Prosecution Insights
Last updated: July 17, 2026
Application No. 18/783,765

EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES

Non-Final OA §102§103
Filed
Jul 25, 2024
Priority
Jun 15, 2018 — continuation of 11/054,742 +2 more
Examiner
CHU, JOHN S Y
Art Unit
1737
Tech Center
1700 — Chemical & Materials Engineering
Assignee
Taiwan Semiconductor Manufacturing Company, Ltd.
OA Round
3 (Non-Final)
77%
Grant Probability
Favorable
3-4
OA Rounds
11m
Est. Remaining
83%
With Interview

Examiner Intelligence

Grants 77% — above average
77%
Career Allowance Rate
749 granted / 971 resolved
+12.1% vs TC avg
Moderate +6% lift
Without
With
+5.6%
Interview Lift
resolved cases with interview
Typical timeline
2y 11m
Avg Prosecution
49 currently pending
Career history
1034
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
75.6%
+35.6% vs TC avg
§102
12.8%
-27.2% vs TC avg
§112
6.3%
-33.7% vs TC avg
Black line = Tech Center average estimate • Based on career data from 971 resolved cases

Office Action

§102 §103
DETAILED CORRESPONDENCE This Office action is in response to the amendment received June 4, 2026. The rejection on the grounds of non-statutory double patenting as being unpatentable over U.S. Patent No. 11,054,742 and U.S. Patent No. 12,253,800 is withdrawn based on the submitted terminal disclaimer received June 4, 2026. Prosecution is reopened due to art found for claims 10-20. Claim Rejections - 35 USC § 102 The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action: A person shall be entitled to a patent unless – (a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale or otherwise available to the public before the effective filing date of the claimed invention. (a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention. Claim Rejections - 35 USC § 103 The following is a quotation of 35 U.S.C. 103 which forms the basis for all obviousness rejections set forth in this Office action: A patent for a claimed invention may not be obtained, notwithstanding that the claimed invention is not identically disclosed as set forth in section 102, if the differences between the claimed invention and the prior art are such that the claimed invention as a whole would have been obvious before the effective filing date of the claimed invention to a person having ordinary skill in the art to which the claimed invention pertains. Patentability shall not be negated by the manner in which the invention was made. The factual inquiries set forth in Graham v. John Deere Co., 383 U.S. 1, 148 USPQ 459 (1966), that are applied for establishing a background for determining obviousness under 35 U.S.C. 103 are summarized as follows: 1. Determining the scope and contents of the prior art. 2. Ascertaining the differences between the prior art and the claims at issue. 3. Resolving the level of ordinary skill in the pertinent art. 4. Considering objective evidence present in the application indicating obviousness or nonobviousness. Claims 10, 14 and 16 are rejected under 35 U.S.C. 102 (a) (1) as being clearly anticipated by TSANG et al (2015/0353679). The claimed invention recites the following: PNG media_image1.png 488 586 media_image1.png Greyscale PNG media_image2.png 458 608 media_image2.png Greyscale TSANG et al report a photoimageable polycarbonate polymer comprising a photoacid generator / thermal acid generators or thermally activated base generator and a solvent, as reported in para. [0093] and more specifically in para. [0098], namely trifluoromethane sulfonate and perfluoro butyl sulfonate, shown below: PNG media_image3.png 326 434 media_image3.png Greyscale Specifically, Example 10 on page 18 discloses a composition comprising an additive GSID-26-1 formulated with a polycarbonate polymer: PNG media_image4.png 314 456 media_image4.png Greyscale PNG media_image5.png 200 460 media_image5.png Greyscale None of the claims above are allowed. Claim 17 is rejected under 35 U.S.C. 102 (a) (1) as being clearly anticipated by KOMURO et al (2013/0189619). The claimed invention is recited below: PNG media_image6.png 300 622 media_image6.png Greyscale PNG media_image7.png 514 714 media_image7.png Greyscale KOMURO et al anticipates the claimed material composition comprising a photoacid compound and a base component (A), see page 91, Table 1, Examples 1-4, below: PNG media_image8.png 314 672 media_image8.png Greyscale PNG media_image9.png 378 676 media_image9.png Greyscale wherein applicants are directed to page 91, para. [0899] for the Synthesis Example 2 wherein triphenylsulfonium N-[2-adamantan-1-ylcarbonyloxyethyl ] trifluoromethanesulfonamide is disclosed as seen below: PNG media_image10.png 270 410 media_image10.png Greyscale No claims are allowed. Claims 11-13, 15, and 18-20 objected to as being dependent upon a rejected base claim, but would be allowable if rewritten in independent form including all of the limitations of the base claim and any intervening claims. None of the prior art references of record disclose the metallic photoresist, the ligands and photobase generator of claims 11-13. Likewise, claims to the sulfonium of claim 15, the solvent of claim 18 and the photobase generator of claim 19 and the quenchers of claim 20 are not disclosed in the cited references of record. Any inquiry concerning this communication or earlier communications from the examiner should be directed to JOHN S CHU whose telephone number is (571)272-1329. The examiner can normally be reached M-F, IFP-Flex. If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Keith Hendricks, can be reached at telephone number 571-272-1401. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300. Information regarding the status of an application may be obtained from the Patent Application Information Retrieval (PAIR) system. Status information for published applications may be obtained from either Private PAIR or Public PAIR. Status information for unpublished applications is available through Private PAIR only. For more information about the PAIR system, see http://portal.uspto.gov/external/portal. Should you have questions about access to the Private PAIR system, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice. /John S. Chu/ Primary Examiner, Art Unit 1737 J. Chu June 18, 2026
Read full office action

Prosecution Timeline

Jul 25, 2024
Application Filed
Oct 01, 2025
Non-Final Rejection mailed — §102, §103
Jan 08, 2026
Response Filed
Apr 08, 2026
Final Rejection mailed — §102, §103
Jun 04, 2026
Response after Non-Final Action
Jun 23, 2026
Non-Final Rejection mailed — §102, §103 (current)

Precedent Cases

Applications granted by this same examiner with similar technology

Patent 12681385
PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLAY DEVICE USING THE SAME
3y 12m to grant Granted Jul 14, 2026
Patent 12663714
RESIST COMPOSITION AND PATTERN FORMING PROCESS
2y 11m to grant Granted Jun 23, 2026
Patent 12663715
PHOTOSENSITIVE RESIN FILM AND APPLICATION THEREOF
2y 3m to grant Granted Jun 23, 2026
Patent 12645142
A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST COATING, ETCHED PHOTORESIST COATING, AND ETCHED SI CONTAINING LAYER(S), AND MANUFACTURING A DEVICE USING THEREOF
5y 5m to grant Granted Jun 02, 2026
Patent 12625427
NOVEL NAPHTHALIMIDE SULFONATE DERIVATIVE, AND PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION EACH COMPRISING SAME
2y 10m to grant Granted May 12, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

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Prosecution Projections

3-4
Expected OA Rounds
77%
Grant Probability
83%
With Interview (+5.6%)
2y 11m (~11m remaining)
Median Time to Grant
High
PTA Risk
Based on 971 resolved cases by this examiner. Grant probability derived from career allowance rate.

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