Prosecution Insights
Last updated: August 17, 2026
Application No. 18/775,169

DEVICE HAVING A COUPLED INTERSTAGE TRANSFORMER AND PROCESS IMPLEMENTING THE SAME

Non-Final OA §102
Filed
Jul 17, 2024
Priority
Dec 23, 2021 — divisional of 12/068,265
Examiner
ULLAH, ELIAS
Art Unit
Tech Center
Assignee
MACOM Technology Solutions Holdings Inc.
OA Round
1 (Non-Final)
85%
Grant Probability
Favorable
1-2
OA Rounds
3m
Est. Remaining
93%
With Interview

Examiner Intelligence

Grants 85% — above average
85%
Career Allowance Rate
723 granted / 852 resolved
+24.9% vs TC avg
Moderate +8% lift
Without
With
+7.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
23 currently pending
Career history
860
Total Applications
across all art units

Statute-Specific Performance

§101
0.2%
-39.8% vs TC avg
§103
36.0%
-4.0% vs TC avg
§102
53.0%
+13.0% vs TC avg
§112
7.4%
-32.6% vs TC avg
Black line = Tech Center average estimate • Based on career data from 852 resolved cases

Office Action

§102
DETAILED ACTION Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. Claims 1-15 are rejected under 35 U.S.C. 102(a)(1) as being anticipated by Lembeye et al ( Lembeye, US 2017/0117239 A1 of IDS record). Regarding claim 1, Lembeye shows a process for implementing a device, comprising, providing a metal submount (metal flange 206 in FIG. 3 and [0036]); arranging a first transistor die (transistor 220 in FIG. 3 and [0041]) on said metal submount; arranging a second transistor die (transistor 220) on said metal submount ( metal flange 206); providing a set of primary interconnects ( interconnect 234); and providing a set of secondary interconnects (interconnect 350), wherein the set of primary interconnects and the set of secondary interconnects are configured to provide RF signal ([0022]) coupling between the first transistor die and the second transistor die (transistor 220) by electromagnetic coupling underlined limitation considered function of the device). Regarding claim 2, Lembeye shows a process for implementing a device, further comprising configuring the set of primary interconnects ( interconnect 234) and the set of secondary interconnects (interconnect 350) to provide an interstage match (see FIG. 3). Regarding claim 3, Lembeye shows a process for implementing a device, comprising, wherein the set of primary interconnects ( interconnect 234) and the set of secondary interconnects (interconnect 350) comprise wires (see FIG. 3). Regarding claim 4, Lembeye shows a process for implementing a device, comprising wherein the set of primary interconnects and the set of secondary interconnects comprise bond wires; and the process further comprising: implementing the set of primary interconnects and the set of secondary interconnects to provide a desired impedance based on a respective number of the bond wires, a respective size of the bond wires, a respective width of the bond wires, and/or a respective diameter of the bond wires ( wire 234, 350 and [0002]). Regarding claim 5, Lembeye shows a process for implementing a device, comprising configuring the set of primary interconnects ( interconnect 234) and the set of secondary interconnects (interconnect 350) as a DC block between the first transistor die and the second transistor die (see FIG. 3). Regarding claim 6, Lembeye shows a process for implementing a device, comprising attenuating and/or filtering lower frequency signals ( [0020]) transferred between the first transistor die and the second transistor die with the set of primary interconnects (interconnect 234) and the set of secondary interconnects (interconnect 350). Regarding claim 7, Lembeye shows a process for implementing a device, comprising, wherein the first transistor die is implemented as a driver stage transistor ( transistor 220); and wherein the second transistor die is implemented as a final stage transistor (transistor 220). Regarding claim 8, Lembeye shows a process for implementing a device, comprising configuring the set of primary interconnects (interconnect 234) and the set of secondary interconnects (interconnect 350) as a transformer to provide RF signal coupling between the first transistor die and the second transistor die (transistor 220). Regarding claim 9, Lembeye shows a process for implementing a device, comprising configuring the set of primary interconnects (interconnect 234) and the set of secondary interconnects (interconnect 350) to fanout between the first transistor die and the second transistor die (transistor 220). Regarding claim 10, Lembeye shows a process for implementing a device, comprising providing a first Integrated Passive Device (IPD) and a second Integrated Passive Device (IPD) (IPD 240), wherein the first transistor die connects to the first Integrated Passive Device (IPD) with one or more interconnects; and wherein the second transistor die connects to the second Integrated Passive Device (IPD) with one or more interconnects (see FIG. 3 with respect to FIG. 4). Regarding claim 11, Lembeye shows a process for implementing a device, comprising connecting the first Integrated Passive Device (IPD) to the second Integrated Passive Device (IPD) (IPD 240) with the set of secondary interconnects; and connecting the first Integrated Passive Device (IPD) to the second Integrated Passive Device (IPD) with the set of primary interconnects (interconnect 234/350). Regarding claim 12, Lembeye shows a process for implementing a device, comprising configuring the first Integrated Passive Device (IPD) with an inter-digitated array of one or more interconnect pads; and configuring the second Integrated Passive Device (IPD) (IPD 240)with an inter-digitated array of one or more interconnect pads (pad 244). Regarding claim 13, Lembeye shows a process for implementing a device, comprising configuring the first Integrated Passive Device (IPD) with an inter-digitated array of capacitors; and configuring the second Integrated Passive Device (IPD) with an inter-digitated array capacitors ([0027]). Regarding claim 14, Lembeye shows a process for implementing a device, comprising configuring the first Integrated Passive Device (IPD) with at least one capacitor; and configuring the second Integrated Passive Device (IPD) with at least one capacitor ([0027]). Regarding claim 15, Lembeye shows a process for implementing a device, comprising, wherein the first Integrated Passive Device (IPD), the second Integrated Passive Device (IPD) ( IPD 240), the set of primary interconnects, and the set of secondary interconnects are configured to provide the RF signal from the first transistor die to the second transistor die (transistors 220). Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to ELIAS M ULLAH whose telephone number is (571)272-1415. The examiner can normally be reached M-F at 8AM-5PM EST. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Yara Green can be reached at 571-270-3035. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ELIAS ULLAH/Primary Examiner, Art Unit 2893
Read full office action

Prosecution Timeline

Jul 17, 2024
Application Filed
Jul 29, 2026
Non-Final Rejection mailed — §102 (current)

Precedent Cases

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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
85%
Grant Probability
93%
With Interview (+7.8%)
2y 4m (~3m remaining)
Median Time to Grant
Low
PTA Risk
Based on 852 resolved cases by this examiner. Grant probability derived from career allowance rate.

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