DETAILED ACTION
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Status
Acknowledgment is made of the amendment filed on 5/20/2026, which amended claims 1-3, 5, 6, 13, and 17, cancelled claims 11-12 and 18-19, and added new claims 21-24. Claims 1-10, 13-17, and 20-24 are currently pending.
Terminal Disclaimer
The terminal disclaimer filed on 5/20/2026 disclaiming the terminal portion of any patent granted on this application which would extend beyond the expiration date of US Patent No. 11,693,324 and the expiration date of US Patent No. 12,085,865 has been reviewed and is accepted. The terminal disclaimer has been recorded.
Claim Objections
Claims 4, 13, and 21-24 are objected to because of the following informalities:
Claim 4, line 2, “a detection light source” should be changed to --the detection light source-- to correct antecedence from claim 1.
Claim 13, line 5, “withing” should be changed to --within-- to correct spelling.
Claim 21, “the system of claim 20” should be changed to --the photolithography system of claim 20-- to improve dependency language.
Claim 21, line 1, “the cleaning lasers” should be changed to --the plurality of cleaning lasers-- to improve antecedence.
Claim 22, “the system of claim 21” should be changed to --the photolithography system of claim 21-- to improve dependency language.
Claim 23, “the system of claim 17” should be changed to --the photolithography system of claim 17-- to improve dependency language.
Claim 24, “the system of claim 23” should be changed to --the photolithography system of claim 23-- to improve dependency language.
Claim 24, line 1, “the cleaning system” should be changed to --the reticle cleaning system” to improve antecedence.
Appropriate correction is required to place claims in better form.
Claim Rejections - 35 USC § 112
The following is a quotation of 35 U.S.C. 112(b):
(b) CONCLUSION.—The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the inventor or a joint inventor regards as the invention.
The following is a quotation of 35 U.S.C. 112 (pre-AIA ), second paragraph:
The specification shall conclude with one or more claims particularly pointing out and distinctly claiming the subject matter which the applicant regards as his invention.
Claims 20-22 are rejected under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), second paragraph, as being indefinite for failing to particularly point out and distinctly claim the subject matter which the inventor or a joint inventor (or for applications subject to pre-AIA 35 U.S.C. 112, the applicant), regards as the invention.
Regarding claim 20, the limitation “the photolithography system of claim 18, comprising a debris trap in the scanner configured to trap debris particles impacted by the cleaning laser” is vague and indefinite. First, claim 18 has been cancelled. It is not clear which claim instant claim 20 is intended to depend from, and the metes and bounds of the scope of claim 20 are therefore indefinite.
Additionally, the limitation “the cleaning laser” in line 2 of claim 20 does not have sufficient antecedent basis in the claim. Although claim 17 introduces “a plurality of cleaning lasers,” claim 20 does not clearly depend from claim 17, and none of the claims appear to properly introduce a single cleaning laser. However, for the purposes of examination, claim 20 is being interpreted as meaning the photolithography system of claim 17, comprising a debris trap in the scanner configured to trap debris particles impacted by the plurality of cleaning lasers. Thus, claim 20 and all claims depending therefrom are rejected as being indefinite. Appropriate correction is required.
Allowable Subject Matter
Claims 1-10, 13-17, and 23-24 are allowed.
Claims 20-22 would be allowable if rewritten to overcome the rejection(s) under 35 U.S.C. 112(b) or 35 U.S.C. 112 (pre-AIA ), 2nd paragraph, set forth in this Office action and to include all of the limitations of the base claim and any intervening claims.
The following is a statement of reasons for the indication of allowable subject matter.
Regarding claim 1, the prior art of record, either alone or in combination, fails to teach or render obvious outputting a detection light with a detection light source; detecting debris particles traveling from the extreme ultraviolet light generation chamber based on interaction of the debris particles with the detection light; and activating a reticle cleaning system to clean a reticle in the scanner in response to detecting the debris particles, wherein activating the reticle cleaning system includes activating a plurality of cleaning lasers of the reticle cleaning system positioned downstream from the detection light source within the scanner. These limitations in combination with the other limitations of claim 1 render the claim non-obvious over the prior art of record.
Regarding claim 13, the prior art of record, either alone or in combination, fails to teach or render obvious detecting, with a detection light in a scanner coupled to the extreme ultraviolet light generation chamber, debris particles within the scanner traveling from the extreme ultraviolet light generation chamber; and activating an automatic reticle cleaning system to clean a reticle in the scanner in response to detecting the debris particles, wherein activating the automatic reticle cleaning system includes activating a plurality of cleaning lasers of the automatic reticle cleaning system positioned downstream from the detection light source within the scanner. These limitations in combination with the other limitations of claim 13 render the claim non-obvious over the prior art of record.
Regarding claim 17, the prior art of record, either alone or in combination, fails to teach or render obvious comprising a detection light source configured to output a detection light adjacent to an aperture; a light sensor configured to detect debris particles from the extreme ultraviolet light generation chamber by detecting interaction of the debris particles with the detection light; and a reticle cleaning system configured to clean the reticle responsive to detecting the debris particles; and a plurality of cleaning lasers of the reticle cleaning system positioned downstream from the detection light source within the scanner. These limitations in combination with the other limitations of claim 17 render the claim non-obvious over the prior art of record.
