Prosecution Insights
Prosecution Insights
Tech Center 3600 • Art Units: 1724 1754 2851 2882 3652
This examiner grants 81% of resolved cases
Christina A. Riddle is an experienced examiner in Tech Center 3600 and Art Unit 1724, with 934 resolved cases. Her allowance rate of 80.9 percent is high, indicating a favorable environment for patent applicants. This 80.9 percent rate suggests that the examiner frequently finds ways to move cases toward a grant during the prosecution cycle.
The median days to allowance for her docket is 1071. This 1071 day timeline provides a realistic expectation for the duration of the patenting process. With 934 resolved cases, the data reflects a consistent ability to reach resolutions within this 1071 day window while maintaining high allowance levels.
Practitioners should also note the interview lift of 13.8 percent. While the baseline allowance rate is already high, the 13.8 percent lift demonstrates that interviews still provide a meaningful advantage. Engaging in a dialogue can help clarify technical nuances and potentially improve the chances of success beyond the 80.9 percent baseline during the 1071 day prosecution period.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 19009090 | ILLUMINATION OPTICAL SYSTEM INCLUDING TEMPERATURE COMPENSATED APERTURE | Non-Final OA | SAMSUNG DISPLAY CO., LTD. |
| 19056497 | MEASURING METHOD, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18215485 | CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY | Non-Final OA | Intel Corporation |
| 19035489 | PATTERN EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD | Non-Final OA | NIKON CORPORATION |
| 19005395 | VIBRATION CONTROL OF STRUCTURAL ELEMENTS OF EXPOSURE APPARATUS | Non-Final OA | Nikon Corporation |
| 18933209 | SYSTEMS AND METHODS FOR MONITORING SPATIAL LIGHT MODULATOR (SLM) FLARE | Final Rejection | NIKON CORPORATION |
| 18852949 | PLACEMENT MEMBER | Non-Final OA | KYOCERA CORPORATION |
| 18767396 | LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING THE SAME | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18783178 | SYSTEM AND METHOD FOR CLEANING AN EUV MASK | Final Rejection | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18397265 | CONSTRUCTING A SUBSTRATE TOPOLOGY MAP BASED ON MEASURED PROPERTIES | Non-Final OA | APPLIED MATERIALS, INC. |
| 18353300 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RECORDING MEDIUM | Final Rejection | Tokyo Electron Limited |
| 19173277 | TARGET SUPPLY DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 19016756 | CONTROLLER, LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 19012476 | LASER SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18913610 | PROFILE DISPLAY DEVICE, LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Final Rejection | Gigaphoton Inc. |
| 19170404 | MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND METHOD OF PROCESSING A MIRROR | Non-Final OA | Carl Zeiss SMT GmbH |
| 19171128 | METHOD FOR OPERATING AN OPTICAL COMPONENT, AND OPTICAL COMPONENT | Non-Final OA | Carl Zeiss SMT GmbH |
| 19082944 | OPTICAL ELEMENT FOR A PROJECTION EXPOSURE SYSTEM, OPTICAL SYSTEM COMPRISING SAME AND PROJECTION EXPOSURE SYSTEM COMPRISING THE OPTICAL ELEMENT AND/OR THE OPTICAL SYSTEM | Non-Final OA | Carl Zeiss SMT GmbH |
| 18480263 | ACTUATOR-SENSOR DEVICE AND LITHOGRAPHY APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18842649 | RETICLE STAGE | Non-Final OA | ASML Netherlands B.V. |
| 18726728 | A PELLICLE CLEANING SYSTEM | Final Rejection | ASML NETHERLANDS B.V. |
| 18699358 | LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS | Final Rejection | ASML NETHERLANDS B.V. |
| 18251261 | CONDITIONING APPARATUS AND METHOD | Final Rejection | ASML Netherlands B.V. |
| 17922580 | SUBSTRATE SUPPORT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF EXPOSING A SUBSTRATE | Final Rejection | ASML NETHERLANDS B.V. |
| 18376237 | APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A PELLICLE | Final Rejection | ASML HOLDING N.V |
| 18878055 | REPLICATION METHOD WITH A CONTACT BODY | Non-Final OA | Carl Zeiss Jena GmbH |
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