Prosecution Insights
Last updated: October 01, 2026
Application No. 18/779,329

SEMICONDUCTOR PACKAGES AND METHODS OF FORMING SAME

Non-Final OA §DOUBLEPATENT
Filed
Jul 22, 2024
Priority
Sep 29, 2017 — provisional 62/566,018 +3 more
Examiner
TYNES JR., LAWRENCE C
Art Unit
Tech Center
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
1 (Non-Final)
86%
Grant Probability
Favorable
1-2
OA Rounds
2m
Est. Remaining
94%
With Interview

Examiner Intelligence

Grants 86% — above average
86%
Career Allowance Rate
676 granted / 791 resolved
+25.5% vs TC avg
Moderate +9% lift
Without
With
+8.8%
Interview Lift
resolved cases with interview
Typical timeline
2y 4m
Avg Prosecution
21 currently pending
Career history
813
Total Applications
across all art units

Statute-Specific Performance

§101
0.6%
-39.4% vs TC avg
§103
51.1%
+11.1% vs TC avg
§102
26.6%
-13.4% vs TC avg
§112
17.8%
-22.2% vs TC avg
Black line = Tech Center average estimate • Based on career data from 791 resolved cases

Office Action

§DOUBLEPATENT
DETAILED ACTION Notice of Pre-AIA or AIA Status The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA . Double Patenting Claims 1-20 rejected on the ground of nonstatutory double patenting as being unpatentable over claims 1-21 of U.S. Patent No.12142560b2. Although the claims at issue are not identical, they are not patentably distinct from each other because the claims of 17408840 could be used to reject the claims of 18779329, as the claims of 18779329 are broader than 17408840. Redistribution structures comprise one or more dielectric layers comprising conductive lines and vias electrically connecting top and bottom surfaces of the redistribution structure. 18779329 17408840 now US-12142560-B2 1. A semiconductor package comprising: a first die and a second die that are spaced apart from each other; a redistribution structure bonded to the first die and the second die, wherein the redistribution structure comprises: a first conductive via disposed in a first insulating layer; and a second conductive via in a second insulating layer, the second conductive via electrically connecting the first conductive via to an external connector of the semiconductor package, wherein a diameter of the first conductive via decreases in a direction towards the second conductive via, and wherein a diameter of the second conductive via decreases in a direction towards the first conductive via, and wherein the first insulating layer physically contacts the second insulating layer; and a molding compound encapsulating the first die and the second die, the molding compound being disposed over the redistribution structure. 1. (Currently amended) A semiconductor package comprising: a first die; one or more second dies adjacent the first die, wherein the one or more second dies is separated from the first die; a redistribution structure bonded to the first die and the one or more second dies, wherein the redistribution structure comprises: a first redistribution layer comprising a first conductive line in a first dielectric layer, the first conductive line having a first thickness measured be a bottom surface of the first dielectric layer to a top surface of the first conductive line in the first dielectric layer; a second redistribution layer comprising a second conductive line in a second dielectric layer, the second conductive line having a second thickness measured between a bottom surface of the second dielectric layer and a top surface of the second conductive line in the second dielectric layer; a third redistribution layer comprising a third conductive line in a third dielectric layer, the third dielectric layer is between the first dielectric layer and the second dielectric layer, the third conductive line having a third thickness greater than the first thickness of the first conductive line and the second thickness of the second conductive line, wherein the third thickness is measured from a bottom surface of the third dielectric layer to a top surface of the third conductive line in the third dielectric layer; a first conductive via electrically connected to the second redistribution layer and a second conductive via electrically connecting the first conductive via to an external connector of the semiconductor package, wherein a diameter of the first conductive via decreases in a direction towards the second conductive via, and wherein a diameter of the second conductive via decreases in a direction towards the first conductive via, and wherein the first conductive via physically contacts the second conductive via an underfill between the first die and the redistribution structure; and a molding compound encapsulating the first die, the one or more second dies, and the underfill, wherein the molding compound contacts the first die and is disposed between the first die and the one or more second dies. 11. A semiconductor package comprising: a molding compound encapsulating a first device die and a second device die; and a redistribution structure bonded to the first device die and the second device die, and wherein the redistribution structure comprises: a plurality of vertically stacked signal lines; a first conductive via electrically connected to a first signal line of the plurality of vertically stacked signal lines; and a second conductive via physically contacting the first conductive via and an external connector, wherein a diameter of the first conductive via increases in a direction away from the second conductive via, and wherein a diameter of the second conductive via increases in a direction away from the first conductive via. 9. (Original) A semiconductor package comprising: a molding compound encapsulating a first device and a second device; a redistribution structure flip chip bonded to the first device and the second device, and wherein the redistribution structure comprises: a ground line between a first signal line and a second signal line, wherein the ground line, the first signal line, and the second signal line are stacked in a vertical direction; a first conductive via over and electrically connected to the second signal line; and a second conductive via extending from the first conductive via to an external connector, wherein a diameter of the first conductive via increases in a direction away from the second conductive via, and wherein a diameter of the second conductive via decreases in a direction towards the first conductive via; and an underfill between the first device and the redistribution structure, wherein the molding compound contacts a fillet of the underfill. 