Prosecution Insights
Last updated: April 19, 2026
Application No. 18/554,225

ETCHING METHOD AND PROCESSING DEVICE

Non-Final OA §102§103
Filed
Oct 06, 2023
Examiner
LU, JIONG-PING
Art Unit
1713
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
83%
Grant Probability
Favorable
1-2
OA Rounds
2y 3m
To Grant
91%
With Interview

Examiner Intelligence

Grants 83% — above average
83%
Career Allow Rate
779 granted / 935 resolved
+18.3% vs TC avg
Moderate +8% lift
Without
With
+7.9%
Interview Lift
resolved cases with interview
Typical timeline
2y 3m
Avg Prosecution
54 currently pending
Career history
989
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
47.5%
+7.5% vs TC avg
§102
27.9%
-12.1% vs TC avg
§112
16.2%
-23.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 935 resolved cases

Office Action

§102 §103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. Election/Restrictions Applicant’s election without traverse of claims 1-9 in the reply filed on December 31, 2025 is acknowledged. Claim 10 is withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected invention, there being no allowable generic or linking claim. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office Action: A person shall be entitled to a patent unless – (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-8 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Fan et al. (US20240021435). Regarding claim 1, Fan discloses an etching method of etching a metal on a substrate (abstract), the etching method comprising: (a) modifying a surface layer of the metal into a halide-containing surface layer by exposing the metal to a halogen-containing gas (claim 1); (b) removing the halide-containing surface layer by exposing the halide-containing surface layer to a gas containing carbon (C) and oxygen (O) (CO, claims 1 and 3); and (c) repeating the step of (a) and the step of (b) in this order (claim 7). Regarding claims 2-3, Fan discloses wherein the metal is Fe (paragraph 0031). Regarding claims 4-5, Fan discloses wherein the halogen-containing gas includes Cl2 (claim 5). Regarding claim 6, Fan discloses wherein the gas containing C and O includes CO (claim 3). Regarding claim 7, Fan discloses wherein in the step of (b), the halide-containing surface layer is carbonylated and removed by the gas containing C and O (paragraph 0046). Regarding claim 8, Fan discloses wherein in the step of (a) and the step of (b), a temperature of a stage on which the substrate is placed is controlled so that a temperature of the substrate ranges from 60 degrees C to 200 degrees C (paragraphs 0029 and 0032). Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office Action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim 9 is rejected under 35 U.S.C. 103 as being obvious over Fan et al. (US20240021435) as applied to claim 8 above. Regarding claim 9, Fan discloses wherein in the step of (a) and the step of (b), the temperature of the stage is controlled so that the temperature of the substrate ranges from 60 degrees C to 200 degrees C (paragraphs 0029 and 0032), which overlaps with the range recited in the instant claim. In the case where the claimed ranges “overlap or lie inside ranges disclosed by the prior art” a prima facie case of obviousness exists. In re Wertheim, 541 F.2d 257, 191 USPQ 90 (CCPA 1976); In re Woodruff, 919 F.2d 1575, 16 USPQ2d 1934 (Fed. Cir. 1990). MPEP 2144.05(I). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to JIONG-PING LU whose telephone number is (571) 270-1135. The examiner can normally be reached on M-F: 9:00am – 5:00pm. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Joshua L Allen, can be reached at telephone number (571)270-3176. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from Patent Center. Status information for published applications may be obtained from Patent Center. Status information for unpublished applications is available through Patent Center for authorized users only. Should you have questions about access to Patent Center, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) Form at https://www.uspto.gov/patents/uspto-automated- interview-request-air-form. /JIONG-PING LU/ Primary Examiner, Art Unit 1713
Read full office action

Prosecution Timeline

Oct 06, 2023
Application Filed
Jan 28, 2026
Non-Final Rejection — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12600909
ETCHING SOLUTION COMPOSITION
2y 5m to grant Granted Apr 14, 2026
Patent 12598929
ATOMIC LAYER ETCHING OF MOLYBDENUM
2y 5m to grant Granted Apr 07, 2026
Patent 12595413
SILICON NITRIDE ETCHING COMPOSITIONS AND METHOD
2y 5m to grant Granted Apr 07, 2026
Patent 12593637
CHEMICAL PLANARIZATION
2y 5m to grant Granted Mar 31, 2026
Patent 12578641
PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
2y 5m to grant Granted Mar 17, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

AI Strategy Recommendation

Get an AI-powered prosecution strategy using examiner precedents, rejection analysis, and claim mapping.
Powered by AI — typically takes 5-10 seconds

Prosecution Projections

1-2
Expected OA Rounds
83%
Grant Probability
91%
With Interview (+7.9%)
2y 3m
Median Time to Grant
Low
PTA Risk
Based on 935 resolved cases by this examiner. Grant probability derived from career allow rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month