Prosecution Insights
Last updated: October 26, 2026
Application No. 18/670,342

Semiconductor Device and Method of Making Using Shape-Memory Alloy Structures

Final Rejection §102§103
Filed
May 21, 2024
Examiner
VU, DAVID
Art Unit
2818
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Stats Chippac Pte. Ltd.
OA Round
2 (Final)
77%
Grant Probability
Favorable
3-4
OA Rounds
4m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
583 granted / 754 resolved
+9.3% vs TC avg
Strong +18% interview lift
Without
With
+18.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
15 currently pending
Career history
774
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
54.9%
+14.9% vs TC avg
§102
33.0%
-7.0% vs TC avg
§112
8.7%
-31.3% vs TC avg
Black line = Tech Center average estimate • Based on career data from 754 resolved cases

Office Action

§102 §103
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . DETAILED ACTION Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. 1. Claims 20-25 are rejected under 35 U.S.C. 102(a1) as being anticipated by Lu et al. (US 10,867,957; hereinafter Lu). Regarding claim 20, Lu, in fig. 2B, discloses a semiconductor device, comprising: an interposer 106 (col. 3, lines 8-9); a substrate 100; and a shape-metal alloy (SMA) structure 210 disposed between the interposer 106 and substrate 100. Regarding claim 21, Lu discloses further including a semiconductor package 106 (col. 3, lines 4-8) disposed over the interposer 106 opposite the substrate 100 (fig. 2B). Regarding claim 22, Lu discloses further including a solder bump 104’ disposed between the interposer 106 and semiconductor package 106 (fig. 2B). Regarding claim 23, Lu discloses further including an electrical component 106 (col. 3, lines 4-8) disposed between the interposer 106 and substrate 100 (fig. 2B). Regarding claim 24, Lu discloses further including a solder bump 104’ disposed between the interposer 106 and substrate 100 (fig. 2B). Regarding claim 25, Lu discloses further including a plurality of SMA structures 210 disposed between the interposer 106 and substrate 100, wherein one of the plurality of SMA structures 210 is disposed at each corner of the interposer 106 (figs. 7C-7D). Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102 of this title, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. 2. Claims 1-19 are rejected under 35 U.S.C. 103 as being unpatentable over Lu (US 10,867,957) in view of Chen et al. (US 2018/0374821; hereinafter Chen). Regarding claim 1, Lu, in figs. 2A-2B, discloses a method of making a semiconductor device, comprising: providing a semiconductor die 100; disposing a shape-metal alloy (SMA) structure 206 over the semiconductor die 100, wherein the SMA structure 206 is formed of Nickel-Titanium (col. 4, lines 17-21); disposing a solder bump 114 over the semiconductor die 100; disposing an electrical component (col. 2, lines 49-52) over the semiconductor die 100; disposing the semiconductor die 100 over a substrate 106 with the SMA structure 206, solder bump 114, and electrical component between the semiconductor die 100 and substrate 106; and reflowing the solder bump 114 (col. 4, lines 41-44). Lu discloses a method of making a semiconductor device as above but fails to disclose the semiconductor die is an interposer die. However, Chen discloses the semiconductor die 101 is an interposer die (fig.1 & [0023]). Therefore, it would have been obvious to a person of ordinary skill in the art before the effective filing date of the claimed invention to form the interposer die as taught by Chen in order to provide support and connectivity for electronic components and devices mounted thereon. Regarding claim 2, Lu discloses wherein reflowing the solder bump 114 expands the SMA structure 206 (fig. 2B). Regarding claim 3, Lu discloses wherein the SMA structure shrinks while cooling after reflow (fig. 2B). Regarding claim 4, Chen discloses further including disposing a semiconductor package 102 over the interposer 101 opposite the substrate 106 (fig. 1). Regarding claim 5, Chen discloses further including reflowing the solder bump 107 for a second time after disposing the semiconductor package 102 over the interposer 101 (figs. 8F-8G). Regarding claim 6, Lu discloses wherein a gap exists between the solder bump 114 and substrate 106 prior to reflow (figs. 2A-2B). Regarding claim 7, Lu, in figs. 2A-2B, discloses a method of making a semiconductor device, comprising: providing a semiconductor die 100; disposing a shape-metal alloy (SMA) structure 206 over the semiconductor die 100, disposing a solder bump 114 over the semiconductor die 100; disposing the semiconductor die 100 over a substrate 106 with the SMA structure 206 and solder bump 114 between the semiconductor die 100 