Tech Center 2800 • Art Units: 1713 1716 1765 1781 1792 2813
This examiner grants 82% of resolved cases
Binh X Tran is an examiner in Tech Center 2800, Art Unit 1713. The examiner has 933 resolved cases. The data shows an allowance rate of 81.7 percent and an interview lift of 12.0 percent. The median days to allowance for these cases is 1024.
The 12.0 percent interview lift is a metric that can be compared to the 81.7 percent base allowance rate. This indicates that conducting an interview is a method for increasing the likelihood of an allowance. The 1024 day median pendency is the timeframe applicants can expect when navigating the resolved cases handled by this examiner in Art Unit 1713. Practitioners can consider how these metrics influence the overall prosecution timeline.
With 933 resolved cases, the examiner's statistics provide a view of the prosecution landscape. Practitioners can use the 81.7 percent allowance rate to assess the probability of a grant. The 12.0 percent lift and the Tech Center 2800 environment are factors for prosecution strategy. These data points help in setting expectations for clients.
| App # | Title | Status | Assignee |
|---|---|---|---|
| 18939793 | MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING DISPLAY PANEL | Non-Final OA | Samsung Display Co., Ltd. |
| 18603578 | TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND METHOD OF TREATING OBJECT TO BE TREATED | Final Rejection | FUJIFILM Corporation |
| 18931148 | Etching Compositions | Non-Final OA | Fujifilm Electronic Materials U.S.A., Inc. |
| 18627835 | PRODUCING GRATINGS IN OPTICAL SUBSTRATES USING NEUTRALIZED ION BEAM ETCHING | Non-Final OA | GOOGLE LLC |
| 18727238 | LASER MICROMACHINING OF MEMS RESONATORS FROM BULK OPTICALLY TRANSPARENT MATERIAL | Non-Final OA | The Regents of the University of California |
| 18858192 | RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METHOD, SUBSTRATE SELECTION METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR PACKAGE SUBSTRATE OR PRINTED CIRCUIT BOARD | Non-Final OA | Resonac Corporation |
| 18974840 | SEMICONDUCTOR MANUFACTURING METHOD | Non-Final OA | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
| 18973300 | Photoresist and Method | Non-Final OA | Taiwan Semiconductor Manufacturing Co., Ltd. |
| 18805790 | SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL | Non-Final OA | Applied Materials, Inc. |
| 18603360 | SELECTIVE OXIDATION PROCESSES FOR GATE-ALL-AROUND TRANSISTORS | Final Rejection | Applied Materials, Inc. |
| 18620111 | SELECTIVE ETCHING OF SILICON ADJACENT TO SILICON-GERMANIUM | Non-Final OA | Tokyo Electron Limited |
| 18482401 | SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS | Final Rejection | Tokyo Electron Limited |
| 18813036 | METHOD OF FORMING SEMICONDUCTOR STRUCTURE | Non-Final OA | NANYA TECHNOLOGY CORPORATION |
| 18791464 | METHOD OF PLASMA ETCHING | Non-Final OA | NANYA TECHNOLOGY CORPORATION |
| 18957603 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | Non-Final OA | SCREEN Holdings Co., Ltd. |
| 18596278 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE | Final Rejection | FUJIMI INCORPORATED |
| 18684991 | POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD | Final Rejection | FUJIMI INCORPORATED |
| 18697669 | PATTERNING METHODS FOR PHOTONIC DEVICES | Final Rejection | PSIQUANTUM CORP. |
| 18594391 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD | Final Rejection | SEMES CO., LTD. |
| 18870440 | COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD | Non-Final OA | JSR CORPORATION |
| 18293322 | PLASMA TREATMENT METHOD | Final Rejection | JIANGSU LEUVEN INSTRUMENTS CO., LTD. |
| 18373692 | METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD | Non-Final OA | DuPont Electronic Materials Holding, Inc. |
| 18392584 | SELECTIVE THIN FILM RESISTOR AND METHODS FOR MAKING SAME | Non-Final OA | Greensource Fabrication LLC |
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