Prosecution Insights
Last updated: April 19, 2026
Application No. 18/530,216

METHOD OF MANUFACTURING ELECTRODE STRUCTURE

Non-Final OA §112
Filed
Dec 06, 2023
Examiner
SALAZ, SAMMANTHA KATELYN
Art Unit
2892
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Mikro Mesa Technology Co. Ltd.
OA Round
1 (Non-Final)
95%
Grant Probability
Favorable
1-2
OA Rounds
3y 4m
To Grant
99%
With Interview

Examiner Intelligence

Grants 95% — above average
95%
Career Allow Rate
18 granted / 19 resolved
+26.7% vs TC avg
Moderate +8% lift
Without
With
+7.7%
Interview Lift
resolved cases with interview
Typical timeline
3y 4m
Avg Prosecution
28 currently pending
Career history
47
Total Applications
across all art units

Statute-Specific Performance

§103
44.9%
+4.9% vs TC avg
§102
31.2%
-8.8% vs TC avg
§112
14.5%
-25.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 19 resolved cases

Office Action

§112
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Status of the Claims Claims 1-19 are pending in the application and are currently being examined. Claim Objections Claim 9 objected to because of the following informalities: Lines 11-12 reads “with the second patterned photoresist depositing thereon”. This appears to be a typo meant to say “with the second patterned photoresist deposited thereon. Appropriate correction is required. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claims 1-19 rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Claim 1 recites the limitation “the remained second mask portion” in lines 13 and 16. There is insufficient antecedent basis for this limitation in the claim. This appears to draw back to the “while remaining the second mask portion” of line 8. For the purposes of examination, claim 1 will be interpreted to read “while maintaining a remained second mask portion” in line 8. Claim 7 recites the limitation “the remained second mask portion” in line 4. There is insufficient antecedent basis for this limitation in the claim. This appears to draw back to the “while remaining the second mask portion” of claim 1 line 8. For the purposes of examination, claim 1 will be interpreted to read “while maintaining a remained second mask portion” in line 8. Claim 9 recites the limitation “the remained second mask portion” in line 4. There is insufficient antecedent basis for this limitation in the claim. This appears to draw back to the “while remaining the second mask portion” of claim 1 line 8. For the purposes of examination, claim 1 will be interpreted to read “while maintaining a remained second mask portion” in line 8. Claim 1 recites the limitation "the at least one area of the second metal pattern" in lines 19 and 22-23. There is insufficient antecedent basis for this limitation in the claim. This appears to draw back to the “at least one area of a top surface of the second metal pattern” of claim 1 lines 11-12. For the purposes of examination, claim 1 will be interpreted to read “the at least one area of a top surface of the second metal pattern” in lines 19 and 22-23. Claim 5 recites the limitation "the at least one area of the second metal pattern" in lines 1-2. There is insufficient antecedent basis for this limitation in the claim. This appears to draw back to the “at least one area of a top surface of the second metal pattern” of claim 1 lines 11-12. For the purposes of examination, claim 5 will be interpreted to read “the at least one area of a top surface of the second metal pattern” in lines 1-2. Claim 16 recites the limitation "the at least one area of the second metal pattern" in lines 1-2. There is insufficient antecedent basis for this limitation in the claim. This appears to draw back to the “at least one area of a top surface of the second metal pattern” of claim 1 lines 11-12. For the purposes of examination, claim 16 will be interpreted to read “the at least one area of a top surface of the second metal pattern” in lines 1-2. Claims 2-19 are also rejected under 35 U.S.C. 112(b) as being indefinite for further limiting and being dependent on indefinite claim 1. Allowable Subject Matter Claims 1-19 as interpreted are allowed. The following is an examiner’s statement of reasons for allowance: Claims 1-19 as interpreted are allowed primarily because the prior art of record cannot anticipate or render obvious the limitation as recited and interpreted in claim 1 in its entirety. The closest prior art of record, Applicant’s own co-pending application (Chen et al. US 2025/0188638 A1) teaches a method of forming an electrode with an anodized part but fails to teach the method steps as stated in claim 1 of the current application. The claims will be allowable should the above rejections and objections be overcome. Any comments considered necessary by applicant must be submitted no later than the payment of the issue fee and, to avoid processing delays, should preferably accompany the issue fee. Such submissions should be clearly labeled “Comments on Statement of Reasons for Allowance.” Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to SAMMANTHA K SALAZ whose telephone number is (571)272-2484. The examiner can normally be reached Monday - Friday 8:00am-5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, N. Drew Richards can be reached at 571-272-1736. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /SAMMANTHA K SALAZ/Examiner, Art Unit 2892 /ERIC W JONES/Primary Examiner, Art Unit 2892
Read full office action

Prosecution Timeline

Dec 06, 2023
Application Filed
Mar 20, 2026
Non-Final Rejection — §112 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
95%
Grant Probability
99%
With Interview (+7.7%)
3y 4m
Median Time to Grant
Low
PTA Risk
Based on 19 resolved cases by this examiner. Grant probability derived from career allow rate.

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