Last updated: July 17, 2026

Application No. 18/766,358

PELLICLE STRUCTURE FOR EUV LITHOGRAPHY AND METHODS OF MANUFACTURING THEREOF

Non-Final OA

Filed

Jul 08, 2024

Priority

Apr 19, 2024 — provisional 63/636,381

Examiner

ANGEBRANNDT, MARTIN J

Art Unit

1737

Tech Center

1700 — Chemical & Materials Engineering

Assignee

Taiwan Semiconductor Manufacturing Company, Ltd.

OA Round

1 (Non-Final)

This examiner grants 55% of cases after interview

— +34.2% interview lift. A telephonic interview to clarify the technical implementation could significantly improve the outcome.

Based on 1368 resolved cases, 2023–2026

Examiner Intelligence

ANGEBRANNDT, MARTIN J View full profile →

Grants 55% of resolved cases

Career Allowance Rate

757 granted / 1368 resolved

-9.7% vs TC avg

Strong +34% interview lift

Without

With

+34.2%

Interview Lift

resolved cases with interview

Typical timeline

3y 1m

Avg Prosecution

68 currently pending

Career history

1447

Total Applications

across all art units

Statute-Specific Performance

§101

0.1%

-39.9% vs TC avg

§103

67.3%

+27.3% vs TC avg

§102

3.8%

-36.2% vs TC avg

§112

1.6%

-38.4% vs TC avg

Black line = Tech Center average estimate • Based on career data from 1368 resolved cases

Prosecution Timeline

Jul 08, 2024

Application Filed

May 13, 2026

Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

17/826,796

Patent 12681378

MASK PROCESS CORRECTION METHODS AND METHODS OF FABRICATING LITHOGRAPHIC MASK USING THE SAME

4y 1m to grant Granted Jul 14, 2026

18/152,600

Patent 12681384

PHOTORESIST COMPOSITION

3y 6m to grant Granted Jul 14, 2026

17/498,892

Patent 12675041

Agglutinant for Pellicles, Pellicle Frame with Agglutinant Layer, Pellicle, Exposure Original Plate with Pellicle, Exposure Method, Method for Producing Semiconductor, and Method for Producing Liquid Crystal Display Board

4y 8m to grant Granted Jul 07, 2026

18/780,878

Patent 12675046

BOTTOM ANTIREFLECTIVE COATING MATERIALS

1y 11m to grant Granted Jul 07, 2026

18/101,000

Patent 12663707

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

3y 5m to grant Granted Jun 23, 2026

Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.

Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2

Expected OA Rounds

55%

Grant Probability

90%

With Interview (+34.2%)

3y 1m (~1y 1m remaining)

Median Time to Grant

Low

PTA Risk

Based on 1368 resolved cases by this examiner. Grant probability derived from career allowance rate.