DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Election/Restrictions
Claims 6-16 are withdrawn from further consideration pursuant to 37 CFR 1.142(b) as being drawn to a nonelected device and method, there being no allowable generic or linking claim. Election was made without traverse in the reply filed on 7/17/2026.
Claim Rejections - 35 USC § 102
In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –
(a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention.
Claim(s) 1, 2, 4, and 5 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Malik et al (2011/0184139).
Malik et al disclose metal-containing resist (non-chemically amplified), wherein the resist comprises a metal oxide compound (comprising oxygen-containing ligands; see TABLE 1, claim 1, 15, [0035]-[0043]; instant claims 1, 2), and further comprises a solvent (instant claim 5), and a photoinitator having a ketone (Irgacure 184; [0078]-[0079]) which is a ketone having a carbonyl group (instant claim 4)and absorbs radiation in the 300nm or less wavelength and releases a radial absorbing in the 300nm or more range.
Claim(s) 1 and 2 is/are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Ma et al (2020/0096870).
Ma et al disclose a non-chemically amplified resist (organometallic EUV resist sensitize to wavelength of less than 300 nm), and a sensitizing precursor ([0006], [0022], [0026], [0029]) implanted into the resist to improve sensitivity upon exposure. Xe a preferred sensitizer, known as absorbing EUV radiation (ionizing) under 2300nm, and also UV/ Vis non-ionizing radiation having a wavelength of greater than 300 nm (instant claims 1 and 2).
Claim Rejections - 35 USC § 103
In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.
The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action:
A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made.
Claim(s) 1 and 3-5 is/are rejected under 35 U.S.C. 103 as being unpatentable over
Tagawa et al (2016/0004160).
Tagawa et al teach a non-chemically amplified resist including a sensitizing precursor ([0024], [0087]). The precursors are sensitive to DUV, and EUV having a wavelength of less than 300 nm, and may be at least one of bis(4-methoxyphenyl)methanol (DOMeBzH), a dimethoxy benzhydrol derivative (DOBzMM), and trimethoxy benzhydrol (TriOMeBzH) ([0154], [0182], [0184], [0189]; alcohol, instant claim 4). The polymer is preferably a hydroxystyrene and PMMA resin main chain scission-type resist, resist as dissolved in solvent, then spin-coated; instant claims 3 and 5), and examples include PMMA resist polymers, and ZEP250A, a combination of chloroacrylate and methylstyrene (example 3, in anisole solvent).
Given the teachings of the reference, it would have been obvious to one of ordinary skill in the art, prior to the effective filing date of the instant invention to prepare the material of Tagawa et al, choosing as the resist, a non-chemically amplified resist comprising a sensitizer precursor sensitive to radiation of 300nm or less, which also generates a sensitizer absorbing radiation of 300nm or more.
Claim(s) 1 and 4 is/are rejected under 35 U.S.C. 103 as being unpatentable over Tagawa et al in view of Wall et al (12,535,735).
Tagawa et al has been discussed above. The reference teaches known photoinitiators, such as those having a ketone structure are suitable for use in its composition.
Wall et al disclose improved ketone-type photoinitiators for use in resist compositions. The reference teaches the compounds are improved photoinitiators for photoresists, resulting in reduced scum, with preferred compound being that as disclosed as preferred by the instant specification (column 2, lines 27-63).
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Given the teachings of the references, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the composition of Tagawa et al, choosing as the photoinitiator, the improved ketone as taught by Wall et al to achieve less scum.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to AMANDA C WALKE whose telephone number is (571)272-1337. The examiner can normally be reached Monday to Thursday 5:30am to 4pm.
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If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Niki Bakhtiari can be reached at 571-272-3433. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
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/AMANDA C. WALKE/ Primary Examiner, Art Unit 1722
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