16. A semiconductor package comprising: a molding compound encapsulating a first device die and a second device die; and a redistribution structure bonded to the first device die and the second device die, and wherein the redistribution structure comprises: a plurality of vertically stacked signal lines; a first conductive via electrically connected to a first signal line of the plurality of vertically stacked signal lines; a first insulating layer around the first conductive via; and an external connector extending into the first insulating layer and electrically connected to the first conductive via, wherein a width of the first conductive via increases in a direction away from the external connector. 15. (Original) A semiconductor package comprising: a molding compound encapsulating a first device and a second device; a redistribution structure flip chip bonded to the first device and the second device, and wherein the redistribution structure comprises: a ground line between a first signal line and a second signal line, wherein the ground line, the first signal line, and the second signal line are stacked in a vertical direction; a first conductive via electrically connected to the second signal line, the first conductive via in a first polymer layer; and a second conductive via extending from the first conductive via to an external connector, wherein second conductive via is disposed on a second polymer layer, and wherein the first polymer layer and the second polymer layer are made of different materials; and an underfill disposed between the first device and the redistribution structure. 16. A semiconductor package comprising: a molding compound encapsulating a first device die and a second device die; and a redistribution structure bonded to the first device die and the second device die, and wherein the redistribution structure comprises: a plurality of vertically stacked signal lines; a first conductive via electrically connected to a first signal line of the plurality of vertically stacked signal lines; a first insulating layer around the first conductive via; and an external connector extending into the first insulating layer and electrically connected to the first conductive via, wherein a width of the first conductive via increases in a direction away from the external connector. 9. (Original) A semiconductor package comprising: a molding compound encapsulating a first device and a second device; a redistribution structure flip chip bonded to the first device and the second device, and wherein the redistribution structure comprises: a ground line between a first signal line and a second signal line, wherein the ground line, the first signal line, and the second signal line are stacked in a vertical direction; a first conductive via over and electrically connected to the second signal line; and a second conductive via extending from the first conductive via to an external connector, wherein a diameter of the first conductive via increases in a direction away from the second conductive via, and wherein a diameter of the second conductive via decreases in a direction towards the first conductive via; and an underfill between the first device and the redistribution structure, wherein the molding compound contacts a fillet of the underfill. Conclusion Any inquiry concerning this communication or earlier communications from the examiner should be directed to LAWRENCE C TYNES JR. whose telephone number is (571)270-7606. The examiner can normally be reached 9AM-5PM. Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Zandra Smith can be reached at 571-272-2429. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000. /LAWRENCE C TYNES JR./Examiner, Art Unit 2899
Read full office action

Prosecution Timeline

Jul 22, 2024
Application Filed
Aug 26, 2026
Non-Final Rejection mailed — §DOUBLEPATENT (current)

Precedent Cases

Applications granted by this same examiner with similar technology

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SEMICONDUCTOR PACKAGE MANUFACTURED THROUGH A THERMOCOMPRESSION PROCESS USING A NON-CONDUCTIVE FILM (NCF)
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Patent 12740072
DISCRETE DEVICE INTERCONNECTIONS BETWEEN STACKED SUBSTRATES
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Patent 12740134
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2y 4m to grant Granted Sep 15, 2026
Patent 12740488
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Patent 12727498
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Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

1-2
Expected OA Rounds
86%
Grant Probability
94%
With Interview (+8.8%)
2y 4m (~2m remaining)
Median Time to Grant
Low
PTA Risk
Based on 791 resolved cases by this examiner. Grant probability derived from career allowance rate.

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