Prosecution Insights
Last updated: October 01, 2026
Application No. 18/752,388

THREE-DIMENSIONAL INTEGRATED CIRCUIT (3D IC) LOW-DROPOUT (LDO) REGULATOR POWER DELIVERY

Non-Final OA §DOUBLEPATENT
Filed
Jun 24, 2024
Priority
Mar 19, 2021 — provisional 63/163,295 +1 more
Examiner
TRAN, THANH Y
Art Unit
Tech Center
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
95%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
813 granted / 942 resolved
+26.3% vs TC avg
Moderate +9% lift
Without
With
+9.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 5m
Avg Prosecution
29 currently pending
Career history
959
Total Applications
across all art units

Statute-Specific Performance

§103
45.1%
+5.1% vs TC avg
§102
39.3%
-0.7% vs TC avg
§112
6.6%
-33.4% vs TC avg
Black line = Tech Center average estimate • Based on career data from 942 resolved cases

Office Action

§DOUBLEPATENT
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Double Patenting The nonstatutory double patenting rejection is based on a judicially created doctrine grounded in public policy (a policy reflected in the statute) so as to prevent the unjustified or improper timewise extension of the “right to exclude” granted by a patent and to prevent possible harassment by multiple assignees. A nonstatutory double patenting rejection is appropriate where the conflicting claims are not identical, but at least one examined application claim is not patentably distinct from the reference claim(s) because the examined application claim is either anticipated by, or would have been obvious over, the reference claim(s). See, e.g., In re Berg, 140 F.3d 1428, 46 USPQ2d 1226 (Fed. Cir. 1998); In re Goodman, 11 F.3d 1046, 29 USPQ2d 2010 (Fed. Cir. 1993); In re Longi, 759 F.2d 887, 225 USPQ 645 (Fed. Cir. 1985); In re Van Ornum, 686 F.2d 937, 214 USPQ 761 (CCPA 1982); In re Vogel, 422 F.2d 438, 164 USPQ 619 (CCPA 1970); In re Thorington, 418 F.2d 528, 163 USPQ 644 (CCPA 1969). A timely filed terminal disclaimer in compliance with 37 CFR 1.321(c) or 1.321(d) may be used to overcome an actual or provisional rejection based on nonstatutory double patenting provided the reference application or patent either is shown to be commonly owned with the examined application, or claims an invention made as a result of activities undertaken within the scope of a joint research agreement. See MPEP § 717.02 for applications subject to examination under the first inventor to file provisions of the AIA as explained in MPEP § 2159. See MPEP § 2146 et seq. for applications not subject to examination under the first inventor to file provisions of the AIA . A terminal disclaimer must be signed in compliance with 37 CFR 1.321(b). The filing of a terminal disclaimer by itself is not a complete reply to a nonstatutory double patenting (NSDP) rejection. A complete reply requires that the terminal disclaimer be accompanied by a reply requesting reconsideration of the prior Office action. Even where the NSDP rejection is provisional the reply must be complete. See MPEP § 804, subsection I.B.1. For a reply to a non-final Office action, see 37 CFR 1.111(a). For a reply to final Office action, see 37 CFR 1.113(c). A request for reconsideration while not provided for in 37 CFR 1.113(c) may be filed after final for consideration. See MPEP §§ 706.07(e) and 714.13. The USPTO Internet website contains terminal disclaimer forms which may be used. Please visit www.uspto.gov/patent/patents-forms. The actual filing date of the application in which the form is filed determines what form (e.g., PTO/SB/25, PTO/SB/26, PTO/AIA /25, or PTO/AIA /26) should be used. A web-based eTerminal Disclaimer may be filled out completely online using web-screens. An eTerminal Disclaimer that meets all requirements is auto-processed and approved immediately upon submission. For more information about eTerminal Disclaimers, refer to www.uspto.gov/patents/apply/applying-online/eterminal-disclaimer. Claims 1-20 are rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-8, 12-14, and 17-20 of U.S. Patent No. 12,046,580. Although the claims at issue are not identical, they are not patentably distinct from each other because all the limitations recited in claims 1-20 of the present invention are disclosed within claims 1-8, 12-14, and 17-20 of U.S. Patent No. 12,046,580. Application No. 18/752,388 (present invention) Patent No.: US 12,046,580 (reference) Claim 1: a method of fabricating a three-dimensional integrated circuit (3D IC) package, comprising: fabricating a cache die using a first technology node, the cache die including a low-dropout (LDO) regulator and a cache memory device; fabricating a compute die using a second technology node, the compute die including a processor; and bonding the cache die and the compute die using one or more first interconnect structures, wherein the compute die is above the cache die in a vertical direction (see claim 17 of U.S. Patent No. 12,046,580). Claim 17: a method of fabricating a three-dimensional integrated circuit (3D IC) package, comprising: fabricating a cache die using a first technology node, the cache die including a low-dropout (LDO) regulator and a cache memory device; fabricating a compute die using a second technology node, the compute die including a processor… bonding the cache die and the compute die using one or more first interconnect structures, wherein the compute die is above the cache die in a vertical direction. Claim 2: the method of claim 1, wherein the second technology node has a smaller contacted poly pitch (CPP) and a smaller minimum metal pitch (MMP) than the