Prosecution Insights
Last updated: October 02, 2026

Examiner: TRAN, BINH X

Tech Center 2800 • Art Units: 1713 1716 1765 1781 1792 2813

This examiner grants 82% of resolved cases

Analysis

Binh X Tran is an examiner in Tech Center 2800, Art Unit 1713. The examiner has 933 resolved cases. The data shows an allowance rate of 81.7 percent and an interview lift of 12.0 percent. The median days to allowance for these cases is 1024.

The 12.0 percent interview lift is a metric that can be compared to the 81.7 percent base allowance rate. This indicates that conducting an interview is a method for increasing the likelihood of an allowance. The 1024 day median pendency is the timeframe applicants can expect when navigating the resolved cases handled by this examiner in Art Unit 1713. Practitioners can consider how these metrics influence the overall prosecution timeline.

With 933 resolved cases, the examiner's statistics provide a view of the prosecution landscape. Practitioners can use the 81.7 percent allowance rate to assess the probability of a grant. The 12.0 percent lift and the Tech Center 2800 environment are factors for prosecution strategy. These data points help in setting expectations for clients.

Written from this page's own data; every figure is computed from USPTO records and verified before publication.

Performance Statistics

81.7%
Allow Rate
+13.7% vs TC avg
962
Total Applications
+12.0%
Interview Lift
1024
Avg Prosecution Days
Based on 933 resolved cases, 2023–2026

Rejection Statute Breakdown

0.8%
§101 Eligibility
20.5%
§102 Novelty
40.6%
§103 Obviousness
29.9%
§112 Clarity

Currently Pending Office Actions

App #TitleStatusAssignee
18939793 MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING DISPLAY PANEL Non-Final OA Samsung Display Co., Ltd.
18603578 TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND METHOD OF TREATING OBJECT TO BE TREATED Final Rejection FUJIFILM Corporation
18931148 Etching Compositions Non-Final OA Fujifilm Electronic Materials U.S.A., Inc.
18627835 PRODUCING GRATINGS IN OPTICAL SUBSTRATES USING NEUTRALIZED ION BEAM ETCHING Non-Final OA GOOGLE LLC
18727238 LASER MICROMACHINING OF MEMS RESONATORS FROM BULK OPTICALLY TRANSPARENT MATERIAL Non-Final OA The Regents of the University of California
18858192 RESIST PATTERN INSPECTION METHOD, RESIST PATTERN MANUFACTURING METHOD, SUBSTRATE SELECTION METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR PACKAGE SUBSTRATE OR PRINTED CIRCUIT BOARD Non-Final OA Resonac Corporation
18974840 SEMICONDUCTOR MANUFACTURING METHOD Non-Final OA TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
18973300 Photoresist and Method Non-Final OA Taiwan Semiconductor Manufacturing Co., Ltd.
18805790 SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL Non-Final OA Applied Materials, Inc.
18603360 SELECTIVE OXIDATION PROCESSES FOR GATE-ALL-AROUND TRANSISTORS Final Rejection Applied Materials, Inc.
18620111 SELECTIVE ETCHING OF SILICON ADJACENT TO SILICON-GERMANIUM Non-Final OA Tokyo Electron Limited
18482401 SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS Final Rejection Tokyo Electron Limited
18813036 METHOD OF FORMING SEMICONDUCTOR STRUCTURE Non-Final OA NANYA TECHNOLOGY CORPORATION
18791464 METHOD OF PLASMA ETCHING Non-Final OA NANYA TECHNOLOGY CORPORATION
18957603 SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS Non-Final OA SCREEN Holdings Co., Ltd.
18596278 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE Final Rejection FUJIMI INCORPORATED
18684991 POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD Final Rejection FUJIMI INCORPORATED
18697669 PATTERNING METHODS FOR PHOTONIC DEVICES Final Rejection PSIQUANTUM CORP.
18594391 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Final Rejection SEMES CO., LTD.
18870440 COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND POLISHING METHOD Non-Final OA JSR CORPORATION
18293322 PLASMA TREATMENT METHOD Final Rejection JIANGSU LEUVEN INSTRUMENTS CO., LTD.
18373692 METHOD OF POLISHING USING CHEMICAL MECHANICAL POLISHING PAD Non-Final OA DuPont Electronic Materials Holding, Inc.
18392584 SELECTIVE THIN FILM RESISTOR AND METHODS FOR MAKING SAME Non-Final OA Greensource Fabrication LLC

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