Prosecution Insights
Prosecution Insights
Tech Center 2800 • Art Units: 1724 2851 2882
This examiner grants 81% of resolved cases
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18595753 | EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18368995 | EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS | Non-Final OA | SAMSUNG ELECTRONICS CO., LTD. |
| 18779950 | LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCESSING METHOD, COMPUTER READABLE MEDIUM, AND INFORMATION PROCESSING APPARATUS | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18488579 | ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE | Non-Final OA | CANON KABUSHIKI KAISHA |
| 18397265 | CONSTRUCTING A SUBSTRATE TOPOLOGY MAP BASED ON MEASURED PROPERTIES | Final Rejection | APPLIED MATERIALS, INC. |
| 18732005 | APPARATUS AND METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL USED SURFACE OF A MIRROR MODULE, PROJECTION SYSTEM, ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS | Non-Final OA | Carl Zeiss SMT GmbH |
| 18624645 | LITHOGRAPHIC APPARATUS, INSPECTION METHOD, AND METHOD FOR PERFORMING LITHOGRAPHY PROCESS | Final Rejection | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
| 18353300 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND RECORDING MEDIUM | Non-Final OA | Tokyo Electron Limited |
| 18783178 | SYSTEM AND METHOD FOR CLEANING AN EUV MASK | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18781567 | SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18781721 | SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18721251 | A SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS | Final Rejection | ASML NETHERLANDS B.V. |
| 18699358 | LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS | Final Rejection | ASML NETHERLANDS B.V. |
| 18578780 | APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT | Final Rejection | ASML NETHERLANDS B.V. |
| 17922580 | SUBSTRATE SUPPORT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF EXPOSING A SUBSTRATE | Final Rejection | ASML NETHERLANDS B.V. |
| 18913610 | PROFILE DISPLAY DEVICE, LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18746278 | GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD | Non-Final OA | Gigaphoton Inc. |
| 18661503 | Apparatus and Method for Lithographic Exposure of Large Area Substrates | Final Rejection | ZS Systems LLC |
| 18265876 | APPARATUS AND METHOD FOR IMPROVED EXPOSURE OF RELIEF PRECURSORS | Non-Final OA | XSYS GERMANY GMBH |
| 17904945 | SYSTEM AND METHOD FOR DETERMINING THE INTEGRITY OF CONTAINERS BY OPTICAL MEASUREMENT | Non-Final OA | GasPorOx AB |
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