Prosecution Insights
Last updated: July 17, 2026
Application No. 18/777,692

ELECTRICAL CLEANING TOOL FOR WAFER POLISHING TOOL SYSTEM

Non-Final OA §112
Filed
Jul 19, 2024
Priority
Aug 15, 2022 — divisional of 12/128,455
Examiner
GOLIGHTLY, ERIC WAYNE
Art Unit
1714
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
1 (Non-Final)
78%
Grant Probability
Favorable
1-2
OA Rounds
12m
Est. Remaining
99%
With Interview

Examiner Intelligence

Grants 78% — above average
78%
Career Allowance Rate
670 granted / 863 resolved
+12.6% vs TC avg
Strong +25% interview lift
Without
With
+25.1%
Interview Lift
resolved cases with interview
Typical timeline
2y 12m
Avg Prosecution
38 currently pending
Career history
894
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
77.1%
+37.1% vs TC avg
§102
4.7%
-35.3% vs TC avg
§112
10.0%
-30.0% vs TC avg
Black line = Tech Center average estimate • Based on career data from 863 resolved cases

Office Action

§112
Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Election/Restrictions Applicant’s amendment and election without traverse of Species 1 (claim 1-6, 21 and 22) in the reply filed on 04/21/2026 is acknowledged. Claims 7-20 and nonelected claims 23-34 are cancelled in the present amendment. Newly added claims 35-46 are encompassed by elected Species 1. Thus, claims 1-6, 21, 22 and 35-46 are pending. Specification Content of Specification (a) TITLE OF THE INVENTION: See 37 CFR 1.72(a) and MPEP § 606. The title of the invention should be placed at the top of the first page of the specification unless the title is provided in an application data sheet. The title of the invention should be brief but technically accurate and descriptive, preferably from two to seven words. It may not contain more than 500 characters. (b) CROSS-REFERENCES TO RELATED APPLICATIONS: See 37 CFR 1.78 and MPEP § 211 et seq. (c) STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT: See MPEP § 310. (d) THE NAMES OF THE PARTIES TO A JOINT RESEARCH AGREEMENT. See 37 CFR 1.71(g). (e) INCORPORATION-BY-REFERENCE OF MATERIAL SUBMITTED ON A READ-ONLY OPTICAL DISC, AS A TEXT FILE OR AN XML FILE VIA THE PATENT ELECTRONIC SYSTEM: The specification is required to include an incorporation-by-reference of electronic documents that are to become part of the permanent United States Patent and Trademark Office records in the file of a patent application. See 37 CFR 1.77(b)(5) and MPEP § 608.05. See also the Legal Framework for Patent Electronic System posted on the USPTO website (https://www.uspto.gov/sites/default/files/documents/2019LegalFrameworkPES.pdf) and MPEP § 502.05 (f) STATEMENT REGARDING PRIOR DISCLOSURES BY THE INVENTOR OR A JOINT INVENTOR. See 35 U.S.C. 102(b) and 37 CFR 1.77. (g) BACKGROUND OF THE INVENTION: See MPEP § 608.01(c). The specification should set forth the Background of the Invention in two parts: (1) Field of the Invention: A statement of the field of art to which the invention pertains. This statement may include a paraphrasing of the applicable U.S. patent classification definitions of the subject matter of the claimed invention. This item may also be titled “Technical Field.” (2) Description of the Related Art including information disclosed under 37 CFR 1.97 and 37 CFR 1.98: A description of the related art known to the applicant and including, if applicable, references to specific related art and problems involved in the prior art which are solved by the applicant’s invention. This item may also be titled “Background Art.” (h) BRIEF SUMMARY OF THE INVENTION: See MPEP § 608.01(d). A brief summary or general statement of the invention as set forth in 37 CFR 1.73. The summary is separate and distinct from the abstract and is directed toward the invention rather than the disclosure as a whole. The summary may point out the advantages of the invention or how it solves problems previously existent in the prior art (and preferably indicated in the Background of the Invention). In chemical cases it should point out in general terms the utility of the invention. If possible, the nature and gist of the invention or the inventive concept should be set forth. Objects of the invention should be treated briefly and only to the extent that they contribute to an understanding of the invention. (i) BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING(S): See MPEP § 608.01(f). A reference to and brief description of the drawing(s) as set forth in 37 CFR 1.74. (j) DETAILED DESCRIPTION OF THE INVENTION: See MPEP § 608.01(g). A description of the preferred embodiment(s) of the invention as required in 37 CFR 1.71. The description should be as short and specific as is necessary to describe the invention adequately and accurately. Where elements or groups of elements, compounds, and processes, which are conventional and generally widely known in the field of the invention described, and their exact nature or type is not necessary for an understanding and use of the invention by a person skilled in the art, they should not be described in detail. However, where particularly complicated subject matter is involved or where the elements, compounds, or processes may not be commonly or widely known in the field, the specification should refer to another patent or readily available publication which adequately describes the subject matter. (k) CLAIM OR CLAIMS: See 37 CFR 1.75 and MPEP § 608.01(m). The claim or claims must commence on a separate sheet or electronic page (37 CFR 1.52(b)(3)). Where a claim sets forth a plurality of elements or steps, each element or step of the claim should be separated by a line indentation. There may be plural indentations to further segregate subcombinations or related steps. See 37 CFR 1.75 and MPEP 608.01(i) - (p). (l) ABSTRACT OF THE DISCLOSURE: See 37 CFR 1.72 (b) and MPEP § 608.01(b). The abstract is a brief narrative of the disclosure as a whole, as concise as the disclosure permits, in a single paragraph preferably not exceeding 150 words, commencing on a separate sheet following the claims. In an international application which has entered the national stage (37 CFR 1.491(b)), the applicant need not submit an abstract commencing on a separate sheet if an abstract was published with the international application under PCT Article 21. The abstract that appears on the cover page of the pamphlet published by the International Bureau (IB) of the World Intellectual Property Organization (WIPO) is the abstract that will be used by the USPTO. See MPEP § 1893.03(e). (m) SEQUENCE LISTING: See 37 CFR 1.821 - 1.825 and MPEP §§ 2421 - 2431. The requirement for a sequence listing applies to all sequences disclosed in a given application, whether the sequences are claimed or not. See MPEP § 2422.01. The disclosure is objected to because of the following informalities: In the specification, on page 1, in para [0001], the phrase “, and issued as U.S. Patent number 12,128,455 on October 29, 2024”, or the like, should be added immediately after “2022” in line 2. Appropriate correction is required. Claim Interpretation The following is a quotation of 35 U.S.C. 112(f): (f) Element in Claim for a Combination. – An element in a claim for a combination may be expressed as a means or step for performing a specified function without the recital of structure, material, or acts in support thereof, and such claim shall be construed to cover the corresponding structure, material, or acts described in the specification and equivalents thereof. The following is a quotation of pre-AIA 35 U.S.C. 112, sixth paragraph: An element in a claim for a combination may be expressed as a means or step for performing a specified function without the recital of structure, material, or acts in support thereof, and such claim shall be construed to cover the corresponding structure, material, or acts described in the specification and equivalents thereof. The claims in this application are given their broadest reasonable interpretation using the plain meaning of the claim language in light of the specification as it would be understood by one of ordinary skill in the art. The broadest reasonable interpretation of a claim element (also commonly referred to as a claim limitation) is limited by the description in the specification when 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is invoked. As explained in MPEP § 2181, subsection I, claim limitations that meet the following three-prong test will be interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph: (A) the claim limitation uses the term “means” or “step” or a term used as a substitute for “means” that is a generic placeholder (also called a nonce term or a non-structural term having no specific structural meaning) for performing the claimed function; (B) the term “means” or “step” or the generic placeholder is modified by functional language, typically, but not always linked by the transition word “for” (e.g., “means for”) or another linking word or phrase, such as “configured to” or “so that”; and (C) the term “means” or “step” or the generic placeholder is not modified by sufficient structure, material, or acts for performing the claimed function. Use of the word “means” (or “step”) in a claim with functional language creates a rebuttable presumption that the claim limitation is to be treated in accordance with 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. The presumption that the claim limitation is interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is rebutted when the claim limitation recites sufficient structure, material, or acts to entirely perform the recited function. Absence of the word “means” (or “step”) in a claim creates a rebuttable presumption that the claim limitation is not to be treated in accordance with 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. The presumption that the claim limitation is not interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, is rebutted when the claim limitation recites function without reciting sufficient structure, material or acts to entirely perform the recited function. Claim limitations in this application that use the word “means” (or “step”) are being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, except as otherwise indicated in an Office action. Conversely, claim limitations in this application that do not use the word “means” (or “step”) are not being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, except as otherwise indicated in an Office action. This application includes one or more claim limitations that do not use the word “means,” but are nonetheless being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, because the claim limitation(s) uses a generic placeholder that is coupled with functional language without reciting sufficient structure to perform the recited function and the generic placeholder is not preceded by a structural modifier. Such claim limitation(s) is/are: wafer processing module in claim 46. Because this/these claim limitation(s) is/are being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, it/they is/are being interpreted to cover the corresponding structure described in the specification as performing the claimed function, and equivalents thereof. Based on a review of the specification, a wafer processing module is interpreted to include a segment designed to perform a particular task. If applicant does not intend to have this/these limitation(s) interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph, applicant may: (1) amend the claim limitation(s) to avoid it/them being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph (e.g., by reciting sufficient structure to perform the claimed function); or (2) present a sufficient showing that the claim limitation(s) recite(s) sufficient structure to perform the claimed function so as to avoid it/them being interpreted under 35 U.S.C. 112(f) or pre-AIA 35 U.S.C. 112, sixth paragraph. Claim Rejections - 35 USC § 112 The following is a quotation of 35 U.S.C. 112(b): (b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention. The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph: The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention. Claim 3 is rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention. Regarding claim 3, the phrase “opposite the first end” in line 3 renders the claim indefinite because it is not clear whether this is referring to the first end of first conductive rod, to the first end of the second conductive rod, or to something else. It appears the intended meaning may be that it is referring to the first end of the second conductive rod, and this meaning will be used for purposes of examination. Allowable Subject Matter Claims 1, 2, 4-6, 21, 22 and 35-46 are allowed. Claim 3 is rejected as indefinite, but would be allowable if properly amended to cure the indefiniteness rejection. The following is a statement of reasons for the indication of allowable subject matter: The closest prior art references are: US 2021/0020449 to Hou et al., which teaches a CMP system, US 9,437,453 to Zhang, which teaches a CMP apparatus, and US 8,336,148 to Zhang, which teaches a wafer cleaning system. The prior art references of record, taken alone or in combination, do not anticipate or suggest fairly the limitations of: a wafer carrier over the polishing pad and configured to hold a wafer over the polishing pad; a slurry dispenser over the polishing pad and configured to dispense an abrasive slurry comprising a plurality of charged abrasive particles having a first polarity onto the polishing pad; a first conductive rod within the wafer platen, wherein the first conductive rod is coupled to the first voltage supply; a wafer roller configured to support and rotate the wafer; a first wafer brush arranged beside the wafer roller; and a second conductive rod within the first wafer brush, wherein the second conductive rod is coupled to the second voltage supply, wherein the first voltage supply is configured to apply a first charge having a second polarity, opposite the first polarity, to the first conductive rod and the second voltage supply is configured to apply a second charge having the second polarity to the second conductive rod (as in claim 1); a slurry dispenser over the polishing pad and configured to dispense an abrasive slurry comprising a plurality of charged abrasive particles having a first polarity onto the polishing pad; a wafer carrier over the polishing pad and configured to hold a wafer over the polishing pad and move the wafer into contact with the abrasive slurry and the polishing pad; a first conductive rod within the wafer platen; a first voltage supply coupled to the first conductive rod and configured to apply a first charge having a second polarity, opposite the first polarity, to the first conductive rod while the wafer is over the polishing pad; a wafer roller configured to support and rotate the wafer; a wafer brush beside the wafer roller and configured to brush the wafer; a second conductive rod within the wafer brush; and a second voltage supply coupled to the second conductive rod and configured to apply a second charge having the second polarity to the second conductive rod while the wafer brush is brushing the wafer j(as in claim 35); or a wafer carrier over the polishing pad; a slurry dispenser over the polishing pad and configured to dispense an abrasive slurry comprising a plurality of electrically charged abrasive particles having a first electrical polarity over the polishing pad; a first conductive rod under the polishing pad, wherein the first conductive rod is coupled to a first voltage supply, and wherein the first conductive rod is configured to receive a first electrical charge having a second electrical polarity, opposite the first electrical polarity, from the first voltage supply; a wafer brush beside a wafer roller; and a second conductive rod within the wafer brush, wherein the second conductive rod is coupled to a second voltage supply, and wherein the second conductive rod is configured to receive a second electrical charge having the second electrical polarity from the second voltage supply (as in claim 43), in combination with the other structural features as instantly recited. Upon further search no other prior art has been located at the date of this Office action. Conclusion The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. US 2024/0367202 to Liu et al. teaches a wafer processing tool. Any inquiry concerning this communication or earlier communications from the examiner should be directed to ERIC GOLIGHTLY whose telephone number is (571)270-3715. The examiner can normally be reached M-F: 10 am - 7 pm. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Kaj Olsen can be reached at (571) 272-1344. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /ERIC W GOLIGHTLY/Primary Examiner, Art Unit 1714
Read full office action

