Prosecution Insights
Last updated: May 29, 2026
Application No. 18/460,600

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Non-Final OA §102§OTHER
Filed
Sep 04, 2023
Examiner
MENZ, LAURA MARY
Art Unit
2813
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Taiwan Semiconductor Manufacturing Company Ltd.
OA Round
1 (Non-Final)
87%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
96%
With Interview

Examiner Intelligence

Grants 87% — above average
87%
Career Allowance Rate
811 granted / 928 resolved
+19.4% vs TC avg
Moderate +8% lift
Without
With
+8.2%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
21 currently pending
Career history
964
Total Applications
across all art units

Statute-Specific Performance

§101
2.1%
-37.9% vs TC avg
§103
41.8%
+1.8% vs TC avg
§102
28.2%
-11.8% vs TC avg
§112
2.5%
-37.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 928 resolved cases

Office Action

§102 §OTHER
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s election without traverse of Group I, Species 1 in the reply filed on 1/9/26 is acknowledged. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-8 is/are rejected under 35 U.S.C. 102a1 as being anticipated by Yu et al (US 2021/0407942). 1. (Original) A semiconductor device, comprising: a first die (Fig. 5-15 (70) and [0034]), having a first side (top) comprising a plurality of first connecting structures (Fig.5-15 (96) and [0040]) and a second side (bottom) comprising a plurality of second connecting structures (Fig.12-15 (136) and [0052]), the first side (top of 70) being opposite to the second side (bottom of 70) (See Fig.12); a second die (Fig.2/6/12-15 (50) and [0016/0034]), having a third side (top) comprising a plurality of third connecting structures (Fig.2/6/12-15 (66) and [0033]), the plurality of third connecting structures (Fig.6/12-15 (66) and [0033]) being in contact with the plurality of first connecting structures (Fig.6/12-15 (96) and [0040]) of the first die (Fig. 6/12-15 (70) and [0034]); and a third die (Fig.13-15 (150) and [0053]), having a fourth side (top) comprising a plurality of fourth connecting structures (Fig.14 (186) and [0055]), the plurality of fourth connecting structures (Fig.15 (186) and [0055]) being in contact with the plurality of second connecting structures (Fig.15 (136) and [0052]) of the first die (Fig.15 (70) and [0034]), wherein a first pitch (Fig.19A-19B (P1) and [0061]) of the plurality of first connecting structures (Fig 19A (96) and [0040]) and a second pitch (Fig.19A-19B (P1- the pitch for 66 and 96 are the same) and [0061]) of the plurality of third connecting structures (Fig.19A (66) and [0033]) are less than a third pitch (Fig.19A-19B (P2) and [0061]) of the plurality of fourth connecting structures (Fig.19A (186) and [0055]). 2. (Original) The semiconductor device of claim 1, wherein a first bonding interface between the plurality of first connecting structures (Fig.6/12-15 (96) and [0040]) and the plurality of third connecting structures (Fig.2/6/12-15 (66) and [0033]) comprising a first metal-to-metal bonding interface and a first dielectric-to-dielectric bonding interface [0041- teaching metal to metal and dielectric to dielectric bonding], and a second bonding interface between the plurality of second connecting structures (Fig.15 (136) and [0052]) and the plurality of fourth connecting structures (Fig.15 (186) and [0055]) comprising a second metal-to-metal bonding interface and a second dielectric-to-dielectric bonding interface [0056- teaching metal to metal and dielectric to dielectric bonding]. 3. (Original) The semiconductor device of claim 1, further comprising: an insulating encapsulation (Fig.40 (522) and [0087]), laterally covering the first die (Fig. 5-15 (70) and [0034]) and the second die (Fig.2/6/12-15 (50) and [0016/0034]), wherein a sidewall of the insulating encapsulation (Fig.40 (522) and [0087]) is substantially aligned to a sidewall of the third die (Fig.13-15 (150) and [0053]). 4. (Original) The semiconductor device of claim 1, further comprising: an insulating encapsulation (Fig.40 (522/402) and [0087/0075]), laterally covering the third die (Fig.13-15 (150) and [0053]), wherein a sidewall of the insulating encapsulation (Fig.40 (402) and [0075]) is substantially aligned to a sidewall of the first die (Fig. 5-15 (70) and [0034]) and a sidewall of the second die (Fig.2/6/12-15 (50) and [0016/0034]). 5. (Original) The semiconductor device of claim 1, further comprising: a first insulating encapsulation (Fig.40 (522/402) and [0087/0075]), laterally covering the first die (Fig. 5-15 (70) and [0034]) and the second die (Fig.2/6/12-15 (50) and [0016/0034]); and a second insulating encapsulation (Fig.40 (522/402) and [0087/0075]), laterally covering the third die (Fig.13-15 (150) and [0053]), wherein a sidewall of the first insulating encapsulation is substantially aligned to a sidewall of the second insulating encapsulation (Fig.40 (522/402) and [0087/0075]). 6. (Original) The semiconductor device of claim 1, wherein a sidewall of the first die (Fig. 5-15 (70) and [0034]), a sidewall of a second die (Fig.2/6/12-15 (50) and [0016/0034]) and a sidewall of third die (Fig.13-15 (150) and [0053]) are substantially aligned with each other (Fig.15). 7. (Original) The semiconductor device of claim 1, further comprising: a plurality of conductive terminals (Fig.17-18 (191) and [0059]), disposed on and electrically coupled to a plurality of fifth connecting structures (Fig.17-18 (193) and [0059]) distributed on a fifth side (bottom see Fig.13-14- but flipped in Fig.s 17-18) of the third die (Fig.13-15 (150) and [0053]), the fourth side (top in Fig.s 13-14/ bottom in Fig.17-18) being opposite to the fifth side (bottom in Fig.13/14/ top in Fig.17-18). 8. (Original) The semiconductor device of claim 7, wherein a material of the plurality of fifth connecting structures (Fig.17-18 (193) and [0059]) comprises aluminum [0058]. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Yu et al (US 11581281); Zhou et al (US 10665581); Chen et al (US 20200328200; US 10727217; US 11088131) teach similar structures. Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAURA M MENZ whose telephone number is (571)272-1697. The examiner can normally be reached Monday-Friday 7:00-3:30. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Steven Gauthier can be reached at 571-270-0373. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LAURA M MENZ/Primary Examiner, Art Unit 2813 3/15/26
Read full office action

Prosecution Timeline

Sep 04, 2023
Application Filed
Mar 19, 2026
Non-Final Rejection mailed — §102, §OTHER
May 04, 2026
Interview Requested
May 13, 2026
Applicant Interview (Telephonic)
May 13, 2026
Examiner Interview Summary

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12642071
SCALABLE ARCHITECTURE FOR MULTI-DIE SEMICONDUCTOR PACKAGES
4y 1m to grant Granted May 26, 2026
Patent 12642137
MULTI-LAYER CHIP ARCHITECTURE AND FABRICATION
3y 5m to grant Granted May 26, 2026
Patent 12642138
Three Dimensional Application-Specific Integrated Circuit Architecture
3y 4m to grant Granted May 26, 2026
Patent 12642144
Multi-Bump Connection to Interconnect Structure and Manufacturing Method Thereof
2y 12m to grant Granted May 26, 2026
Patent 12635579
CHIP PACKAGE STRUCTURES, MANUFACTURING METHODS THEREOF AND ELECTRONIC DEVICES
3y 4m to grant Granted May 19, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
87%
Grant Probability
96%
With Interview (+8.2%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 928 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month