Butscher et al. (US PGPub 2014/0028989, Butscher hereinafter) discloses generating extreme ultraviolet light from droplets in an extreme ultraviolet light generation chamber by irradiating the droplets with a laser (Figs. 1-3, paras. [0004], [0016], [0053], [0057], [0060], the lithography apparatus includes a beam generating system 2 with an EUV plasma light source 5 in which droplets of tin are irradiated with a laser); directing the extreme ultraviolet light from the extreme ultraviolet light generation chamber to a scanner (Figs. 1-3, paras. [0053]-[0056], the EUV radiation 6 from the light source 5 is directed to a collimator 7 and monochromator 8 in beam generating system 2 and to optical elements 9, 10 in illumination system 3 of the lithography apparatus); outputting a detection light (Figs. 1-3, paras. [0060]-[0065], [0077]-[0079], laser light source 15 outputs radiation 17 to illuminate particles detected by a camera 16. The EUV radiation 6 is used as the detection light adjacent to the region of the intermediate focus between the openings of beam shaping system 2 and illumination system 3, and camera 16 detects particles from scattered radiation); detecting debris particles traveling form the extreme ultraviolet light generation chamber based on interaction of the debris particles with the detection light (Figs. 1-3, paras. [0057]-[0065], [0077]-[0079], laser light source 15 emits radiation 17, and camera 16 detects particles illuminated by the radiation 17, including contaminating particles from the plasma light source, or EUV radiation 6 is used as the detection light adjacent to the region of the intermediate focus between the openings of beam shaping system 2 and illumination system 3, and camera 16 detects particles from scattered radiation); and although Butscher discloses activating a cleaning system to clean an optical surface in the scanner in response to detecting the debris particles (para. [0046], particles are removed from the optical surface), Butscher does not describe or render obvious activating a reticle cleaning system to clean a reticle in the scanner in response to detecting the debris particles, nor does Butscher describe or suggest wherein activating the reticle cleaning system includes activating a plurality of cleaning lasers of the reticle cleaning system positioned downstream from the detection light source within the scanner.
Singer et al. (US PGPub 2011/0279799, Singer hereinafter) discloses comprising a cleaning laser positioned downstream from the detection light source within the scanner (Figs. 1-2, paras. [0048]-[0050], [0057]-[0060], processing device 15 includes a laser 29 to remove contamination 24 downstream of measuring light source 18), but Singer fails to describe or suggest a plurality of cleaning lasers positioned downstream from the detection light source within the scanner.
Baier et al. (DE 102017207458, Baier hereinafter; English translation included with the 2/20/2026 Office Action) discloses a cleaning laser in the scanner (Figs. 1-2, pgs. 4-5 of the attached English translation, laser 16 is arranged in the lighting system 2 of the EUV projection exposure system coupled to the light source 1), but Baier does not describe or render obvious a plurality of cleaning lasers positioned downstream from the detection light source within the scanner.
Chien et al. (US PGPub 2016/0225610, Chien hereinafter) discloses outputting, with a detection light source in the scanner, the detection light across a path of travel of the extreme ultraviolet light and toward a light sensor in the scanner (Figs. 2-7, paras. [0031]-[0034], [0038]-[0044], the particle monitor system 316 includes light sources 320 emitting light across a path of travel of the EUV radiation to illuminate the photomask 102. The light sources 320 emit light toward sensor 318 to detect particles from the EUV source); and detecting debris particles traveling from the extreme ultraviolet light generation chamber into the scanner by detecting, with the light sensor, interaction of the debris particles with the detection light (Figs. 2-7, paras. [0031]-[0034], [0038]-[0044], [0050], the particle monitor system 316 includes light sources 320 and sensors 318 to detect particles from the EUV source (such as Sn particles). The sensors 318 detects particle presence from interaction of the emitted light with the particles). Chien fails to describe or render obvious a reticle cleaning system configured to clean the reticle responsive to detecting the debris particles; and a plurality of cleaning lasers of the reticle cleaning system positioned downstream from the detection light source within the scanner.
Response to Arguments
Applicant’s arguments, see page 6, filed 5/20/2026, with respect to the objections to claims 1, 3, 6, and 13 have been fully considered and are persuasive in light of the amendments to the claims. The objections to claims 1, 3, 6, and 13 have been withdrawn.
Applicant’s arguments, see page 7, filed 5/20/2026, with respect to the 35 U.S.C. 112(f) interpretation of “a reticle cleaning system” in claims 1 and 17 and “an automatic reticle cleaning system” in claim 13 have been fully considered and are persuasive in light of the amendments to the claims. The interpretations under 35 U.S.C. 112(f) have been withdrawn.
Applicant’s arguments, see page 7, filed 5/20/2026, with respect to the 35 U.S.C. 112(b) rejections of claims 3 and 11-12 have been fully considered and are persuasive in light of the amendments to the claims. The 35 U.S.C. 112(b) rejections of claims 3 and 11-12 have been withdrawn.
Applicant’s arguments, see pages 7-8, filed 5/20/2026, with respect to the 35 U.S.C. 103 rejections of claims 1, 13, and 17 as being unpatentable over Butscher in view of Singer have been fully considered and are persuasive in light of the amendments to the claims. The 35 U.S.C. 103 rejections of claims 1, 13, and 17 have been withdrawn.
Conclusion
Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to CHRISTINA A. RIDDLE whose telephone number is (571)270-7538. The examiner can normally be reached M-Th 6:30AM-5PM.
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/CHRISTINA A RIDDLE/Primary Examiner, Art Unit 2882
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