Prosecution Insights
Last updated: April 19, 2026
Application No. 18/509,052

GAN-BASED, LATERAL-CONDUCTION, ELECTRONIC DEVICE WITH IMPROVED METALLIC LAYERS LAYOUT

Non-Final OA §102
Filed
Nov 14, 2023
Examiner
LIU, BENJAMIN T
Art Unit
2893
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
STMicroelectronics
OA Round
1 (Non-Final)
74%
Grant Probability
Favorable
1-2
OA Rounds
3y 1m
To Grant
87%
With Interview

Examiner Intelligence

Grants 74% — above average
74%
Career Allow Rate
511 granted / 687 resolved
+6.4% vs TC avg
Moderate +13% lift
Without
With
+12.6%
Interview Lift
resolved cases with interview
Typical timeline
3y 1m
Avg Prosecution
48 currently pending
Career history
735
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
56.9%
+16.9% vs TC avg
§102
32.8%
-7.2% vs TC avg
§112
9.2%
-30.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 687 resolved cases

Office Action

§102
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1, 9, and 12-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Cho et al. (US 2018/0211904) (“Cho”). With regard to claim 1, fig. 1A of Cho disclose an electronic device, comprising: a layer of gallium nitride (“GaN”, par [0051]); a drain terminal 52B on the layer of gallium nitride (“GaN”, par [0051]); and a first source metal strip (left 60a, fig. 1A) and a second source metal strip (middle 60A, fig. 1A); a plurality of drain metal strips 64 coupled to the drain terminal 52B, the plurality of drain metal strips 64 including a first drain metal strip (left 64, fig. 1A) and a second drain metal strip (middle 64, fig. 1A), the first drain metal strip (left 64, fig. 1A) being between the first (left 60A) and second source metal strips (middle 60A), the first drain metal strip (left 64) having a first end (top end of left 64 in fig. 1A) spaced from a second end (bottom end of left 64 in fig. 1A) along a first direction (top to bottom in fig. 1A), the first end (top end of left 64 in fig. 1A) of the first drain metal strip (left 64) being aligned with a central region (center of left 60A) of the first source metal strip (left 60A) along a second direction (left to right in fig. 1A) that is transverse to the first direction (top to bottom in fig. 1A). With regard to claim 9, fig. 1A of Cho disclose a device, comprising: a first drain (left 64, fig. 1A); a second drain (middle 64, fig. 1A) spaced from the first drain (left 62) along a first direction (left to right in fig. 1A); a first source (middle 60A, fig. 1A) between the first drain (left 64, fig. 1A) and the second drain (middle 64, fig. 1A); a second source (middle 60B, fig. 1A) between the first drain (left 64, fig. 1A) and the second drain (middle 64, fig. 1A), the second source (middle 60B, fig. 1A) spaced from the first source (middle 60A, fig. 1A) along a second direction (top to bottom in fig. 1A) that is transverse to the first direction (left to right in fig. 1A); a first insulating region between the first drain (left 64, fig. 1A) and the second drain (middle 64, fig. 1A), the first source (middle 60A, fig. 1A) being within the first insulting region; and a second insulating region between the first drain (left 64, fig. 1A) and the second drain (middle 64, fig. 1A), the second source (middle 60B, fig. 1A) being within the second insulating region. With regard to claim 12, fig. 1A of Cho discloses a device, comprising: a first drain (left 64, fig. 1A); a second drain (middle 64, fig. 1A) spaced from the first drain along a first direction (left to right, fig. 1A); a first source (left 60A, fig. 1A); a second source (middle 60A, fig. 1A) spaced from the first source (left 60A, fig. 1A) along the first direction (left to right, fig. 1A), the second source (middle 60A) being spaced from the first (left 64) and second drain (middle 64) along a second direction (bottom to top, fig. 1A ) that is transverse to the first direction (left to right, fig. 1A); a first insulating region that extends from a first side (right side of left 64) of the first drain (left 64) to first side of the first source (right side of left 60A); a second insulating region that extends from a first side (left side of middle 60A) of the second source (middle 60A) to a second side (right side of left 64) of the first drain (left 64). With regard to claim 13, fig. 1A of Cho discloses the first side (right side of left 60A) of the first source (left 60A) faces the first side (right side of middle 60A) of the second source (middle 60A). With regard to claim 14, fig. 1A of Cho discloses a third insulating region that extends from a first side (left side of middle 64) of the second drain (middle 64) to a second side (right side of middle 60A) of the second source (middle 60A). With regard to claim 15, fig. 1A of Cho discloses that the first side (left side of middle 64) of the second drain (middle 64) faces the second side (right side of left 64) of the first drain (left 64). With regard to claim 16, fig. 1A of Cho discloses a first active region (active region of “transistor”, par [0033]), the first source (left 60A) overlapping the first active region and the first drain (left 64) overlapping the first active region. With regard to claim 17, fig. 1A of Cho discloses a second active region, the second source (middle 60A) overlapping the second active region and the first drain (left 64) overlapping the second active region. With regard to claim 18, fig. 1A of Cho discloses that the second insulating region extends across the second active region (between middle 60A and left 64). With regard to claim 19, fig. 1A of Cho discloses that the first insulating region extends across the first active region (between left 60a and left 64). With regard to claim 20, fig. 1A of Cho discloses that a third active region (between middle 60A and middle 64), the second active region (between middle 60A and left 64) being between the first (between left 60a and left 64) and third active regions (between middle 60A and middle 64). Allowable Subject Matter Claims 2-8 and 10-11 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to BENJAMIN T LIU whose telephone number is (571)272-6009. The examiner can normally be reached Monday-Friday 11:00am-7:30pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Yara J Green can be reached at 571 270-3035. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /BENJAMIN TZU-HUNG LIU/Primary Examiner, Art Unit 2893
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Prosecution Timeline

Nov 14, 2023
Application Filed
Jan 10, 2026
Non-Final Rejection — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
74%
Grant Probability
87%
With Interview (+12.6%)
3y 1m
Median Time to Grant
Low
PTA Risk
Based on 687 resolved cases by this examiner. Grant probability derived from career allow rate.

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