Prosecution Insights
Last updated: April 19, 2026
Application No. 18/505,682

DISPLAY DEVICE

Non-Final OA §102
Filed
Nov 09, 2023
Examiner
KOO, LAMONT B
Art Unit
2813
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Samsung Display Co., Ltd.
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
2y 8m
To Grant
86%
With Interview

Examiner Intelligence

Grants 81% — above average
81%
Career Allow Rate
441 granted / 547 resolved
+12.6% vs TC avg
Moderate +6% lift
Without
With
+5.5%
Interview Lift
resolved cases with interview
Typical timeline
2y 8m
Avg Prosecution
49 currently pending
Career history
596
Total Applications
across all art units

Statute-Specific Performance

§103
62.0%
+22.0% vs TC avg
§102
29.9%
-10.1% vs TC avg
§112
7.2%
-32.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 547 resolved cases

Office Action

§102
DETAILED ACTION The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Moon et al. (US 2021/0234119) (hereafter Moon). Regarding claim 1, Moon discloses a display device comprising: a pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) comprising a first transistor (TFT and 162 in Fig. 4, paragraphs 0097 and 0098) and a first auxiliary layer (vertical portion of PXE in Fig. 4, paragraph 0103); and a display element layer (EMD in Fig. 4, paragraph 0101) on the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4), and comprising at least one light emitting element (EML in Fig. 4, paragraph 0101), wherein the display element layer (EMD in Fig. 4) comprises: a first pixel electrode (horizontal portion of PXE in Fig. 4, paragraph 0103) electrically connected to a first end (bottom surface of EML in Fig. 4) of the light emitting element (EML in Fig. 4); and a second pixel electrode (CME in Fig. 4, paragraph 0101) electrically connected to a second end (top surface of EML in Fig. 4) of the light emitting element (EML in Fig. 4), wherein the first transistor (TFT and 162 in Fig. 4) comprises: a semiconductor pattern 110 (Fig. 4, paragraph 0087); a first gate insulating layer 121 (Fig. 4, paragraph 0087) on the semiconductor pattern 110 (Fig. 4); a gate electrode (bottom layer of 130 in Fig. 4, paragraph 0092, wherein “multiple layers”) on the first gate insulating layer 121 (Fig. 4); and a first transistor electrode (152 and 162 in Fig. 4, paragraph 0096) and a second transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) connected to the semiconductor pattern 110 (Fig. 4), wherein the first transistor electrode (152 and 162 in Fig. 4) is connected to the second pixel electrode (CME in Fig. 4) by the first auxiliary layer (vertical portion of PXE in Fig. 4), and wherein the first auxiliary layer (vertical portion of PXE in Fig. 4) is between the first transistor electrode (152 and 162 in Fig. 4) and the second pixel electrode (CME in Fig. 4). Regarding claim 2, Moon further discloses the display device according to claim 1, wherein the first auxiliary layer (vertical portion of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) comprises indium tin oxide (ITO). Regarding claim 3, Moon further discloses the display device according to claim 2, wherein the first auxiliary layer (vertical portion of PXE in Fig. 4) is directly on the first transistor electrode (152 and 162 in Fig. 4). Regarding claim 4, Moon further discloses the display device according to claim 3, wherein the first transistor electrode (152 and 162 in Fig. 4) and the second transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) comprise (see paragraph 0096, wherein “any one of aluminum (Al), gold (Au), and copper (Cu) or an alloy thereof”) titanium (Ti) and copper (Cu). Regarding claim 5, Moon further discloses the display device according to claim 3, wherein the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) further comprises: a first bottom metal layer (middle layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) on a substrate 101 (Fig. 4, paragraph 0083), and electrically connected to the second transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”); a buffer layer (top layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) covering the first bottom metal layer (middle layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”); and a conductive pattern 45 (Fig. 4, paragraph 0065) at a same layer as the gate electrode (bottom layer of 130 in Fig. 4, paragraph 0092, wherein “multiple layers”), and electrically connected (see paragraph 0080, wherein “The common electrode CME may be provided with a second power voltage having a low potential through the second power supply line 45 electrically connected to the auxiliary electrode APE.”) to the first bottom metal layer (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”), wherein the display element layer (EMD in Fig. 4) further comprises: a first alignment electrode (bottom ITO of APE in Fig. 4, paragraph 0113, wherein “ITO/Ag/ITO”) under the first pixel electrode (top ITO of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”); and a second alignment electrode (top ITO of APE in Fig. 4, paragraph 0113, wherein “ITO/Ag/ITO”) under the second pixel electrode (CME in Fig. 4), and wherein one alignment electrode (bottom ITO of APE in Fig. 4) from among the first alignment electrode (bottom ITO of APE in Fig. 4) and the second alignment electrode (top ITO of APE in Fig. 4) is directly connected to the conductive pattern 45 (Fig. 4). Regarding claim 6, Moon further discloses the display device according to claim 5, wherein the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) further comprises a second auxiliary layer (bottom portion of vertical portion of PXE in Fig. 4, paragraph 0103), wherein the second auxiliary layer (bottom portion of vertical portion of PXE in Fig. 4) is directly on the second transistor electrode (152 and 162 in Fig. 4), and wherein the first auxiliary layer (top portion of vertical portion of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) and the second auxiliary layer (bottom portion of vertical portion of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) are at a same layer (layers vertically from 105 to VIA2 in Fig. 4) and comprise a same material. Regarding claim 7, Moon further discloses the display device according to claim 5, wherein the first auxiliary layer (top portion of vertical portion of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) is not on the conductive pattern 45 (Fig. 4). Regarding claim 8, Moon further discloses the display device according to claim 7, wherein the first transistor electrode (152 and 162 in Fig. 4) and the second transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) are in a layer different from a layer in which the gate electrode (bottom layer of 130 in Fig. 4, paragraph 0092, wherein “multiple layers”) is located. Regarding claim 9, Moon further discloses the display device according to claim 5, wherein the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) further comprises a first insulating layer 121 (Fig. 4, paragraph 0087) on (see Fig. 4, wherein 121 is laterally on 151) the buffer layer (top layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”), wherein the conductive pattern 45 (Fig. 4) is on the first insulating layer 121 (Fig. 4), and wherein the gate electrode (bottom layer of 130 in Fig. 4, paragraph 0092, wherein “multiple layers”) and the conductive pattern 45 (Fig. 4) are at a same layer (layers vertically from 105 to VIA2 in Fig. 4). Regarding claim 10, Moon further discloses the display device according to claim 9, wherein the gate electrode (bottom layer of 130 in Fig. 4), the first transistor electrode (152 and 162 in Fig. 4), the second transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”), and the conductive pattern 45 (Fig. 4) are at a same layer (layers vertically from 105 to VIA2 in Fig. 4). Regarding claim 11, Moon (utilized different elements for a first transistor electrode and a second transistor electrode as applied in claim 1 in the above) discloses a display device comprising: a pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) comprising a first transistor (TFT and 162 in Fig. 4, paragraphs 0097 and 0098) and a first auxiliary layer (vertical portion of PXE in Fig. 4, paragraph 0103); and a display element layer (EMD in Fig. 4, paragraph 0101) on the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4), and comprising at least