Prosecution Insights
Last updated: July 17, 2026
Application No. 18/611,527

PLASMA ASSISTED METAL OXIDE REDUCTION

Non-Final OA
Filed
Mar 20, 2024
Examiner
BERRY, PAUL ANTHONY
Art Unit
4100
Tech Center
4100
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
1y 0m
Est. Remaining
84%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allowance Rate
35 granted / 40 resolved
+27.5% vs TC avg
Minimal -4% lift
Without
With
+-3.8%
Interview Lift
resolved cases with interview
Typical timeline
3y 4m
Avg Prosecution
29 currently pending
Career history
90
Total Applications
across all art units

Statute-Specific Performance

§103
92.3%
+52.3% vs TC avg
§102
3.2%
-36.8% vs TC avg
§112
4.5%
-35.5% vs TC avg
Black line = Tech Center average estimate • Based on career data from 40 resolved cases

Prosecution Timeline

Mar 20, 2024
Application Filed
May 08, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12677685
PACKAGE STRUCTURE AND METHOD FOR FORMING THE SAME
4y 2m to grant Granted Jul 07, 2026
Patent 12666655
METHOD FOR MANUFACTURING TELLURIUM-BASED SEMICONDUCTOR DEVICE, TELLURIUM-BASED SEMICONDUCTOR DEVICE MANUFACTURED THEREBY, AND THIN FILM TRANSISTOR
3y 4m to grant Granted Jun 23, 2026
Patent 12641793
NONVOLATILE MEMORY DEVICE
3y 9m to grant Granted May 26, 2026
Patent 12604537
HIGH MOBILITY TRANSISTOR ELEMENT RESULTING FROM IGTO OXIDE SEMICONDUCTOR CRYSTALLIZATION, AND PRODUCTION METHOD FOR SAME
2y 9m to grant Granted Apr 14, 2026
Patent 12604724
VERTICAL SEMICONDUCTOR DEVICE
2y 11m to grant Granted Apr 14, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
84%
With Interview (-3.8%)
3y 4m (~1y 0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 40 resolved cases by this examiner. Grant probability derived from career allowance rate.

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