Prosecution Insights
Prosecution Insights
Tech Center 3600 • Art Units: 1724 1754 2851 2882 3652
This examiner grants 81% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18519497 | EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 19056497 | MEASURING METHOD, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 19009090 | ILLUMINATION OPTICAL SYSTEM INCLUDING TEMPERATURE COMPENSATED APERTURE | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 18215485 | CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Non-Final OA | Intel Corporation |
| 19035489 | PATTERN EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD | Non-Final OA | NIKON CORPORATION |
| 19005395 | VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS | Non-Final OA | Nikon Corporation |
| 18852949 | PLACEMENT MEMBER | Non-Final OA | KYOCERA CORPORATION |
| 18767396 | LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18783178 | SYSTEM AND METHOD FOR CLEANING AN EUV MASK | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18781721 | SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18397265 | CONSTRUCTING A SUBSTRATE TOPOLOGY MAP BASED ON MEASURED PROPERTIES | Non-Final OA | APPLIED MATERIALS, INC. |
| 18417564 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD | Non-Final OA | Tokyo Electron Limited |
| 18353300 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RECORDING MEDIUM | Final Rejection | Tokyo Electron Limited |
| 19076000 | HOLDING DEVICE FOR AN OPTICAL COMPONENT HAVING AN OPTICAL SURFACE WITH A POLYGONAL BORDER AND HAVING A CYLINDRICAL SUBSTRATE BODY | Non-Final OA | Carl Zeiss SMT GmbH |
| 19011435 | MIRROR FOR A PROJECTION EXPOSURE APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18988581 | IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE FIELD | Non-Final OA | Carl Zeiss SMT GmbH |
| 18480263 | ACTUATOR-SENSOR DEVICE AND LITHOGRAPHY APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18876007 | ILLUMINATION ADJUSTMENT APPARATUSES AND LITHOGRAPHIC APPARATUSES | Non-Final OA | ASML Netherlands B.V. |
| 18962837 | CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER | Non-Final OA | ASML Netherlands B.V. |
| 18699358 | LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS | Final Rejection | ASML NETHERLANDS B.V. |
| 17922580 | SUBSTRATE SUPPORT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF EXPOSING A SUBSTRATE | Final Rejection | ASML NETHERLANDS B.V. |
| 17886348 | MASK DEFECT DETECTION | Non-Final OA | ASML Netherlands B.V. |
| 18376237 | APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A PELLICLE | Final Rejection | ASML HOLDING N.V |
| 18976951 | AIR CONDITIONER AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME | Non-Final OA | SEMES CO., LTD. |
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