Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1774 2812 2813 2823 2824 2893 2899
This examiner grants 81% of resolved cases
Lamont B. Koo is an examiner in Tech Center 2800 and Art Unit 1774. He has a history of 556 resolved cases, which provides a basis for analysis. His allowance rate is 80.6 percent, indicating a favorable path to grant for most applicants.
The interview lift for this examiner is 5.2 percent. This positive lift suggests that an interview is a tool for resolving issues and moving an application toward allowance. In the context of the 80.6 percent base allowance rate, the 5.2 percent lift offers a small benefit for practitioners working in Art Unit 1774.
The median days to allowance is 919, which is the typical time required to secure a patent under his review. This 919-day median is a benchmark for managing client expectations regarding pendency. The combination of 556 resolved cases and an 80.6 percent allowance rate makes Lamont B. Koo a documented figure in Tech Center 2800.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18387729 | DEVICE INCLUDING OVERLAY TARGET STRUCTURE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18497363 | SEMICONDUCTOR DEVICE INCLUDING ESD DIODE AND METHOD FOR MANUFACTURING THE SAME | Final Rejection | Samsung Electronics Co., Ltd. |
| 17961172 | SEMICONDUCTOR DEVICE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19455832 | System and Method for an Active Nanoscale Energy-Exchange Device | Non-Final OA | AtomBeam Technologies Inc. |
| 18482444 | Light Emitting Diode Package and Manufacturing Method of The Same, and Light Emitting Device | Final Rejection | LG Display Co., Ltd. |
| 18656819 | ELECTRONIC DEVICE | Non-Final OA | InnoLux Corporation |
| 18486878 | LIGHT-EMITTING APPARATUS, DISPLAY APPARATUS, IMAGE PICKUP APPARATUS, AND ELECTRONIC APPARATUS | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18390952 | GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES FABRICATED USING ALTERNATE ETCH SELECTIVE MATERIAL | Final Rejection | Intel Corporation |
| 18333758 | INTEGRATED CIRCUIT DEVICE WITH MULTI-LENGTH GATE ELECTRODE | Final Rejection | Intel Corporation |
| 18070361 | Circuit Systems And Methods Using Spacer Dies | Non-Final OA | Intel Corporation |
| 18506245 | SEMICONDUCTOR DEVICE | Final Rejection | Murata Manufacturing Co., Ltd. |
| 18494611 | COMPOUND COMPONENT DEVICE AND METHOD OF MANUFACTURING THE SAME | Final Rejection | Murata Manufacturing Co., Ltd. |
| 18560149 | CIRCUITRY PACKAGE FOR POWER APPLICATIONS | Final Rejection | Telefonaktiebolaget LM Ericsson (publ) |
| 18388074 | MODULE-LESS NANOSHEET FETS WITH DIRECT BACKSIDE CONTACT | Final Rejection | International Business Machines Corporation |
| 18356291 | EXTENDED BACKSIDE CONTACT IN STACK NANOSHEET | Non-Final OA | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18188496 | CONTACT CUT AND WRAP AROUND CONTACT | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18054133 | BACKSIDE CONTACT METAL FILL | Final Rejection | INTERNATIONAL BUSINESS MACHINES CORPORATION |
| 18749029 | SEMICONDUCTOR DEVICE HAVING CUT METAL GATE | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18650905 | Gate Structures For Semiconductor Devices | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18639739 | GATE SPACERS AND METHODS OF FORMING THE SAME IN SEMICONDUCTOR DEVICES | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18630021 | SEMICONDUCTOR DEVICE WITH IMPROVED DEVICE PERFORMANCE | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18415330 | SOURCE/DRAIN STRUCTURE FOR SEMICONDUCTOR DEVICE | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18505632 | GATE ISOLATION FEATURES | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18502297 | SEMICONDUCTOR DEVICE STRUCTURE WITH CONDUCTIVE VIA STRUCTURE | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18228250 | SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18352071 | GATE HARD MASK DESIGN FOR IMPROVED SOURCE/DRAIN FORMATION | Non-Final OA | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18298277 | Isolation Structures in Semiconductor Devices | Final Rejection | Taiwan Semiconductor Manufacturing Company, Ltd. |
| 18770052 | NMOS and PMOS Transistor Gates with Hafnium Oxide Layers and Lanthanum Oxide Layers | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18766402 | MINIMIZATION OF SILICON GERMANIUM FACETS IN PLANAR METAL OXIDE SEMICONDUCTOR STRUCTURES | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
| 18761653 | SHALLOW TRENCH ISOLATION (STI) CONTACT STRUCTURES AND METHODS OF FORMING SAME | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
IP Author analyzes examiner patterns and generates tailored response strategies with the highest chance of allowance.
Build Your Strategy