |
| 18234049 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | Non-Final OA | Shin-Etsu Chemical Co., Ltd. |
| 18316979 | Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 18317019 | Novel Sulfonium Salt, Resist Composition, And Patterning Process | Non-Final OA | SHIN-ETSU CHEMICAL CO., LTD. |
| 17882705 | RETICLE COVERING PELLICLE FOR PHOTOLITHOGRPHY SCANNER | Final Rejection | Taiwan Semiconductor Manufacturing Company |
| 17905632 | STRUCTURE AND METHOD TO ACHIEVE POSITIVE TONE DRY DEVELOP BY A HERMETIC OVERLAYER | Final Rejection | Lam Research Corporation |
| 18258453 | METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS | Non-Final OA | TOKYO OHKA KOGYO CO., LTD. |
| 18821200 | TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SOLUTION, PATTERN FORMING METHOD, THIN FILM, PATTERNED THIN FILM, AND METHOD FOR PRODUCING SUBSTRATE | Final Rejection | Gelest, Inc. |
| 18088843 | AZASTANNATRANES, STANNATRANES, AND METHODS OF PREPARATION AND USE THEREOF | Non-Final OA | Gelest, Inc. |
| 18141952 | METHOD FOR ADJUSTING LOCAL THICKNESS OF PHOTORESIST | Non-Final OA | Shanghai Huali Integrated Circuit Corporation |
| 18009874 | RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS | Final Rejection | NISSAN CHEMICAL CORPORATION |
| 17912202 | SYSTEMS AND METHODS FOR FORMING STRUCTURES ON A SURFACE | Non-Final OA | ASML HOLDING N.V. |
| 18340334 | BLANK MASK AND PHOTOMASK USING THE SAME | Non-Final OA | SK enpulse Co., Ltd. |
| 18123420 | LOW INTENSITY PHOTOMASK AND SYSTEM, METHOD AND PROGRAM PRODUCT FOR MAKING LOW INTENSITY PHOTOMASK FOR USE IN FLAT PANEL DISPLAY LITHOGRAPHY | Non-Final OA | PHOTRONICS, INC. |
| 17396167 | SOLUBLE POLYIMIDES AND DIIMIDES FOR SPIN-ON CARBON APPLICATIONS | Non-Final OA | Brewer Science, Inc. |
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