first technology node (see claim 18 of U.S. Patent No. 12,046,580). Claim 18. The method of claim 17, wherein the second technology node has a smaller contacted poly pitch (CPP) and a smaller minimum metal pitch (WIMP) than the first technology node. Claim 3: the method package of claim 1, wherein the second technology node is more advanced than the first technology node (see claim 19 of U.S. Patent No. 12,046,580). Claim 19: “wherein the second technology node is more advanced than the first technology node”. Claim 4: the method package of claim 1, wherein the compute die includes a processor (see claim 17, line 7, of U.S. Patent No. 12,046,580). Claim 17: “the compute die including a processor” (as recited in line 7). Claim 5: the method package of claim 1, wherein the compute die includes a plurality of voltage islands each having a rectangular shape with power gates located at the long sides of the rectangular shape (see claim 17, lines 7-10, of U.S. Patent No. 12,046,580). Claim 17: “the compute die including a processor and a plurality of voltage islands each having a rectangular shape with power gates located at the long sides of the rectangular shape” (as recited in lines 7-10). Claim 6: the method package of claim 1, further comprising: delivering a plurality of output voltages to the compute die (see claim 17, lines 14-15, of U.S. Patent No. 12,046,580). Claim 17: “delivering a plurality of output voltages to the plurality of voltage islands in the compute die” (as recited in lines 14-15). Claim 7: the method of claim 4, wherein the processor includes a plurality of processor cores (see claims 1-3 and 4 of U.S. Patent No. 12,046,580). Claims 1-3, and 4: “wherein the processor includes a plurality of processor cores” (as recited in claim 4). Claim 8: the method of claim 1, wherein the one or more first interconnect structures are one or more hybrid bonding (HB) structures (see claim 20 of U.S. Patent No. 12,046,580). Claim 20: “wherein the one or more first interconnect structures are one or more hybrid bonding (HB) structures”. Claim 9: the method of claim 1, wherein a front side of the compute die is facing a front side of the cache die (see claims 1-3, and 7 of U.S. Patent No. 12,046,580). Claims 1-3, and 7: “wherein a front side of the compute die is facing a front side of the cache die” (as recited in claim 7). Claim 10: the method of claim 9, wherein a cache die top metal layer at the front side of the cache die is connected to the one or more of the first interconnect structures, and a compute die top metal layer at the front side of the compute die is connected to the one or more first interconnect structures (see claims 1-3, 7 and 8 of U.S. Patent No. 12,046,580). Claims 1-3, 7, and 8: ‘wherein a cache die top metal layer at the front side of the cache die is connected to the one or more first interconnect structures, and a compute die top metal layer at the front side of the compute die is connected to the one or more first interconnect structures” (as recited in claim 8). Claim 11: a three-dimensional integrated circuit (3D IC) package, comprising: a cache die including a low-dropout (LDO) regulator and a cache memory device; a compute die including a processor and a plurality of voltage islands, each of the plurality of voltage islands having a rectangular shape with power gates located at the long sides of the rectangular shape; and a first interconnect structure connecting the cache die and the compute die and configured to deliver a plurality of output voltages to the plurality of voltage islands (see claims 1 and/or 13 of U.S. Patent No. 12,046,580). Claim 1 and/or claim 13: “a three-dimensional integrated circuit (3D IC) package, comprising: a cache die including a low-dropout (LDO) regulator and a cache memory device; a compute die above the cache die, the compute die including a processor and a plurality of voltage islands, each of the plurality of voltage islands having a rectangular shape with power gates located at the long sides of the rectangular shape; and one or more first interconnect structures connecting the cache die and the compute die in a vertical direction and configured to deliver a plurality of output voltages to the plurality of voltage islands” (as recited in claims 1 and 13). Claim 12: the 3D IC package of claim 11, wherein the compute die is positioned above the cache die (see claim 1, line 5, of U.S. Patent No. 12,046,580). Claim 1 and/or claim 13: “a compute die above the cache die” (as recited in claim 1, line 5, and claim 13). Claim 13: the 3D IC package of claim 11, further comprising a plurality of first interconnect structures that include the first interconnect structure (see claim 1, line 10, of U.S. Patent No. 12,046,580). Claim 1 and/or claim 13: “one or more first interconnect structures” (see claim 1, line 10, and claim 13) (“more first interconnect structures” which includes a plurality of first interconnect structures that include the first interconnect structure, as recited in claim 13 of the present invention). Claim 14: the 3D IC package of claim 11, wherein the cache die is fabricated using a first technology node, the compute die is fabricated using a second technology node, and the second technology node has a smaller contacted poly pitch (CPP) and a smaller minimum metal pitch (MMP) than the first technology node (see claim 2 and/or claim 14 of U.S. Patent No. 12,046,580). Claim 2 and/or claim 14: “wherein the cache die is fabricated using a first technology node, the compute die is fabricated using a second technology node, and the second technology