Tech Center 2800 • Art Units: 1774 2812 2813 2823 2824 2893 2899
This examiner grants 80% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18387729 | DEVICE INCLUDING OVERLAY TARGET STRUCTURE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 17961172 | SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18505682 | DISPLAY DEVICE | Final Rejection | Samsung Display Co., LTD. |
| 18656819 | ELECTRONIC DEVICE | Non-Final OA | InnoLux Corporation |
| 18193172 | GLASS-INTEGRATED INDUCTORS IN INTEGRATED CIRCUIT PACKAGES | Non-Final OA | Intel Corporation |
| 18070361 | Circuit Systems And Methods Using Spacer Dies | Non-Final OA | Intel Corporation |
| 18533410 | Integrated Assemblies and Semiconductor Memory Devices | Non-Final OA | Micron Technology, Inc. |
| 18650905 | Gate Structures For Semiconductor Devices | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18639739 | GATE SPACERS AND METHODS OF FORMING THE SAME IN SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18630021 | SEMICONDUCTOR DEVICE WITH IMPROVED DEVICE PERFORMANCE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18443917 | SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18502297 | SEMICONDUCTOR DEVICE STRUCTURE WITH CONDUCTIVE VIA STRUCTURE | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18447125 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18228250 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18352071 | GATE HARD MASK DESIGN FOR IMPROVED SOURCE/DRAIN FORMATION | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18298277 | Isolation Structures in Semiconductor Devices | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18747623 | NON-CONFORMAL CAPPING LAYER AND METHOD FORMING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18654298 | NANOSHEET FIELD-EFFECT TRANSISTOR DEVICE AND METHOD OF FORMING | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18366370 | STRUCTURE FOR REDUCING SOURCE/DRAIN CONTACT RESISTANCE AT WAFER BACKSIDE | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18366073 | Gate Structure of Semiconductor Device and Method of Forming Same | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18362755 | SEMICONDUCTOR DEVICE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
| 18356291 | EXTENDED BACKSIDE CONTACT IN STACK NANOSHEET | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18054349 | BURIED POWER RAIL VIA WITH REDUCED ASPECT RATIO DISCREPANCY | Non-Final OA | International Business Machines Corporation |
| 18485614 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE CASING | Non-Final OA | RENESAS ELECTRONICS CORPORATION |
| 18739286 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | UNITED MICROELECTRONICS CORP. |
| 18739261 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME | Non-Final OA | UNITED MICROELECTRONICS CORP. |
| 18608508 | LIGHT EMITTING DIODE HAVING SHALLOW VIEWING ANGLE | Non-Final OA | Seoul Viosys Co., Ltd. |
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