Prosecution Insights
Last updated: October 02, 2026
Application No. 18/733,178

MASK FRAME AND MASK ASSEMBLY HAVING THE SAME

Non-Final OA §102
Filed
Jun 04, 2024
Priority
Aug 28, 2023 — RE 10-2023-0113141
Examiner
FORD, NATHAN K
Art Unit
Tech Center
Assignee
Samsung Display Co., Ltd.
OA Round
1 (Non-Final)
33%
Grant Probability
At Risk
1-2
OA Rounds
2y 0m
Est. Remaining
68%
With Interview

Examiner Intelligence

Grants only 33% of cases
33%
Career Allowance Rate
221 granted / 674 resolved
-27.2% vs TC avg
Strong +35% interview lift
Without
With
+35.4%
Interview Lift
resolved cases with interview
Typical timeline
4y 4m
Avg Prosecution
40 currently pending
Career history
726
Total Applications
across all art units

Statute-Specific Performance

§101
0.3%
-39.7% vs TC avg
§103
58.1%
+18.1% vs TC avg
§102
15.4%
-24.6% vs TC avg
§112
24.2%
-15.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 674 resolved cases

Office Action

§102
DETAILED ACTION Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-20 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Huang et al., US 2021/0222291. Claims 1, 8, 17: Huang discloses a deposition apparatus, comprising: A deposition chamber (600) (Fig. 6); A mask assembly (601) disposed in the deposition chamber, including: A mask (104) [0020]; A mask frame (102) having a frame body that supports the mask (Fig. 1A); A deposition source (636) that ejects a deposition material to the mask assembly [0038]; An insulating layer (125) that blocks energy from being transmitted to the frame body [0025]. Lastly, the examiner observes that Huang’s insulating layer, alumina, can be applied in situ via the deposition apparatus, i.e., the operator can feed the appropriate precursors to the apparatus and then disperse the alumina coating through the showerhead to form an insulating layer on the mask frame. This can be repeated a twice, where the second coating may be designated as the “absorption layer.” It has been held that claims directed to an apparatus must be distinguished from the prior art in terms of structure rather than function (In re Danly, 263 F.2d 844, 847, 120 USPQ 528, 531 (CCPA 1959)). In this case, the claimed insulating and absorption layers are functional artifacts of an intended mode of operation, whereby, so long as the apparatus evidences the capacity to form the aforementioned layers, the threshold for rejection is satisfied. Said differently, Huang’s apparatus can be used in a way to generate all of the features recited by Applicant’s independent claims, whereby this demonstration of capacity is sufficient for rejection. Claims 2, 10, 18: As shown by Figure 1A, Huang’s frame body includes an opening which receives the mask. Claims 3, 11, 19: Huang’s insulation material may be aluminum oxide, which is a ceramic [0025]. Claims 4, 12, 20: The operator can regulate the coating process to derive the claimed outcome of an absorption layer that is thinner than the frame body. Claims 5, 13: Huang’s absorption layer contain aluminum [0025]. Claims 6-7: The insulating layer can be applied to the inner and outer side surfaces of Huang’s mask frame. Claims 9, 15-16: Huang’s operator can control the apparatus to apply two additional layers, where these layers may be respectively titled second insulating layer and second absorption layer. Claim 14: The operator can regulate the coating process to derive the claimed outcome of a second absorption layer that is thinner than the mask. Conclusion The following prior art is made of record as being pertinent to Applicant's disclosure, yet is not formally relied upon: Ha, US 2017/0148990. Ha discloses a deposition chamber (130), a mask assembly (105) including a mask (120) and frame (110), and a deposition source (170) (Fig. 3). Any inquiry concerning this communication or earlier communications from the examiner should be directed to NATHAN K FORD whose telephone number is (571)270-1880. The examiner can normally be reached on 11-7:30 PM. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Parviz Hassanzadeh, can be reached at 571 272 1435. The fax phone number for the organization where this application or proceeding is assigned is 571 273 8300. /N. K. F./ Examiner, Art Unit 1716 /KARLA A MOORE/ Primary Examiner, Art Unit 1716
Read full office action

Prosecution Timeline

Jun 04, 2024
Application Filed
Aug 25, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12745604
IN SITU FILM GROWTH SENSOR ASSEMBLY, APPARATUS, AND METHODS
4y 4m to grant Granted Sep 22, 2026
Patent 12744190
PLASMA PROCESSING APPARATUS AND GAS SUPPLY METHOD
3y 9m to grant Granted Sep 22, 2026
Patent 12721087
HEATED LID FOR A PROCESS CHAMBER
4y 11m to grant Granted Aug 25, 2026
Patent 12703909
COATING DRUM AND SYSTEM FOR VAPOR DEPOSITION
3y 2m to grant Granted Aug 11, 2026
Patent 12660553
HIGH TEMPERATURE AND VACUUM ISOLATION PROCESSING MINI-ENVIRONMENTS
6y 0m to grant Granted Jun 16, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
33%
Grant Probability
68%
With Interview (+35.4%)
4y 4m (~2y 0m remaining)
Median Time to Grant
Low
PTA Risk
Based on 674 resolved cases by this examiner. Grant probability derived from career allowance rate.

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