node has a smaller contacted poly pitch (CPP) and a smaller minimum metal pitch (MMP) than the first technology node”. Claim 15: the 3D IC package of claim 11, wherein the processor includes a plurality of processor cores (see claim 4 of U.S. Patent No. 12,046,580). Claim 4: “wherein the processor includes a plurality of processor cores”. Claim 16: the 3D IC package of claim 11, wherein the LDO regulator is underneath the processor in the vertical direction (see claim 5 of U.S. Patent No. 12,046,580). Claim 5: “wherein the LDO regulator is underneath the processor in the vertical”. Claim 17: a three-dimensional integrated circuit (3D IC) package, comprising: a cache die including a low-dropout (LDO) regulator and a cache memory device; a compute die including a front side facing a front side of the cache die, the compute die including a processor and a plurality of voltage islands, each of the plurality of voltage islands having a rectangular shape with power gates located at the long sides of the rectangular shape; and a hybrid bonding (HB) structure connecting the cache die and the compute die and configured to deliver a plurality of output voltages to the plurality of voltage islands (see claims 1, 6, and 7, of U.S. Patent No. 12,046,580). Claims 1, 6, and 7: A three-dimensional integrated circuit (3D IC) package, comprising: a cache die including a low-dropout (LDO) regulator and a cache memory device; a compute die above the cache die, the compute die including a processor and a plurality of voltage islands, each of the plurality of voltage islands having a rectangular shape with power gates located at the long sides of the rectangular shape; and one or more first interconnect structures connecting the cache die and the compute die in a vertical direction and configured to deliver a plurality of output voltages to the plurality of voltage islands (claim 1); “wherein the one or more first interconnect structures are one or more hybrid bonding (HB) structures” (claim 6); and “wherein a front side of the compute die is facing a front side of the cache die” (claim 7). Claim 18: the 3D IC package of claim 17, wherein a cache die top metal layer at the front side of the cache die is connected to the hybrid bonding structure, and a compute die top metal layer at the front side of the compute die is connected to the hybrid bonding structure (see claims 6 and 8, of U.S. Patent No. 12,046,580). Claims 6 and 8: “wherein the one or more first interconnect structures are one or more hybrid bonding (HB) structures” (claim 6); and “wherein a cache die top metal layer at the front side of the cache die is connected to the one or more first interconnect structures, and a compute die top metal layer at the front side of the compute die is connected to the one or more first interconnect structures” (claim 8). Claim 19: the 3D IC package of claim 1, further comprising: a substrate underneath the cache die; and an interconnect structure connecting the cache die and the substrate in the vertical direction (see claim 12 of U.S. Patent No. 12,046,580). Claim 12: “a substrate underneath the cache die; and one or more second interconnect structures connecting the cache die and the substrate in the vertical direction”. Claim 20: the 3D IC package of claim 19, wherein the cache die is fabricated using a first technology node, the compute die is fabricated using a second technology node, and the second technology node has a smaller contacted poly pitch (CPP) and a smaller minimum metal pitch (MMP) than the first technology node (see claim 2 of U.S. Patent No. 12,046,580). Claim 2: “wherein the cache die is fabricated using a first technology node, the compute die is fabricated using a second technology node, and the second technology node has a smaller contacted poly pitch (CPP) and a smaller minimum metal pitch (MMP) than the first technology node”. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure: Chen et al. (US 2021/0082894 A1) disclose in figs. 4-5, 6 a package and a corresponding method comprising: a cache die (comprising elements 10a and 20) comprising a regulator (“semiconductor component” 20 may be a “voltage regulator chip”, para. [0063]) and a memory chip (“semiconductor component” 10a includes “the semiconductor die 100” which may be a “memory chip”, Fig. 5, para. [0053]); and a compute die (see a second adjacent “semiconductor component” 10a comprising a second “semiconductor die 100” which may include “a logic chip” such as “a central processing unit”, Fig. 6, para. [0053]). Chen et al. do not disclose the compute die is above the cache die in a vertical direction, as recited in the claims. Contact Information Any inquiry concerning this communication or earlier communications from the examiner should be directed to THANH Y TRAN whose telephone number is (571)272-2110. The examiner can normally be reached M-F, 10am-10pm (flex) (PST). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Kretelia Graham can be reached at (571)272-5055. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /Thanh Y. Tran/Primary Examiner, Art Unit 2817 August 19, 2026
Read full office action

Prosecution Timeline

Jun 24, 2024
Application Filed
Aug 21, 2026
Non-Final Rejection mailed — §DOUBLEPATENT (current)

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Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
95%
With Interview (+9.1%)
2y 5m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 942 resolved cases by this examiner. Grant probability derived from career allowance rate.

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