Prosecution Insights
Last updated: October 02, 2026
Application No. 18/685,539

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

Non-Final OA §103
Filed
Feb 22, 2024
Priority
Sep 06, 2021 — JP 2021-144675 +2 more
Examiner
WALKE, AMANDA C
Art Unit
Tech Center
Assignee
JSR Corporation
OA Round
1 (Non-Final)
88%
Grant Probability
Favorable
1-2
OA Rounds
0m
Est. Remaining
97%
With Interview

Examiner Intelligence

Grants 88% — above average
88%
Career Allowance Rate
1531 granted / 1731 resolved
+28.4% vs TC avg
Moderate +9% lift
Without
With
+8.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
44 currently pending
Career history
1751
Total Applications
across all art units

Statute-Specific Performance

§101
1.7%
-38.3% vs TC avg
§103
51.8%
+11.8% vs TC avg
§102
22.3%
-17.7% vs TC avg
§112
14.2%
-25.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 1731 resolved cases

Office Action

§103
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Claim Objections Claim 9 is objected to because of the following informalities: In line 3, the claim recites “than the resin”, which should be “than the base resin”. Appropriate correction is required. Claim Rejections - 35 USC § 103 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. Claim(s) 1-11 is/are rejected under 35 U.S.C. 103 as being unpatentable over Hatakeyama et al (2017/0343898) in view of Fujiwara et al (2021/0149301). Hatakeyama et al disclose a resist composition comprising a polymer comprising units (a), (b), (c), and (d), having the following structures, wherein (c) equates to the instant phenolic hydroxy group-containing unit, and (d) equates to the instant (1) and (2): PNG media_image1.png 312 306 media_image1.png Greyscale PNG media_image2.png 448 312 media_image2.png Greyscale PNG media_image3.png 498 312 media_image3.png Greyscale PNG media_image4.png 556 296 media_image4.png Greyscale In formula (d), preferred structures fall within the scope of both (1) and (2), with (1) being used in an example, and formulas (A-1)-1 to (A-1)-10 also meet the limitations of (2), wherein each group is a hydrocarbon group (see (A-1) and (A-3) above). PNG media_image5.png 176 298 media_image5.png Greyscale PNG media_image6.png 162 308 media_image6.png Greyscale Instant Rx is a hydrocarbon chain, with exemplified compounds having 1-10 carbon atoms as required by the instant claim 2 (example includes 2, but RL8 is 1-10 carbons atoms; [0050]). Examples above include units wherein each of the instant Rc1 and Rc2 are alkyl chains of 1-10 carbon atoms, and Rc3 is cycloalkyl having 6-12 carbon atoms [0049]. Additionally, the reference teaches hydrocarbon groups include phenyl and naphthyl (aromatic groups) as exemplified compounds include aliphatic and aromatic rings as contemplated for various structures ([0051], [0053]) as required by the instant claim 3. The exemplified polymers include lactone-containing units (instant claim 7), and a sulfonium salt-containing units having an anion and cation, one of which is bonded to the polymer backbone (claim 3; instant claim 8). The reference teaches that additional components known in the art may be included, such as acid generators ([0087], [0089]; instant claim 6), and basic compounds or quenchers to reduce the acid diffusion ([0091]). The reference doesn’t disclose a compound as claimed having the structure of the instant formula (α). However, Fujiwara et al disclose a resist composition comprising an onium salt acid diffusion controller. The compound has a basic structure falling within the scope of the instant formula. PNG media_image7.png 316 306 media_image7.png Greyscale In the formula, the instant Lq is reference -L1-O-C(R1)(R2)-C(Rf1)(Rf2)-, reference Ar is instant phenyl ring, reference R being more specifically R4 and R (instant I and Rw) with compound below having R4 as H, F, I, or C1-C10 hydrocarbyl, and R being a group of R-1 to (R-5) which meet the limitations of the instant formula for Rw being a monovalent organic group. When the exemplified compounds below replace the F with an I, the compounds meet the limitations of the instant claim 1. In examples, n (instant q2) is 1, instant q3 is 1, and when m (instant q1) is 2 or 3 (can be 0-4), the compounds meet the limitations of the instant claim 4. PNG media_image8.png 352 340 media_image8.png Greyscale PNG media_image9.png 218 268 media_image9.png Greyscale PNG media_image10.png 208 212 media_image10.png Greyscale Exemplified cations include fluorinated sulfonium cation equating to instant “Z+” ([0060], [0063], claim 5; instant claim 5). The inclusion of these specific class of compounds as an acid diffusion controller results in improved sensitivity, CDU, and reduced pattern defects. Given the teachings of the references, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Hatakeyama et al, choosing as the acid diffusion controller, that taught by Fujiwara et al to achieve improved sensitivity, CDU, and reduced pattern defects. The Hatakeyama et al reference further teaches the inclusion of a surfactant, but fails to specifically teach a fluorine (high fluorine content) surfactant. Fujiwara et al further teaches the advantages of fluorine-containing polymeric surfactants, wherein the monomers include fluorine atoms and perfluoro groups, having a higher fluorine content than the base resin ([0192]-[0195]; instant claim 9), which improves the coating of the composition. Given the teachings of the references, it would have been obvious to one of ordinary skill in the art prior to the effective filing date of the instant invention to prepare the material of Hatakeyama et al, choosing as the surfactant, that taught by Fujiwara et al to achieve improved coatability. The reference teaches a method as set forth by the instant claims 10 and 11: PNG media_image11.png 72 304 media_image11.png Greyscale PNG media_image12.png 30 296 media_image12.png Greyscale Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Each of Maruyama et al (2022/0299875, 2024/0152050), Masunaga et al (2023/0393465), Nishikori et al (2022/0382152), and (2023/0236501), are cited for their teachings of similar polymers and compounds similar to the instantly claimed acid diffusion controller. Any inquiry concerning this communication or earlier communications from the examiner should be directed to AMANDA C WALKE whose telephone number is (571)272-1337. The examiner can normally be reached Monday to Thursday 5:30am to 4pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Niki Bakhtiari can be reached at 571-272-3433. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /AMANDA C. WALKE/ Primary Examiner, Art Unit 1722
Read full office action

Prosecution Timeline

Feb 22, 2024
Application Filed
Aug 18, 2026
Non-Final Rejection mailed — §103 (current)

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
88%
Grant Probability
97%
With Interview (+8.6%)
2y 5m (~0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 1731 resolved cases by this examiner. Grant probability derived from career allowance rate.

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