Prosecution Insights
Last updated: July 17, 2026
Application No. 18/383,526

TRANSISTOR AND DISPLAY DEVICE

Final Rejection §102
Filed
Oct 25, 2023
Priority
Sep 16, 2009 — JP 2009-215084 +4 more
Examiner
KIM, JAY C
Art Unit
2815
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Semiconductor Energy Laboratory Co., Ltd.
OA Round
4 (Final)
49%
Grant Probability
Moderate
5-6
OA Rounds
9m
Est. Remaining
71%
With Interview

Examiner Intelligence

Grants 49% of resolved cases
49%
Career Allowance Rate
421 granted / 861 resolved
-19.1% vs TC avg
Strong +22% interview lift
Without
With
+21.7%
Interview Lift
resolved cases with interview
Typical timeline
3y 6m
Avg Prosecution
42 currently pending
Career history
921
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
64.7%
+24.7% vs TC avg
§102
8.7%
-31.3% vs TC avg
§112
25.2%
-14.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 861 resolved cases

Office Action

§102
DETAILED ACTION This Office Action is in response to Amendment filed May 4, 2026. The present application is being examined under the pre-AIA first to invent provisions. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of pre-AIA 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (b) the invention was patented or described in a printed publication in this or a foreign country or in public use or on sale in this country, more than one year prior to the date of application for patent in the United States. Claim 3 is rejected under pre-AIA 35 U.S.C. 102(b) as being anticipated by Kim et al. (“Effect of indium composition ratio on solution-processed nanocrystalline InGaZnO thin film transistors,” APPLIED PHYSICS LETTERS 94 (2009) 233501) Kim et al. disclose a semiconductor device (Title) comprising: a transistor (InGaZnO thin film transistor) comprising an oxide semiconductor layer (InGaZnO) comprising a channel formation region, wherein the oxide semiconductor layer comprises an In-Ga-Zn-O-based oxide semiconductor, wherein the oxide semiconductor layer has a first region (one of two upper regions of InGaZnO illustrated below) in a superficial portion that includes a first crystal that is c-axis-oriented in a direction perpendicular to a surface of the oxide semiconductor layer, because (a) Kim et al. further disclose that “This obstructs c-axis growth of IGZO resulting in a decrease of the grain size” on lines 3-4 of the right column of page 233501-2, which suggests that c-axis growth of the (polycrystalline or nanocrystalline) InGaZnO crystals mentioned on lines 9-18 of the left column of page 233501-2 is obstructed such that the InGaZnO crystals have decreased grain size in the c-axis direction or the direction perpendicular to the surface of the oxide semiconductor layer while the InGaZnO crystals are depositing and growing along the c-axis direction, and (b) in addition, the “(000l) orientation of InGaO3(ZnO)2 by x-ray diffraction pattern” mentioned on lines 17-18 of the left column of page 233501-2 includes the (0001) orientation with l = 1, which is the claimed c-axis orientation, wherein the oxide semiconductor layer includes a second region (one of two lower regions of InGaZnO illustrated below) including a second crystal under the first region, because Applicants do not specifically claim what the first and second region each refers to, how thick each of the first and second region is, wherein the first region overlaps with the second region in plan view, and wherein the second region includes microcrystals (nanocrystals of polycrystalline or nanocrystalline InGaZnO) with a particle size of from 1 nm to 20 nm (~ 14.7 nm or ~ 7.6 nm on lines 21-24 of the left column of page 233501-2). PNG media_image1.png 172 295 media_image1.png Greyscale PNG media_image2.png 294 172 media_image2.png Greyscale Response to Arguments Applicants’ arguments with respect to claim 3 have been considered but are moot because the new ground of rejection does not rely on any reference applied in the prior rejection of record for any teaching or matter specifically challenged in the argument. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Li et al. (US 8,449,983) Umeda et al. (US 8,343,800) Applicants' amendment necessitated the new ground of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicants are reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JAY C KIM whose telephone number is (571) 270-1620. The examiner can normally be reached 8:00 AM - 6:00 PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua Benitez can be reached on (571) 270-1435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /JAY C KIM/Primary Examiner, Art Unit 2815 /J. K./Primary Examiner, Art Unit 2815 May 29, 2026
Read full office action

Prosecution Timeline

Show 1 earlier event
Feb 12, 2025
Non-Final Rejection mailed — §102
May 05, 2025
Response Filed
May 20, 2025
Final Rejection mailed — §102
Aug 19, 2025
Request for Continued Examination
Aug 22, 2025
Response after Non-Final Action
Feb 06, 2026
Non-Final Rejection mailed — §102
May 04, 2026
Response Filed
Jun 03, 2026
Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12685044
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
4y 10m to grant Granted Jul 14, 2026
Patent 12672528
METHOD OF FABRICATING SEMICONDUCTOR DEVICE
4y 3m to grant Granted Jun 30, 2026
Patent 12666611
METHOD FOR MANUFACTURING HIGH-DENSITY THREE-DIMENSIONAL PROGRAMMABLE MEMORY
3y 10m to grant Granted Jun 23, 2026
Patent 12648405
METHOD OF MANUFACTURING SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
2y 12m to grant Granted Jun 02, 2026
Patent 12615923
ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
5y 3m to grant Granted Apr 28, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

5-6
Expected OA Rounds
49%
Grant Probability
71%
With Interview (+21.7%)
3y 6m (~9m remaining)
Median Time to Grant
High
PTA Risk
Based on 861 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month