one light emitting element (EML in Fig. 4, paragraph 0101), wherein the display element layer (EMD in Fig. 4) comprises: a first pixel electrode (horizontal portion of PXE in Fig. 4, paragraph 0103) electrically connected to a first end (bottom surface of EML in Fig. 4) of the light emitting element (EML in Fig. 4); and a second pixel electrode (CME in Fig. 4, paragraph 0101) electrically connected to a second end (top surface of EML in Fig. 4) of the light emitting element (EML in Fig. 4), wherein the first transistor (TFT and 162 in Fig. 4) comprises: a semiconductor pattern 110 (Fig. 4, paragraph 0087); a first gate insulating layer 121 (Fig. 4, paragraph 0087) on the semiconductor pattern 110 (Fig. 4); a gate electrode (bottom layer of 130 in Fig. 4, paragraph 0092, wherein “multiple layers”) on the first gate insulating layer 121 (Fig. 4); and a first transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) and a second transistor electrode (top layer of 152 and 162 in Fig. 4, paragraph 0096, wherein “multiple layers”) connected to the semiconductor pattern 110 (Fig. 4), wherein the first transistor electrode (bottom layer of 151 in Fig. 4) is connected to the second pixel electrode (CME in Fig. 4) by the first auxiliary layer (vertical portion of PXE in Fig. 4), and wherein the first auxiliary layer (vertical portion of PXE in Fig. 4) is between (see Fig. 4, wherein vertical portion of PXE is diagonally between 151 and CME) the first transistor electrode (bottom layer of 151 in Fig. 4) and the second pixel electrode (CME in Fig. 4)wherein the first auxiliary layer (vertical portion of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) comprises indium tin oxide (ITO); wherein the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) comprises: a first bottom metal layer (bottom layer of 152 in Fig. 4, paragraph 0096, wherein “multiple layers”) under the second transistor electrode (top layer of 152 and 162 in Fig. 4, paragraph 0096, wherein “multiple layers”); and a buffer layer (VIA1 in Fig. 4, paragraph 0097) covering the first bottom metal layer (bottom layer of 152 in Fig. 4), and wherein the first auxiliary layer (vertical portion of PXE in Fig. 4) is directly on the first bottom metal layer (bottom layer of 152 in Fig. 4). Regarding claim 12, Moon further discloses the display device according to claim 11, wherein the first transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”), the second transistor electrode (top layer of 152 and 162 in Fig. 4, paragraph 0096, wherein “multiple layers”), and the first bottom metal layer (bottom layer of 152 in Fig. 4) comprise (see paragraph 0096, wherein “any one of aluminum (Al), gold (Au), and copper (Cu) or an alloy thereof”) titanium (Ti) and copper (Cu). Regarding claim 13, Moon further discloses the display device according to claim 12, wherein the display element layer (EMD in Fig. 4) comprises: a first alignment electrode (bottom layer of PXE in Fig. 4, paragraph 0092, wherein “multiple layers”) under the first pixel electrode (horizontal portion of PXE in Fig. 4); and a second alignment electrode (middle layer of PXE in Fig. 4, paragraph 0092, wherein “multiple layers”) under the second pixel electrode (CME in Fig. 4), and wherein one alignment electrode (bottom layer of PXE in Fig. 4) from among the first alignment electrode (bottom layer of PXE in Fig. 4) and the second alignment electrode (middle layer of PXE in Fig. 4) is directly connected to the second transistor electrode (top layer of 152 and 162 in Fig. 4, paragraph 0096, wherein “multiple layers”). Regarding claim 14, Moon further discloses the display device according to claim 13, wherein the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) further comprises: a second bottom metal layer (middle second top layer of 152 in Fig. 4, paragraph 0096, wherein “multiple layers”) spaced (see paragraph 0096, wherein “multiple layers” such that middle lower layer of 152 is between bottom layer of 152 and middle second upper layer of 152) from the first bottom metal layer (bottom layer of 152 in Fig. 4); and a second auxiliary layer (middle top layer of 152 in Fig. 4, paragraph 0096, wherein “multiple