Prosecution Insights
Last updated: July 17, 2026
Application No. 18/454,505

DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME

Non-Final OA §102
Filed
Aug 23, 2023
Priority
Aug 24, 2022 — RE 10-2022-0106353
Examiner
MENZ, DOUGLAS M
Art Unit
2897
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Display Co., Ltd.
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
93%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allowance Rate
686 granted / 776 resolved
+20.4% vs TC avg
Minimal +5% lift
Without
With
+4.6%
Interview Lift
resolved cases with interview
Fast prosecutor
2y 1m
Avg Prosecution
32 currently pending
Career history
807
Total Applications
across all art units

Statute-Specific Performance

§101
1.9%
-38.1% vs TC avg
§103
52.1%
+12.1% vs TC avg
§102
36.2%
-3.8% vs TC avg
§112
0.6%
-39.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 776 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I, claims 1-14, in the reply filed on 1/7/26 is acknowledged. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-14 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Yang et al. (US 2022/0255025). Regarding claim 1, Yang discloses a display apparatus comprising: a substrate including (2, fig. 2 and paragraph 0060): a component area including a transmission area (Abstract, figs. 1-2); a main area outside the component area (Abstract, figs. 1-2); and a bending area bent based on a bending axis (Abstract, figs. 1-2); a buffer layer disposed on the substrate (4, fig. 2 and paragraph 0060); a first semiconductor layer disposed on the buffer layer (5, fig. 2 and paragraph 0060); and a first gate insulating layer overlapping the first semiconductor layer (6, fig. 2 and paragraph 0060) and including: a 1-1st opening corresponding to the bending area (16, fig. 5 and paragraph 0080); and a 1-1st through-hole exposing a portion of the first semiconductor layer (17’, fig. 5 and paragraph 0079), wherein a first acute angle formed by an inner surface of the 1-1st opening with respect to an upper surface of the substrate is less than a first contact acute angle formed by an inner surface of the 1-1st through-hole with respect to the upper surface of the substrate (groove 16 vs. via holes 17’, fig. 5 and paragraphs 0079-0080). Regarding claim 2, Yang further discloses a plurality of auxiliary pixels arranged in the component area (27, 28, fig. 2 and paragraph 0094), wherein the first gate insulating layer further includes a 2-1st opening corresponding to the transmission area disposed between the plurality of auxiliary pixels (second 17’, figs. 5, 2). Regarding claim 3, Yang further discloses wherein a second acute angle formed by an inner surface of the 2-1st opening with respect to the upper surface of the substrate is the same as the first acute angle (figs. 2, 5). Regarding claim 4, Yang further discloses a second gate insulating layer disposed on the first gate insulating layer (9, fig. 2 and paragraph 0060); a second semiconductor layer disposed on the second gate insulating layer (10, fig. 2 and paragraph 0060); and a third gate insulating layer overlapping the second semiconductor layer (15, fig. 2 and paragraph 0060). Regarding claim 5, Yang further discloses wherein the second gate insulating layer includes a 1-2nd through-hole corresponding to the 1- 1st through-hole (figs. 2, 5), and an inner surface of the 1-2ⁿᵈ through-hole and the inner surface of the 1-1st through- hole form a continuous surface with each other (figs. 2, 5). Regarding claim 6, Yang further discloses wherein the third gate insulating layer (15, fig. 2) includes a 2-1st through-hole exposing a portion of the second semiconductor layer (10, fig. 2) and includes a second contact acute angle formed by an inner surface of the 2-1st through-hole with respect to the upper surface of the substrate (fig. 2). Regarding claim 7, Yang further discloses wherein the buffer layer (4, fig. 2) includes a 3-1st opening corresponding to the bending area (right side, fig. 2), and a third acute angle formed by an inner surface of the 3-1st opening with respect to the upper surface of the substrate is less than the first acute angle (fig. 2, right side). Regarding claim 8, Yang further discloses wherein the third acute angle is less than the second contact acute angle (fig. 2). Regarding claim 9, Yang further discloses wherein, when viewed in a direction perpendicular to the substrate, an area of the 1-1st opening (groove, right side, fig. 2 above layer 6) is greater than an area of the 3-1st opening (groove, right side, fig. 2 below layer 6). Regarding claim 10, Yang further disclose wherein, when viewed in a direction perpendicular to the substrate, the 3-1st opening is disposed in the 1-1st opening (fig. 2 right side). Regarding claim 11, Yang further discloses wherein the substrate further includes a groove corresponding to the 3-1st opening (fig. 2 right side). Regarding claim 12, Yang further discloses wherein a fourth acute angle formed by an inner surface of the groove with respect to the upper surface of the substrate is the same as or less than the third acute angle (fig. 2, right side). Regarding claim 13, Yang further discloses wherein an inner surface of the groove and the inner surface of the 3-1st opening form a continuous surface with each other (fig. 2). Regarding claim 14, Yang further discloses an organic interlayer insulating layer disposed on the third gate insulating layer (24, fig. 2); and an organic material layer filling the 1-1st opening and including a same material as the organic interlayer insulating layer (24, fig. 2). Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. US Patent Application Publication 2018/0366586 discloses a display device with a bending area and corresponding groove in conjunction with via holes in the display area. Any inquiry concerning this communication or earlier communications from the examiner should be directed to DOUGLAS M MENZ whose telephone number is (571)272-1877. The examiner can normally be reached Monday-Friday 8:00am-5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Jacob Choi can be reached at 469-295-9060. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DOUGLAS M MENZ/Primary Examiner, Art Unit 2897 4/4/26
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Prosecution Timeline

Aug 23, 2023
Application Filed
Apr 08, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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Patent 12666602
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Patent 12652910
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3y 7m to grant Granted Jun 09, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
93%
With Interview (+4.6%)
2y 1m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 776 resolved cases by this examiner. Grant probability derived from career allowance rate.

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