Prosecution Insights
Last updated: October 23, 2026
Application No. 18/730,100

PLASMA PROCESSING APPARATUS

Non-Final OA §102
Filed
Jul 18, 2024
Priority
Jan 25, 2022 — JP 2022-009544 +1 more
Examiner
KACKAR, RAM N
Art Unit
Tech Center
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
41%
Grant Probability
Moderate
1-2
OA Rounds
1y 8m
Est. Remaining
98%
With Interview

Examiner Intelligence

Grants 41% of resolved cases
41%
Career Allowance Rate
211 granted / 520 resolved
-19.4% vs TC avg
Strong +58% interview lift
Without
With
+57.8%
Interview Lift
resolved cases with interview
Typical timeline
3y 11m
Avg Prosecution
24 currently pending
Career history
555
Total Applications
across all art units

Statute-Specific Performance

§101
0.8%
-39.2% vs TC avg
§103
57.0%
+17.0% vs TC avg
§102
15.1%
-24.9% vs TC avg
§112
23.6%
-16.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 520 resolved cases

Office Action

§102
DETAILED ACTION The present application, filed on (7/18/2024), is being examined under the first inventor to file provisions of the AIA . Claims (1-11) are pending and being examined. Claim Rejections - 35 USC § 102 In the event the determination of the status of the application as subject to AIA 35 U.S.C. 102 and 103 (or as subject to pre-AIA 35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status. The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claims 1-7 and 9-11 are rejected under 35 U.S.C. 102 (a)(1) as being anticipated by Hirayama et al (US 20100170872). A plasma processing apparatus (Fig 1), comprising: a processing container (10) configured to perform plasma processing; a radio-frequency power source (900) configured to supply a radio frequency to an electrode (310) provided in the processing container; and a tubular portion (315) provided in the processing container, wherein the tubular portion includes a tubular outer conductor (300d), a tubular inner conductor (315a) provided inside the tubular outer conductor to be spaced apart from the tubular outer conductor, a dielectric provided between the tubular outer conductor and the tubular inner conductor (410), and a short-circuit member configured to electrically short-circuit the tubular outer conductor and the tubular inner conductor (520), and is configured to adjust an impedance of a load side electrically connected to the radio-frequency power source, and wherein the tubular outer conductor is electrically connected to the processing container as a grounded conductor (See the ground connection to 300), and wherein the tubular inner conductor is electrically connected to the electrode (See the connection at 310). Regarding claim 2 the tubular portion 315 is a wave guide and therefore presents a load reactance. Regarding claim 3 short circuit member 520 is a conductor (Para 85). Regarding claim 4 frequency band is in microwave band (Fig 1 and abstract). Regarding claim 5 gas passes through inner conductor (Fig 4). Regarding claim 6 outer and inner conductor extend upward as claimed. Regarding claim 7 dielectric 410 is disclosed. Regarding claims 9-11 plurality of electrodes as 310 and tubular portions as 315 are disclosed in Fig 1 and are disposed as claimed. Allowable Subject Matter Claim 8 is objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. The specific claimed dimension is not disclosed in the prior art. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. Shannon et al (US 2009 0140828) disclose a plasma processing apparatus (Fig 1), comprising: a processing container configured to perform plasma processing; a radio-frequency power source (110) configured to supply a radio frequency to an electrode (106) provided in the processing container; and a tubular portion provided in the processing container, wherein the tubular portion includes a tubular outer conductor (120), a tubular inner conductor (118) provided inside the tubular outer conductor to be spaced apart from the tubular outer conductor, and a short-circuit member configured to electrically short-circuit the tubular outer conductor and the tubular inner conductor (124), and is configured to adjust an impedance of a load side electrically connected to the radio-frequency power source. Any inquiry concerning this communication or earlier communications from the examiner should be directed to RAM N KACKAR whose telephone number is (571)272-1436. The examiner can normally be reached 09:00 AM-05:00 PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Parviz Hassanzadeh can be reached at 5712721435. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. RAM N. KACKAR Primary Examiner Art Unit 1716 /RAM N KACKAR/ Primary Examiner, Art Unit 1716
Read full office action

Prosecution Timeline

Jul 18, 2024
Application Filed
Oct 06, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12770833
PLASMA CHAMBER WITH A MULTIPHASE ROTATING GAS CROSS-FLOW AND PERIPHERAL CONDUCTANCE CONTROL RINGS
4y 11m to grant Granted Oct 20, 2026
Patent 12757686
Substrate Handling Apparatus for Extreme Warped Wafers
8y 0m to grant Granted Oct 06, 2026
Patent 12744185
CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER
3y 9m to grant Granted Sep 22, 2026
Patent 12706282
SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS
5y 11m to grant Granted Aug 11, 2026
Patent 12700575
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
4y 10m to grant Granted Aug 04, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
41%
Grant Probability
98%
With Interview (+57.8%)
3y 11m (~1y 8m remaining)
Median Time to Grant
Low
PTA Risk
Based on 520 resolved cases by this examiner. Grant probability derived from career allowance rate.

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