layers”) directly on the second bottom metal layer (middle second top layer of 152 in Fig. 4), and wherein the second transistor electrode (top layer of 152 and 162 in Fig. 4, paragraph 0096, wherein “multiple layers”) is directly connected to the second auxiliary layer (middle top layer of 152 in Fig. 4). Regarding claim 15, Moon further discloses the display device according to claim 14, wherein the gate electrode (bottom layer of 130 in Fig. 4, paragraph 0092, wherein “multiple layers”), the first transistor electrode (bottom layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”), and the second transistor electrode (top layer of 152 and 162 in Fig. 4, paragraph 0096, wherein “multiple layers”) are at a same layer (layers vertically from 105 to VIA2 in Fig. 4). Regarding claim 16, Moon further discloses the display device according to claim 2, wherein the pixel circuit layer (layers vertically from 105 to VIA2 in Fig. 4) comprises: a first bottom metal layer (middle layer of 151 in Fig. 4, paragraph 0096, wherein “multiple layers”) on a substrate 101 (Fig. 4, paragraph 0083); and a buffer layer (VIA1 in Fig. 4, paragraph 0112) covering the first bottom metal layer (middle layer of 151 in Fig. 4), and wherein the first transistor (TFT and 162 in Fig. 4) is on the buffer layer (top layer of 151 in Fig. 4), wherein the display element layer (EMD in Fig. 4) comprises: a first alignment electrode (Ag of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) under the first pixel electrode (top ITO of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”); and a second alignment electrode (bottom ITO of layer of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) under the second pixel electrode (CME in Fig. 4), and wherein one alignment electrode (bottom ITO of layer of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) from among the first alignment electrode (Ag of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) and the second alignment electrode (bottom ITO of layer of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) is directly connected to the first bottom metal layer (top layer of 162 in Fig. 4) through a contact hole (region where vertical portion of PXE is formed in Fig. 4). Regarding claim 17, Moon discloses a display device comprising: a substrate 101 (Fig. 4, paragraph 0083); a first bottom metal layer 45 (Fig. 4, paragraph 0111) on the substrate 101 (Fig. 4); a first auxiliary layer (bottom ITO of APE in Fig. 4, paragraph 0113, wherein “ITO/Ag/ITO”) directly on the first bottom metal layer 45 (Fig. 4); a buffer layer (VIA1 in Fig. 4, paragraph 0097) covering the first bottom metal layer 45 (Fig. 4); a first transistor (TFT and 162 in Fig. 4, paragraphs 0097 and 0098) on the buffer layer (VIA1 in Fig. 4); a light emitting element (EML in Fig. 4, paragraph 0101) on the first transistor (TFT and 162 in Fig. 4); a first pixel electrode (top ITO of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) electrically connected to a first end (bottom of EML in Fig. 4) of the light emitting element (EML in Fig. 4); and a second pixel electrode (CME in Fig. 4, paragraph 0101) electrically connected to a second end (top of EML in Fig. 4) of the light emitting element (EML in Fig. 4), wherein the first transistor (TFT and 162 in Fig. 4) comprises a first transistor electrode 151 (Fig. 4, paragraph 0096) and a second transistor electrode (152 and 162 in Fig. 4, paragraph 0098), and wherein the second pixel electrode (CME in Fig. 4) is connected (see paragraph 0080, wherein “The common electrode CME may be provided with a second power voltage having a low potential through the second power supply line 45 electrically connected to the auxiliary electrode APE”) to the first bottom metal layer 45 (Fig. 4) by the first auxiliary layer (APE in Fig. 4). Regarding claim 18, Moon further discloses the display device according to claim 17, wherein the first auxiliary layer (bottom ITO of APE in Fig. 4, paragraph 0113, wherein “ITO/Ag/ITO”) comprises indium tin oxide (ITO). Regarding claim 19, Moon further discloses the display device according to claim 18, further comprising a second bottom metal layer (bottom layer of 135 