Prosecution Insights
Last updated: July 17, 2026
Application No. 18/430,866

Power Semiconductor Devices with Stacked Layers

Non-Final OA §103
Filed
Feb 02, 2024
Examiner
VALENZUELA, PATRICIA D
Art Unit
2812
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Wolfspeed Inc.
OA Round
1 (Non-Final)
90%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
92%
With Interview

Examiner Intelligence

Grants 90% — above average
90%
Career Allowance Rate
647 granted / 717 resolved
+22.2% vs TC avg
Minimal +2% lift
Without
With
+2.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
63 currently pending
Career history
794
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
86.7%
+46.7% vs TC avg
§102
4.8%
-35.2% vs TC avg
§112
1.8%
-38.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 717 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant's election with traverse of claims 1-8, 10, 11, 15-22, 39 in the reply filed on 05/14/26 is acknowledged. The traversal is on the ground(s) that that there is no serious burden in examining the listed inventions simultaneously. This is not found persuasive because classification is one avenue where a search may pose a burden. The requirement is still deemed proper and is therefore made FINAL. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-8, 10, 11, 15-22, 39 is/are rejected under 35 U.S.C. 103 as being unpatentable over Mahmoud(USPGPUB DOCUMENT: 2020/0295202, hereinafter Mahmoud) in view of Akiyama (USPGPUB DOCUMENT: 2011/0227068, hereinafter Akiyama). Re claim 1 Mahmoud discloses a semiconductor device, comprising:a substrate(substrate of M1/M2)[0019]; and a plurality of semiconductor layers(110/120/130) on the substrate(substrate of M1/M2)[0019], the plurality of semiconductor layers(110/120/130) in a stacked arrangement. Mahmoud does not discloses the plurality of semiconductor layers(110/120/130) being bonded to one another Akiyama discloses the plurality of semiconductor layers(3/5/1) being bonded to one another [0065] It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Akiyama to the teachings of Mahmoud in order to minimize the crack or chip of the bonded wafer, detachment at the bonded surfaces etc. from being caused by a difference in coefficient of thermal expansion between the wide bandgap semiconductor substrate and the handle substrate. [0014, Akiyama]. Re claim 2 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the plurality of semiconductor layers(110/120/130) comprises:a first semiconductor layer having a first doped region[0019]; a second semiconductor layer having a second doped region[0019]; and wherein the first semiconductor layer and the second semiconductor layer are in the stacked arrangement such that the first doped region[0019] is aligned with the second doped region[0019]. Re claim 3 Mahmoud and Akiyama disclose the semiconductor device of claim 2, wherein the first doped region[0019] and the second doped region[0019] each have a first conductivity type. Re claim 4 Mahmoud and Akiyama disclose the semiconductor device of claim 2, wherein the first doped region[0019] has a first conductivity type and the second doped region[0019] has a second conductivity type. Re claim 5 Mahmoud and Akiyama disclose the semiconductor device of claim 2, wherein the first doped region[0019] and the second doped region[0019] each comprise implanted dopants. Re claim 6 Mahmoud and Akiyama disclose the semiconductor device of claim 2, wherein the first doped region[0019] has a first dopant concentration[0027] and the second doped region[0019] has a second dopant concentration[0027], the first dopant concentration[0027] being different than the second dopant concentration[0027]. Re claim 7 Mahmoud and Akiyama disclose the semiconductor device of claim 2, wherein the plurality of semiconductor layers(110/120/130) comprises a third semiconductor layer having a third doped region[0019], wherein the third semiconductor layer is in the stacked arrangement such that third doped region[0019] is aligned with the first doped region[0019] and the second doped region[0019]. Re claim 8 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the plurality of semiconductor layers(110/120/130) comprises a first semiconductor layer having a first doped region[0019] proximate a first surface of the first semiconductor layer and a second doped region[0019] proximate a second surface of the first semiconductor layer, the second surface of the first semiconductor layer being opposite the first surface of the first semiconductor layer. Re claim 10 Mahmoud and Akiyama disclose the semiconductor device of claim 8, wherein the plurality of semiconductor layers(110/120/130) comprises a second semiconductor layer having a third doped region[0019] proximate a first surface of the second semiconductor layer and a fourth doped region[0019] proximate a second surface of the second semiconductor layer, the second surface of the second semiconductor layer being opposite the first surface of the second semiconductor layer. Re claim 11 Mahmoud and Akiyama disclose the semiconductor device of claim 10, wherein the first semiconductor layer and the second semiconductor layer are in the stacked arrangement such that the first doped region[0019], the second doped region[0019], the third doped region[0019], and the fourth doped region[0019] are aligned. Re claim 15 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein each of the plurality of semiconductor layers(110/120/130) has a thickness[0083] in a range of about 0.05 microns to about 200 microns. Re claim 16 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the plurality of semiconductor layers(110/120/130) each comprise silicon carbide or a Group III-nitride. Re claim 17 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein each of the plurality of semiconductor layers(110/120/130) is a separated portion of one or more wide bandgap epitaxial semiconductor structures. Re claim 18 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein a first semiconductor layer of the plurality of semiconductor layers(110/120/130) is a different material relative to a second semiconductor layer of the plurality of semiconductor layers(110/120/130). Re claim 19 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the substrate(substrate of M1/M2)[0019] comprises silicon carbide. Re claim 20 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the substrate(substrate of M1/M2)[0019] comprises polycrystalline silicon carbide. Re claim 21 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the semiconductor device comprises a JFET[0036], MOSFET, Schottky diode, or an IGBT. Re claim 22 Mahmoud and Akiyama disclose the semiconductor device of claim 1, wherein the semiconductor device comprises a bipolar-CMOS-DMOS device[0056]. Re claim 39 Mahmoud discloses a semiconductor device, comprising:a substrate(substrate of M1/M2)[0019]; a semiconductor structure comprising a plurality of semiconductor layers(110/120/130) on the substrate(substrate of M1/M2)[0019], the plurality of semiconductor layers(110/120/130) in a stacked arrangement; wherein at least one of the plurality of semiconductor layers(110/120/130) comprises a doped column, the doped column having a thickness[0083] of about 2 microns or greater; and a gate contact(14) on the doped column. Mahmoud does not discloses the plurality of semiconductor layers(110/120/130) being bonded to one another Akiyama discloses the plurality of semiconductor layers(3/5/1) being bonded to one another [0065] It would have been obvious to one of ordinary skill in the art before the effective filling date of the invention to apply the teachings of Akiyama to the teachings of Mahmoud in order to minimize the crack or chip of the bonded wafer, detachment at the bonded surfaces etc. from being caused by a difference in coefficient of thermal expansion between the wide bandgap semiconductor substrate and the handle substrate. [0014, Akiyama]. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to PATRICIA D VALENZUELA whose telephone number is (571)272-9242. The examiner can normally be reached Monday-Friday 10am-6pm EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, William Partridge can be reached at 571-270-1402. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /PATRICIA D VALENZUELA/Primary Examiner, Art Unit 2812
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Prosecution Timeline

Feb 02, 2024
Application Filed
Jul 01, 2026
Non-Final Rejection mailed — §103 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
90%
Grant Probability
92%
With Interview (+2.1%)
2y 2m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 717 resolved cases by this examiner. Grant probability derived from career allowance rate.

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