Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 2682 2855 2878 2881
This examiner grants 89% of resolved cases
David A. Vanore has resolved 1269 cases in Art Unit 2682. The allowance rate is 88.9 percent, and the median days to allowance is 688. These figures show a successful and efficient prosecution record in Tech Center 2800. The 1269 cases provide a stable statistical basis for these performance metrics.
The interview lift is 7.5 percent. This 7.5 percent lift suggests that interviews have a modest positive impact on the 88.9 percent allowance rate. With 1269 cases of experience, the 7.5 percent lift and 688-day timeline provide a reliable baseline for applicant expectations. While the 7.5 percent lift is not as high as in other units, it still offers a useful tactical advantage for navigating the 688-day median pendency.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18905665 | SCANNING ELECTRON MICROSCOPE (SEM) IMAGE IMPROVING METHOD | Non-Final OA | SAMSUNG ELECTRONICS CO, LTD. |
| 18806211 | SPECIMEN IMAGING SYSTEMS AND METHODS | Non-Final OA | Georgia Tech Research Corporation |
| 18690667 | ELECTRON BEAM-BASED EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE | Non-Final OA | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY |
| 18969157 | ANNULAR APPARATUS FOR GENERATING ACCELERATED ELECTRONS | Non-Final OA | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. |
| 18695575 | ULTRAVIOLET LIGHT IRRADIATION SHEET | Non-Final OA | NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
| 18693133 | AIR CONDITIONING EQUIPMENT | Non-Final OA | NIPPON TELEGRAPH AND TELEPHONE CORPORATION |
| 18771126 | CHARGED PARTICLE BEAM DEVICE | Non-Final OA | Hitachi High-Tech Corporation |
| 18270937 | Charged Particle Beam Device | Non-Final OA | Hitachi High-Tech Corporation |
| 18758615 | TRANSMISSION ELECTRON MICROSCOPE AND SAMPLE ANALYSIS METHOD USING TRANSMISSION ELECTRON MICROSCOPE | Non-Final OA | Kioxia Corporation |
| 18633764 | Detection of Space Charge Effect During Ion Implantation | Non-Final OA | Applied Materials, Inc. |
| 18567195 | IMPROVEMENTS IN AND RELATING TO ION ANALYSIS | Final Rejection | SHIMADZU CORPORATION |
| 18728112 | SPECIMEN SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD | Non-Final OA | HAMAMATSU PHOTONICS K.K. |
| 18818079 | LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SOURCE | Non-Final OA | ASML Netherlands B.V. |
| 18284839 | ON SYSTEM SELF-DIAGNOSIS AND SELF-CALIBRATION TECHNIQUE FOR CHARGED PARTICLE BEAM SYSTEMS | Non-Final OA | ASML Netherlands B.V. |
| 18327847 | CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD | Non-Final OA | ASML Netherlands B.V. |
| 18671085 | METHOD FOR REDUCING CHARGE AND ION OPTICAL SYSTEM | Non-Final OA | Thermo Fisher Scientific (Bremen) GmbH |
| 18940718 | STERILIZATION MODULE, WATER PURIFICATION DEVICE, AND SYSTEM COMPRISING WATER PURIFICATION DEVICE | Non-Final OA | SEOUL VIOSYS CO., LTD. |
| 18798775 | STERILIZATION MODULE AND WATER PURIFYING DEVICE HAVING THE SAME | Non-Final OA | Seoul Viosys Co., Ltd. |
| 18754126 | METHOD AND SYSTEM FOR 3D RECONSTRUCTION OF WAFER STRUCTURE BY DIAGONAL MILLING | Non-Final OA | Applied Materials Israel Ltd. |
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