Prosecution Insights
Last updated: October 02, 2026

Examiner: GOLIGHTLY, ERIC WAYNE

Tech Center 1700 • Art Units: 1711 1714 1792

This examiner grants 78% of resolved cases

Analysis

Eric Wayne Golightly is an examiner in Tech Center 1700, Art Unit 1711. With 876 resolved cases, the examiner has an allowance rate of 77.6 percent. This is a high rate, showing that more than three-quarters of the 876 resolved cases reaching a resolution are eventually allowed. The data shows a strong history of grants in Art Unit 1711.

The interview lift is 25.5 percent, which is a significant positive figure. This indicates that conducting an interview is associated with a substantial increase in the likelihood of allowance over the 77.6 percent baseline. Practitioners should consider an interview as a key part of their strategy, as the 25.5 percent lift shows it is an effective way to move applications toward a grant. This metric highlights the value of direct communication.

The median days to allowance for this examiner is 1085. This timeline provides a benchmark for the expected duration of the prosecution process in Tech Center 1700. With the allowance rate and the 1085 day median, practitioners can set realistic expectations for their clients. The 1085 day duration is a reliable benchmark for successful prosecution.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

77.6%
Allow Rate
+12.6% vs TC avg
901
Total Applications
+25.5%
Interview Lift
1085
Avg Prosecution Days
Based on 876 resolved cases, 2023–2026

Rejection Statute Breakdown

0.5%
§101 Eligibility
12.3%
§102 Novelty
52.8%
§103 Obviousness
29.4%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18881247 ORAL HEALTH CARE Non-Final OA KONINKLIJKE PHILIPS N.V.
18814693 AGGLOMERATION UNIT, SUCTION DEVICE AND METHOD FOR AGGLOMERATING VACUUMED MATERIAL Non-Final OA Hilti Aktiengesellschaft
18806234 SEMICONDUCTOR SUBSTRATE BEVEL CLEANING Non-Final OA LAM RESEARCH CORPORATION
19034051 ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING Non-Final OA Applied Materials, Inc.
19022101 PLASMA PURGE METHOD AND PLASMA PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18883743 SUBSTRATE CLEANING DEVICE, SUBSTRATE PROCESSING APPARATUS, BREAK-IN DEVICE, METHOD FOR ESTIMATING NUMBER OF FINE PARTICLES ADHERING TO SUBSTRATE, METHOD FOR DETERMINING DEGREE OF CONTAMINATION OF SUBSTRATE CLEANING MEMBER, AND METHOD FOR DETERMINING BREAK-IN PROCESSING Non-Final OA EBARA CORPORATION
18733438 SUBSTRATE CLEANING DEVICE AND SUBSTRATE POLISHING DEVICE Non-Final OA EBARA CORPORATION
18514511 SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, APPARATUS FOR CLEANING CLEANING MEMBER, AND METHOD FOR CLEANING CLEANING MEMBER Final Rejection EBARA CORPORATION
19042432 CHEMICAL SUPPLY APPARATUS AND CHEMICAL EXCHANGE METHOD Non-Final OA SEMES CO., LTD.
18974963 SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD Non-Final OA SEMES CO., LTD.
18755261 CLEANING SYSTEM AND METHOD FOR OPERATING A CLEANING SYSTEM Final Rejection ALFRED KÄRCHER SE & CO. KG

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