in Fig. 4, paragraph 0091, wherein “the first signal line 135 may be formed as a single layer or multiple layers”) and a fourth bottom metal layer (top layer of 135 in Fig. 4, paragraph 0091) on the substrate 101 (Fig. 4); a first alignment electrode (AG of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) under the first pixel electrode (PXE in Fig. 4); and a second alignment electrode (bottom ITO of PXE in Fig. 4, paragraph 0103, wherein “stacked structure (ITO/Ag/ITO)”) under the second pixel electrode (CME in Fig. 4), wherein one alignment electrode (bottom ITO of PXE in Fig. 4) from among the first alignment electrode (AG of PXE in Fig. 4) and the second alignment electrode (bottom ITO of PXE in Fig. 4) is directly connected to one transistor electrode (152 and 162 in Fig. 4) of the first transistor electrode 151 (Fig. 4) and the second transistor electrode (152 and 162 in Fig. 4), wherein the first transistor electrode 151 (Fig. 4) is connected to the fourth bottom metal layer by a fourth auxiliary layer on the fourth bottom metal layer (top layer of 135 in Fig. 4), and wherein the second transistor electrode (152 and 162 in Fig. 4) is electrically connected to the second bottom metal layer (bottom layer of 135 in Fig. 4) by a second auxiliary layer (top ITO of APE in Fig. 4, paragraph 0113, wherein “ITO/Ag/ITO”) on the second bottom metal layer 45 (Fig. 4). Regarding claim 20, Moon discloses a display device comprising: a substrate 101 (Fig. 4, paragraph 0083); a first bottom metal layer 45 (Fig. 4, paragraph 0111) on the substrate 101 (Fig. 4); a first auxiliary layer (APE in Fig. 4, paragraph 0079) directly on the first bottom metal layer 45 (Fig. 4); a buffer layer (VIA1 in Fig. 4, paragraph 0097) covering the first bottom metal layer 45 (Fig. 4); a first transistor (TFT and 162 in Fig. 4, paragraphs 0097 and 0098) on the buffer layer (VIA1 in Fig. 4), and comprising a first transistor electrode 130 (Fig. 4, paragraph 0111) and a second transistor electrode 140 (Fig. 4, paragraph 0111); a light emitting element (EML in Fig. 4, paragraph 0101) on the first transistor (TFT and 162 in Fig. 4); a first pixel electrode (PXE in Fig. 4, paragraph 0101) electrically connected to a first end (bottom of EML in Fig. 4) of the light emitting element (EML in Fig. 4); and a second pixel electrode (CME in Fig. 4, paragraph 0101) electrically connected to a second end (top of EML in Fig. 4) of the light emitting element (EML in Fig. 4), wherein the second pixel electrode (CME in Fig. 4) is connected (see paragraph 0080, wherein “The common electrode CME may be provided with a second power voltage having a low potential through the second power supply line 45 electrically connected to the auxiliary electrode APE”) to the first bottom metal layer 45 (Fig. 4) by the first auxiliary layer (APE in Fig. 4), and wherein the second pixel electrode (CME in Fig. 4) directly contacts the first auxiliary layer (APE in Fig. 4). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAMONT B KOO whose telephone number is (571)272-0984. The examiner can normally be reached 7:00 AM - 3:30 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Steven Gauthier can be reached on (571)270-0373. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /L.B.K/Examiner, Art Unit 2813 /STEVEN B GAUTHIER/Supervisory Patent Examiner, Art Unit 2813
Read full office action

Prosecution Timeline

Nov 09, 2023
Application Filed
Feb 21, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12598774
SEMICONDUCTOR DEVICES
2y 5m to grant Granted Apr 07, 2026
Patent 12568678
METHODS OF FORMING SEMICONDUCTOR DEVICE AND DIELECTRIC FIN
2y 5m to grant Granted Mar 03, 2026
Patent 12550363
Epitaxial Source/Drain Configurations for Multigate Devices
2y 5m to grant Granted Feb 10, 2026
Patent 12543364
INTEGRATED CIRCUIT WITH BACKSIDE METAL GATE CUT FOR REDUCED COUPLING CAPACITANCE
2y 5m to grant Granted Feb 03, 2026
Patent 12538570
REDUCTION OF GATE-DRAIN CAPACITANCE
2y 5m to grant Granted Jan 27, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
86%
With Interview (+5.5%)
2y 8m
Median Time to Grant
Low
PTA Risk
Based on 547 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month