Prosecution Insights
Last updated: July 07, 2026
Application No. 18/775,333

Untitled Application

Unknown
Filed
1700
Examiner
DUCLAIR, STEPHANIE P.
Art Unit
1713
Tech Center
Tokyo Electron Limited
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
72%
Grant Probability
Favorable
1-2
OA Rounds
2y 9m
Filing → Grant
91%
With Interview

Examiner Intelligence

Grants 72% — above average
72%
Career Allowance Rate
582 granted / 812 resolved
+11.7% vs TC avg
Strong +20% interview lift
Without
With
+19.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
36 currently pending
Career history
847
Total Applications
across all art units

Statute-Specific Performance

§101
0.1%
-39.9% vs TC avg
§103
95.4%
+55.4% vs TC avg
§102
0.7%
-39.3% vs TC avg
§112
1.2%
-38.8% vs TC avg
Black line = Tech Center average estimate • Based on career data from 812 resolved cases

Prosecution Timeline

1700
Application Filed
Jul 01, 2026
Non-Final Rejection mailed (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12665175
PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
2y 6m to grant Granted Jun 23, 2026
Patent 12651728
PASSIVATION CHEMISTRY FOR PLASMA ETCHING
3y 5m to grant Granted Jun 09, 2026
Patent 12652977
ETCHING METHOD
3y 3m to grant Granted Jun 09, 2026
Patent 12644015
METHOD FOR MANUFACTURING ABRASIVE GRAINS, COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, AND METHOD FOR CHEMICAL MECHANICAL POLISHING
3y 6m to grant Granted Jun 02, 2026
Patent 12646684
ETCHING METHOD AND ETCHING APPARATUS
3y 3m to grant Granted Jun 02, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
72%
Grant Probability
91%
With Interview (+19.7%)
2y 9m
Median Time to Grant
Low
PTA Risk
Based on 812 resolved cases by this examiner. Grant probability derived from career allowance rate.

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