Prosecution Insights
Last updated: May 29, 2026

Examiner: TRAN, BINH X

Tech Center 1700 • Art Units: 1713 1716 1781 1792

This examiner grants 81% of resolved cases

Performance Statistics

81.4%
Allow Rate
+16.4% vs TC avg
945
Total Applications
+12.3%
Interview Lift
1023
Avg Prosecution Days
Based on 916 resolved cases, 2023–2026

Rejection Statute Breakdown

0.4%
§101 Eligibility
10.1%
§102 Novelty
65.1%
§103 Obviousness
20.0%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18603578 TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND METHOD OF TREATING OBJECT TO BE TREATED Non-Final OA FUJIFILM Corporation
18435853 DEPOSITION AND ETCHING FOR SELECTIVE REMOVAL OF DEPOSITED DIELECTRIC FILM FROM TOPS OF FINS Non-Final OA Applied Materials, Inc.
18232985 METHODS OF ETCHING CARBON-CONTAINING FEATURES AT LOW TEMPERATURES Non-Final OA Applied Materials, Inc.
18096207 PHOTOLITHOGRAPHY ENHANCEMENT TECHNIQUES Non-Final OA Applied Materials, Inc.
17698024 METHOD AND APPARATUS FOR REMOVING LASER DEBOND RESIDUE FROM SUBSTRATE Final Rejection Intel Corporation
18298114 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
18482401 SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS Non-Final OA Tokyo Electron Limited
18466613 TUNABLE PATTERNED SURFACE UNIFORMITY USING DIRECT CURRENT BIAS Final Rejection Tokyo Electron Limited
18691760 PLASMA PROCESSING METHOD Non-Final OA Hitachi High-Tech Corporation
18683501 METHOD AND APPARATUS FOR ETCHING A CARBON CONTAINING LAYER Non-Final OA Lam Research Corporation
18596278 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE Non-Final OA FUJIMI INCORPORATED
18684991 POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD Non-Final OA FUJIMI INCORPORATED
18293322 PLASMA TREATMENT METHOD Non-Final OA JIANGSU LEUVEN INSTRUMENTS CO., LTD.
18409628 Functionalized Carbon Particle CMP Slurry Dispersion Non-Final OA DuPont Electronic Materials Holdings, Inc.
18392584 SELECTIVE THIN FILM RESISTOR AND METHODS FOR MAKING SAME Non-Final OA Greensource Fabrication LLC
18135558 Semiconductor Structure and Method for Forming the Same Non-Final OA HUA HONG SEMICONDUCTOR (WUXI) LIMITED

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