Prosecution Insights
Last updated: July 17, 2026
Application No. 18/433,210

DRY DEPOSITION OF EXTREME ULTRAVIOLET (EUV) UNDERLAYER FOR LITHOGRAPHY AND PATTERNING

Non-Final OA
Filed
Feb 05, 2024
Examiner
OH, JAEHWAN
Art Unit
2899
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Applied Materials Inc.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
568 granted / 669 resolved
+16.9% vs TC avg
Moderate +10% lift
Without
With
+10.2%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 2m
Avg Prosecution
18 currently pending
Career history
687
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
68.3%
+28.3% vs TC avg
§102
19.3%
-20.7% vs TC avg
§112
3.0%
-37.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 669 resolved cases

Prosecution Timeline

Feb 05, 2024
Application Filed
Apr 09, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12685043
REACTIVE-ION DEPOSITION PROCESSES FOR DIELECTRIC MATERIAL FORMATION
2y 11m to grant Granted Jul 14, 2026
Patent 12674233
RHYTHMIC DEPOSITION PRODUCTION METHOD AND EQUIPMENT FOR PEROVSKITE THIN FILM
3y 1m to grant Granted Jul 07, 2026
Patent 12677466
DEEPLY RECESSED TOP METAL GATE FOR GATE-ALL-AROUND FIELD EFFECT TRANSISTOR
2y 4m to grant Granted Jul 07, 2026
Patent 12671018
THERMISTOR INTEGRATED WITH A BIAS RESISTOR
3y 0m to grant Granted Jun 30, 2026
Patent 12660560
COMPONENTS AND APPARATUS FOR IMPROVING UNIFORMITY OF AN EPITAXIAL LAYER
3y 1m to grant Granted Jun 16, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
95%
With Interview (+10.2%)
2y 2m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 669 resolved cases by this examiner. Grant probability derived from career allowance rate.

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