Prosecution Timeline

Jul 19, 2024
Application Filed
May 28, 2026
Examiner Interview (Telephonic)
Jun 03, 2026
Non-Final Rejection mailed — §112 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12678832
MAGNETIC RESONANCE APPARATUS WITH CLEANING UNIT AND METHOD FOR CLEANING A PATIENT RECEIVING AREA
4y 5m to grant Granted Jul 14, 2026
Patent 12680161
SEMICONDUCTOR PROCESS SYSTEM AND METHOD OF CLEANING THE SAME
3y 1m to grant Granted Jul 14, 2026
Patent 12668210
VEHICLE SENSOR CLEANING APPARATUS AND CONTROLLING METHOD OF THE SAME
2y 0m to grant Granted Jun 30, 2026
Patent 12668873
GAS SUPPLY LINE ARRANGEMENTS
1y 8m to grant Granted Jun 30, 2026
Patent 12661697
CASE AND METHOD OF USING CASE
2y 4m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

Get a prosecution strategy drawn from examiner precedents, rejection analysis, and claim mapping.
Typically takes 5-10 seconds — AI-generated, attorney review required before filing

Prosecution Projections

1-2
Expected OA Rounds
78%
Grant Probability
99%
With Interview (+25.1%)
2y 12m (~12m remaining)
Median Time to Grant
Low
PTA Risk
Based on 863 resolved cases by this examiner. Grant probability derived from career allowance rate.

Sign in with your work email

Enter your email to receive a magic link. No password needed.

Personal email addresses (Gmail, Yahoo, etc.) are not accepted.

Free tier: 3 strategy analyses per month