Tech Center 2800 • Art Units: 2855 2878 2881
This examiner grants 89% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18905665 | SCANNING ELECTRON MICROSCOPE (SEM) IMAGE IMPROVING METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO, LTD. |
| 18806211 | SPECIMEN IMAGING SYSTEMS AND METHODS | Non-Final OA | Georgia Tech Research Corporation |
| 18695575 | ULTRAVIOLET LIGHT IRRADIATION SHEET | Non-Final OA | NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
| 18693133 | AIR CONDITIONING EQUIPMENT | Non-Final OA | NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
| 18771126 | CHARGED PARTICLE BEAM DEVICE | Non-Final OA | Hitachi High-Tech Corporation |
| 18270937 | Charged Particle Beam Device | Non-Final OA | Hitachi High-Tech Corporation |
| 18769008 | THERMALLY OPTIMIZED EXTRACTION PLATE FOR ION IMPLANTER | Non-Final OA | Applied Materials, Inc. |
| 18758615 | TRANSMISSION ELECTRON MICROSCOPE AND SAMPLE ANALYSIS METHOD USING TRANSMISSION ELECTRON MICROSCOPE | Non-Final OA | Kioxia Corporation |
| 18567195 | IMPROVEMENTS IN AND RELATING TO ION ANALYSIS | Final Rejection | SHIMADZU CORPORATION |
| 18728112 | SPECIMEN SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD | Non-Final OA | HAMAMATSU PHOTONICS K.K. |
| 18754126 | METHOD AND SYSTEM FOR 3D RECONSTRUCTION OF WAFER STRUCTURE BY DIAGONAL MILLING | Non-Final OA | Applied Materials Israel Ltd. |
| 18818079 | LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE | Non-Final OA | ASML Netherlands B.V. |
| 18284839 | ON SYSTEM SELF-DIAGNOSIS AND SELF-CALIBRATION TECHNIQUE FOR CHARGED PARTICLE BEAM SYSTEMS | Final Rejection | ASML Netherlands B.V. |
| 18798775 | STERILIZATION MODULE AND WATER PURIFYING DEVICE HAVING THE SAME | Non-Final OA | Seoul Viosys Co., Ltd. |
| 18698102 | METHODS AND SYSTEMS FOR PROCESSING IN REAL-TIME AND USING GAUSSIAN | Final Rejection | DH TECHNOLOGIES DEVELOPMENT PTE. LTD. |
| 18678180 | SUPPORT STRUCTURE FOR CHARGED PARTICLE BEAM TARGET | Non-Final OA | TAE Technologies, Inc. |
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