Prosecution Insights
Last updated: August 17, 2026
Application No. 18/782,565

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Final Rejection §102§103
Filed
Jul 24, 2024
Priority
Apr 30, 2020 — provisional 63/017,881 +2 more
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
3 (Final)
77%
Grant Probability
Favorable
4-5
OA Rounds
10m
Est. Remaining
83%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
750 granted / 973 resolved
+12.1% vs TC avg
Moderate +6% lift
Without
With
+5.7%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
50 currently pending
Career history
1036
Total Applications
across all art units

Statute-Specific Performance

§101
0.9%
-39.1% vs TC avg
§103
55.1%
+15.1% vs TC avg
§102
20.9%
-19.1% vs TC avg
§112
14.1%
-25.9% vs TC avg
Black line = Tech Center average estimate • Based on career data from 973 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the amendment submitted June 4, 2026. Bold text is new language to the Office Action. The rejection under 35 U.S.C. 102(a) (1) as being anticipated by HATAKEYAMA et al (2019/0113846) is withdrawn in view of the amendment to claim 1. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claim(s) 1, 3 and 5 are rejected under 35 U.S.C. 103 as being unpatentable HIRAYAMA et al (2016/0363860 A1). The claimed invention now recites the following: PNG media_image1.png 840 656 media_image1.png Greyscale PNG media_image2.png 38 460 media_image2.png Greyscale GOTO et al disclose the following polymers having the following structures: (A)-1, (A)-2 , (A)-3 or (A)-7 from page 75 and 76: PNG media_image3.png 978 420 media_image3.png Greyscale PNG media_image4.png 302 370 media_image4.png Greyscale Other polymers also disclose a radical-active functional group (A)-4 to (A)-8, (A)-11 and (A)-15. The first linker group in claim 1 is met by the prior art wherein an acrylate monomer is disclosed below: PNG media_image5.png 158 296 media_image5.png Greyscale see the numbered boxed section of the monomer above : 1- meets the linker group. 2- meets the alkene group. 3- meets the acid labile group. Claim 3 for the acid labile group being a C1- C20 linear, branched, or cyclic alkyl group is met by the cyclopentyl or cyclohexyl structure above. Claim 5 is met by the monomer above wherein the monomer unit forming the backbone is selected from the following monomer unit from HIRAYAMA et al page 75 or 76: PNG media_image6.png 166 418 media_image6.png Greyscale wherein the radical-active functional group can be bonded to the methyl, ethyl or isopropyl groups above off the alicyclic rings. Claims 2, 4, and 6 are objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. None of the prior art references of record disclose the recites styrene-based monomer units with the unsaturated groups off the ring as recited in claim 2, the second radical-active functional group attached to the polymer backbone by the acid labile group of claim 4 or the units disclosed in claim 6. Claims 7-20 are seen as allowable over the prior art of record. None of the prior art references of record disclose the claimed method of claims 7 and 15 comprising the monomer units selected from the Markush list in those claims. The prior art made of record and not relied upon is considered pertinent to applicant's disclosure. GOTO et al (2020/0012189 A1) disclose copolymers wherein the following monomer units may be selected as a unit in the base polymer from page 9. PNG media_image7.png 144 144 media_image7.png Greyscale Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a). A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S. CHU whose telephone number is (571)272-1329. The examiner can normally be reached on M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Keith Hendricks, can be reached at telephone number 571-272-1401. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from Patent Center. Status information for published applications may be obtained from Patent Center. Status information for unpublished applications is available through Patent Center to authorized users only. Should you have questions about access to the USPTO patent electronic filing system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via a variety of formats. See MPEP § 713.01. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) Form at https://www.uspto.gov/InterviewPractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu August 4, 2026
Read full office action

Prosecution Timeline

Show 1 earlier event
Oct 01, 2025
Non-Final Rejection mailed — §102, §103
Nov 26, 2025
Response Filed
Mar 09, 2026
Non-Final Rejection mailed — §102, §103
Apr 11, 2026
Interview Requested
Apr 13, 2026
Examiner Interview Summary
Apr 13, 2026
Applicant Interview (Telephonic)
Jun 04, 2026
Response Filed
Aug 06, 2026
Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12704781
SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
3y 1m to grant Granted Aug 11, 2026
Patent 12699320
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
2y 12m to grant Granted Aug 04, 2026
Patent 12692218
RESIST MATERIAL AND PATTERN FORMING METHOD
1y 10m to grant Granted Jul 28, 2026
Patent 12681385
PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME
3y 12m to grant Granted Jul 14, 2026
Patent 12663714
RESIST COMPOSITION AND PATTERN FORMING PROCESS
2y 11m to grant Granted Jun 23, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

4-5
Expected OA Rounds
77%
Grant Probability
83%
With Interview (+5.7%)
2y 11m (~10m remaining)
Median Time to Grant
High
PTA Risk
Based on 973 resolved cases by this examiner. Grant probability derived from career allowance rate.

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