Prosecution Insights
Last updated: April 19, 2026
Application No. 18/488,805

COMPACT EFUSE STRUCTURE

Non-Final OA §102
Filed
Oct 17, 2023
Examiner
DIALLO, MAMADOU L
Art Unit
2897
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Taiwan Semiconductor Manufacturing Company Ltd.
OA Round
1 (Non-Final)
92%
Grant Probability
Favorable
1-2
OA Rounds
2y 2m
To Grant
95%
With Interview

Examiner Intelligence

Grants 92% — above average
92%
Career Allow Rate
1207 granted / 1315 resolved
+23.8% vs TC avg
Minimal +3% lift
Without
With
+3.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 2m
Avg Prosecution
29 currently pending
Career history
1344
Total Applications
across all art units

Statute-Specific Performance

§101
3.5%
-36.5% vs TC avg
§103
39.5%
-0.5% vs TC avg
§102
35.2%
-4.8% vs TC avg
§112
9.8%
-30.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1315 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Priority Receipt is acknowledged of papers submitted under 35 U.S.C. 119(a)-(d), which papers have been placed of record in the file. Specification The specification has not been checked to the extent necessary to determine the presence of all possible minor errors. Applicant's cooperation is requested in correcting any errors of which applicant may become aware in the specification. Information Disclosure Statement The information disclosure statement (IDS) submitted on 10/17/2023 and 01/22/2025 is being considered by the examiner. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1-5 is/are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Banerjee et al, US 20220415378 A1. PNG media_image1.png 562 769 media_image1.png Greyscale 33 PNG media_image2.png 554 782 media_image2.png Greyscale Pertaining to claim1, Banerjee teaches ( see figs 2 and 4 above) An electronic fuse device, comprising: a first bit cell [290] comprising a first plurality of active regions [310-326 or 312-340] extending along a first direction; and a second bit cell [292] comprising a second plurality of active regions [338-366 or 352-368] extending along the first direction, wherein each of the first plurality of active regions is aligned with one of the second plurality of active regions along the first direction, wherein the first bit cell [290] and the second bit cell [292] are spaced apart along the first direction by a space, wherein the space is free of a well tap cell ( see space in fig.2 between the two-bit cell). Pertaining to claim 2, Banerjee teaches ( see figs 2 and 4 above)The electronic fuse device of claim 1, wherein the first plurality of active regions [310-326 or 312-340] are discontinuous with the second plurality of active regions [338-366 or 352-368]. Pertaining to claim 3, Banerjee teaches ( see figs 2 and 4 above)The electronic fuse device of claim 1, further comprising: at least one isolation gate structure [378,fig3 ] disposed between the first bit cell[290] and the second bit cell[292]. Pertaining to claim 4, Banerjee teaches ( see figs 2 and 4 above)The electronic fuse device of claim 3, wherein the at least one isolation gate structure comprises a gate dielectric layer and a gate electrode over the gate dielectric layer, wherein the gate electrode comprises metal ( see para 0034 using metal gate on a gate insulating layer). Pertaining to claim 5, Banerjee teaches ( see figs 2 and 4 above) the electronic fuse device of claim 1, further comprising: at least one grounded gate structure ( dummy gates) disposed between the first bit cell[290] and the second bit cell[290], wherein the at least one grounded gate structure is electrically coupled to a circuit ground (see para 0036 about these dummy gates such as 378 are connected to the ground reference VSS to disable the resulting transistor). Allowable Subject Matter Claims 9-16 allowed. The following is an examiner's statement of reasons for allowance: The closest prior art of record of Banerjee et al, (US 20220415378 A1) teaches the limitation of “An electronic fuse device, comprising: a first bit cell comprising a first n-type transistor and a first p-type transistor; and a second bit cell comprising a second n-type transistor and a second p-type transistor”, but it does not teach or suggest, singularly or in combination, at least the limitations of the independent claim 9 including “wherein the first n-type transistor is disposed over a first p-type well, wherein the first p-type transistor is disposed over a first n-type well , wherein the first p-type well is insulated from the first n-type well, wherein the second n-type transistor is disposed over a second p-type well, wherein the second p-type transistor is disposed over a second n-type well, wherein the second p-type well is insulated from the second n-type well. ” it does not also teach or suggest, singularly or in combination, at least the limitations of the independent claim 17 including “a first bit cell comprising a first complementary metal oxide semiconductor (CMOS) device; and a second bit cell comprising a second CMOS device, wherein the first CMOS device comprises: a first n-type transistor over a first p-type well, a first p-type transistor over a first n-type well, wherein the first p-type well is insulated from the first n-type well by an isolation structure, wherein the first bit cell and the second bit cell are spaced apart by a space, wherein the space is free of a well tap cell. “ Claims 6-8 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is an examiner's statement of reasons for allowance: The closest prior art of record of Banerjee et al, (US 20220415378 A1) teaches the limitation of claim1, but it does not teach or suggest, singularly or in combination, at least the limitations of the dependent claim 6 including “further comprising: a backside interconnect structure below the first bit cell and the second bit cell; and a frontside interconnect structure over the first bit cell and the second bit cell” in combination with the remaining limitations of the claim. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. See PTO 892. Any inquiry concerning this communication or earlier communications from the examiner should be directed to MAMADOU L DIALLO whose telephone number is (571)270-5449. The examiner can normally be reached M-F: 9:00AM-5PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, FERNANDO TOLEDO can be reached at (571)272-1867. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /MAMADOU L DIALLO/Primary Examiner, Art Unit 2897
Read full office action

Prosecution Timeline

Oct 17, 2023
Application Filed
Feb 04, 2026
Non-Final Rejection — §102 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
92%
Grant Probability
95%
With Interview (+3.0%)
2y 2m
Median Time to Grant
Low
PTA Risk
Based on 1315 resolved cases by this examiner. Grant probability derived from career allow rate.

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