Prosecution Insights
Last updated: July 17, 2026
Application No. 18/678,180

SUPPORT STRUCTURE FOR CHARGED PARTICLE BEAM TARGET

Non-Final OA §102
Filed
May 30, 2024
Priority
May 31, 2023 — provisional 63/505,114
Examiner
VANORE, DAVID A
Art Unit
2878
Tech Center
2800 — Semiconductors & Electrical Systems
Assignee
Tae Technologies Inc.
OA Round
1 (Non-Final)
89%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
96%
With Interview

Examiner Intelligence

Grants 89% — above average
89%
Career Allowance Rate
1121 granted / 1261 resolved
+20.9% vs TC avg
Moderate +7% lift
Without
With
+7.4%
Interview Lift
resolved cases with interview
Fast prosecutor
1y 10m
Avg Prosecution
25 currently pending
Career history
1282
Total Applications
across all art units

Statute-Specific Performance

§101
14.5%
-25.5% vs TC avg
§103
16.3%
-23.7% vs TC avg
§102
34.6%
-5.4% vs TC avg
§112
25.0%
-15.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1261 resolved cases

Office Action

§102
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Information Disclosure Statement The information disclosure statement (IDS) submitted on 9/4/24 has been considered by the examiner. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claim(s) 1, 2, 5, 8-9, 11, 14-16, 20, 25, and 39 is/are rejected under 35 U.S.C. 102(a)(1) as being clearly anticipated by US Patent Application Publication 2021/0076481. Regarding claim 1, ‘481 discloses an article comprising a first layer comprising lithium (Fig. 5, Item 110) and a support structure (Fig. 5 Item 120) comprising one or more channels (122) defining a continuous fluid channel therein with an inlet and outlet (204, 208) the one or more channels comprising non-planar (Note 3D aspect of channels in Fig. 4-5) following curved paths (Note the curved paths defined by the channels in Fig. 4). Regarding claims 2 and 15, ‘481 shows in Fig. 4 that the one or more channels are continuously curving and fluidly coupled. Regarding claim 5, ‘481 does not show blaze or weld joints and shows a monolithic support structure in Fig. 4. Regarding claim 8, ‘481 teaches a support structure coupled to water inlet and outlets 204,208. Regarding claim 9, ‘481 teaches a lithium layer bonded to a support structure by an interlayer which supports intermaterial diffusion [0043]. Regarding claim 11, the article of ‘481 is a neutron generating target (Abstract). Regarding claims 14 and 16, ‘481 discloses a support structure composed of copper which has a thermal conductivity of about 400 W/(mK). Regarding claim 20, ‘481 discloses using a first layer comprising lithium and discloses that the lithium to be relied on is 7Li [0005-0006]. Regarding claim 25, the support structure of claim 1 functions as a heat transfer unit and comprises substantially similar claimed structure as disclosed in ‘481. Regarding claim 39, in addition to the article of claim 1 noted above, ‘481 teaches an ion source (22) and a tandem accelerator (40). Allowable Subject Matter Claim 3, 10, 12, 13, 17-18, and 21-22 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The following is a statement of reasons for the indication of allowable subject matter: The prior art fails to teach or suggest the article of claim 1 wherein the support structure comprises a monolithic structure that is formed in an additive manufacturing operation. The prior art fails to teach or suggest the article of claim 1 wherein the article has a rectangular shape, and a length of the article is from 5 centimeters (cm) to 20 cm. The prior art fails to teach or suggest the article of claim 1 wherein a weight of the article is from 500 grams to 1,000 grams. The prior art fails to teach or suggest the article of claim 1 wherein the article has a circular shape and the diameter of the article is from 5 centimeters (cm) to 20 cm. The prior art fails to teach or suggest the article of claim 1 wherein: a thickness of the plate is from 1 millimeter (mm) to 8 mm, and the plate is 2 times, 5 times, 10 times, 20 times, 50 times, 60 times, 70 times, 80 times, 90 times, or 100 times thicker than the first layer. The prior art fails to teach or suggest the article of claim 1 wherein the thickness of the plate is selected from 2 mm, 3 mm, 4 mm, 5 mm, 6 mm, or 7 mm. The prior art fails to teach or suggest the article of claim 1 wherein: a thickness of the first layer is from 15 micrometers (pm) to 180 pm, and a thickness of the support structure is from 10 mm to 50 mm. The prior art fails to teach or suggest the article of claim 1 wherein the thickness of the first layer is from 90 pm to 100 pm. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to DAVID A VANORE whose telephone number is (571)272-2483. The examiner can normally be reached Monday to Friday 7AM to 6 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Georgia EPPS can be reached at (571) 272-2328. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. DAVID A. VANORE Primary Examiner Art Unit 2881 /DAVID A VANORE/ Primary Examiner, Art Unit 2878
Read full office action

Prosecution Timeline

May 30, 2024
Application Filed
Jun 04, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
89%
Grant Probability
96%
With Interview (+7.4%)
1y 10m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1261 resolved cases by this examiner. Grant probability derived from career allowance rate.

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