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Office Actions › Tokyo Electron Limited › 18819736
Last updated: July 12, 2026
Application No. 18/819,736

Untitled Application

Unknown
Filed
Examiner
TRAN, BINH X
Art Unit
Tech Center
Tokyo Electron Limited
Assignee
Tokyo Electron Limited
OA Round
1 (Non-Final)
81%
Grant Probability
Favorable
1-2
OA Rounds
2y 9m
Filing → Grant
93%
With Interview

Interview Optional

— +12.0% interview lift. Interview lift (+12.0%) is below the 15.0% threshold. A written response is recommended.
Based on 921 resolved cases, 2023–2026

Examiner Intelligence

TRAN, BINH X View full profile →
Grants 81% — above average
81%
Career Allowance Rate
750 granted / 921 resolved
+21.4% vs TC avg
Moderate +12% lift
Without
With
+12.0%
Interview Lift
resolved cases with interview
Typical timeline
2y 9m
Avg Prosecution
29 currently pending
Career history
952
Total Applications
across all art units

Statute-Specific Performance

§101
0.4%
-39.6% vs TC avg
§103
65.5%
+25.5% vs TC avg
§102
9.9%
-30.1% vs TC avg
§112
19.9%
-20.1% vs TC avg
Black line = Tech Center average estimate • Based on career data from 921 resolved cases

Precedent Cases

Applications granted by this same examiner with similar technology

18/011,837
Patent 12672492
SYSTEMS AND METHODS FOR ETCHING A HIGH ASPECT RATIO STRUCTURE
3y 6m to grant Granted Jun 30, 2026
18/468,067
Patent 12667916
METHOD FOR MANUFACTURING AN EXTERNAL COMPONENT INCLUDING A DIFFRACTION GRATING
2y 9m to grant Granted Jun 30, 2026
18/043,451
Patent 12655320
POLISHING COMPOSTION FOR SEMICONDUCTOR PROCESS, MANUFACTURING METHOD OF POLISHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
3y 3m to grant Granted Jun 16, 2026
18/225,801
Patent 12658412
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
2y 10m to grant Granted Jun 16, 2026
17/837,543
Patent 12653004
PATTERNING LAYER MODIFICATION USING DIRECTIONAL RADICAL RIBBON BEAM
4y 0m to grant Granted Jun 09, 2026
Study what changed to get past this examiner. Based on 5 most recent grants.

Strategy Recommendation AI-generated — please review before filing

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Prosecution Projections

1-2
Expected OA Rounds
81%
Grant Probability
93%
With Interview (+12.0%)
2y 9m
Median Time to Grant
Low
PTA Risk
Based on 921 resolved cases by this examiner. Grant probability derived from career allowance rate.

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Data sourced from USPTO Patent File Wrapper (daily) and Office Action Archive (weekly). Analysis generated by IP Author.

Data: USPTO Patent File Wrapper (daily) • Office Action Archive (weekly) • 89M+ prosecution events

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