and substrate 106; and reflowing the solder bump 114 (col. 4, lines 41-44). Lu discloses a method of making a semiconductor device as above but fails to disclose the semiconductor die is an interposer die. However, Chen discloses the semiconductor die 101 is an interposer die (fig.1 & [0023]). Therefore, it would have been obvious to a person of ordinary skill in the art before the effective filing date of the claimed invention to form the interposer die as taught by Chen in order to provide support and connectivity for electronic components and devices mounted thereon. Regarding claim 8, Lu discloses wherein reflowing the solder bump 114 expands the SMA structure 206 (fig. 2B). Regarding claim 9, Lu discloses wherein the SMA structure shrinks while cooling after reflow (fig. 2B). Regarding claim 10, Chen discloses further including disposing a semiconductor package 102 over the interposer 101 opposite the substrate 106 (fig. 1). Regarding claim 11, Chen discloses further including reflowing the solder bump 107 for a second time after disposing the semiconductor package 102 over the interposer 101 (figs. 8F-8G). Regarding claim 12, Lu discloses wherein a gap exists between the solder bump 114 and substrate 106 prior to reflow (figs. 2A-2B). Regarding claim 13, Lu discloses further including singulating the substrate, wherein the singulation removes the SMA structure (figs. 7C-7D). Regarding claim 14, Lu, in figs. 2A-2B, discloses a method of making a semiconductor device, comprising: providing a semiconductor die 100; disposing a shape-metal alloy (SMA) structure 206 over the semiconductor die 100; disposing the semiconductor die 100 over a substrate 106 with the SMA structure 206 between the semiconductor die 100 and substrate 106. Lu discloses a method of making a semiconductor device as above but fails to disclose the semiconductor die is an interposer die. However, Chen discloses the semiconductor die 101 is an interposer die (fig.1 & [0023]). Therefore, it would have been obvious to a person of ordinary skill in the art before the effective filing date of the claimed invention to form the interposer die as taught by Chen in order to provide support and connectivity for electronic components and devices mounted thereon. Regarding claim 15, Chen discloses further including disposing a semiconductor package 102 over the interposer 101 opposite the substrate 106 with a solder bump 103/104 of the semiconductor package 102 disposed between the semiconductor package 102 and interposer 101 (fig. 1). Regarding claim 16, Chen discloses further including reflowing the solder bump 107 after disposing the semiconductor package 102 over the interposer 101 (fig. 8B). Regarding claim 17, Lu discloses wherein reflowing the solder bump 114 expands the SMA structure 206 (fig. 2B). Regarding claim 18, Lu discloses wherein the SMA structure shrinks while cooling after reflow (fig. 2B). Regarding claim 19, Chen discloses further including disposing a plurality of SMA structures 107 over the interposer 101 with one of the plurality of SMA structures 107 disposed at each corner of the interposer 101 (fig. 8E). Conclusion 3. Any inquiry concerning this communication or earlier communications from the examiner should be directed to David Vu whose telephone number is (571) 272-1798. The examiner can normally be reached on Monday-Friday from 8:00am to 5:00pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempt to reach the examiner by telephone are unsuccessful, the examiner's supervisor, Steven Loke H can be reached on (571) 272-1657. The fax phone number for the organization where this application or proceeding is assigned is (571) 273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /DAVID VU/ Primary Examiner, Art Unit 2818
Read full office action

Prosecution Timeline

May 21, 2024
Application Filed
Aug 11, 2026
Non-Final Rejection mailed — §102, §103
Aug 25, 2026
Response Filed
Oct 21, 2026
Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12772857
METHOD FOR FORMING A SHIELDING LAYER OVER A SEMICONDUCTOR PACKAGE WITH REDUCED METAL BURRS
2y 6m to grant Granted Oct 20, 2026
Patent 12765003
SEMICONDUCTOR DEVICE
2y 8m to grant Granted Oct 13, 2026
Patent 12757422
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN STRUCTURE HAVING MODIFIED SHAPE
2y 6m to grant Granted Oct 06, 2026
Patent 12745502
DISPLAY PANEL
2y 6m to grant Granted Sep 22, 2026
Patent 12740458
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
2y 7m to grant Granted Sep 15, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

3-4
Expected OA Rounds
77%
Grant Probability
95%
With Interview (+18.0%)
2y 9m (~4m remaining)
Median Time to Grant
Moderate
PTA Risk
Based on 754 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month