FINAL REJECTION NOTICE
Notice of Pre-AIA or AIA Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .
Response to Arguments
Applicant’s arguments, see remarks and amendments, filed 04/24/2026 with respect to claims 1,2, 4-17, and 20 have been fully considered and are persuasive. The rejection under 35 USC 102 of claims 1,2, 4-17, 20 has been withdrawn.
However, claims 18, 19 still reads on the prior art. Hence, claims 18, 19 are rejected.
Claim Rejections - 35 USC § 102
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –(a)(1) the claimed invention was patented, described in a printed publication, or in public use, on sale, or otherwise available to the public before the effective filing date of the claimed invention.
Claims 18, 19 are rejected under 35 U.S.C. 102 (a)(1) as being anticipated by US2011/0114601 A1 by Lubomirsky et al (Lubomirsky).
Referring to claim 18 Lubomirsky anticipates a plasma source comprising:
a plasma source body (Fig 2B item 1000), wherein the plasma source body includes a dielectric material (item 1145 dielectric isolation plate [0039]) ;
PNG
media_image1.png
632
480
media_image1.png
Greyscale
a ferrite core within the plasma source body(item 1130 ferrite core element paragraph [0042]);
an electrode(item 1142 paragraph [0061]) within the plasma source body (paragraphs [0060] , [0061]);
wherein the plasma source body is configured to generate a plasma at a plasma location when the ferrite core is energized, with the plasma generated forming at least partially external to the plasma source body, around the ferrite core, the electrode, and the dielectric material (See paragraphs [0044] and [0060] and 1118 is the plasma generated around the core element, electrode and dielectric body); and
wherein the plasma source body includes a reduced-thickness region that defines the plasma location at a shortest-loop location (See paragraph [0063] where Fig 2B -2F source assembly 1038 reducing the complexity of the source).
Referring to claim 19 Lubomirsky anticipates a plasma source comprising: a plasma source body (Fig 2B item 1000), wherein the plasma source body includes a dielectric material (item 1145 dielectric isolation plate [0039]);
a ferrite core within the plasma source body (item 1130 ferrite core element paragraph [0042]);
an electrode (item 1142 paragraph [0061]) within the plasma source body (paragraphs [0060] [0061]);
wherein the plasma source body is configured to generate a plasma at a plasma location when the ferrite core is energized, with the plasma generated forming at least partially external to the plasma source body, around the ferrite core, the electrode, and the dielectric material (See paragraphs [0044] and [0060] and 1118 is the plasma generated around the core element, electrode and dielectric body);
wherein the plasma source body defines an inner bore; wherein the plasma location passes through the inner bore; wherein the plasma source includes a gas feed to direct gas to the plasma location(See Fig 2B and paragraph [0038] where through 1011 plasma body and processing chamber are connected with fluid communication); and
wherein the gas feed (item 1120) includes gas channels (item 1026) that direct the gas feed radially inward to an inner bore defined by the plasma source body ( paragraph [0038]).
Allowable Subject Matter
Claims 1,2, 4-17 are allowed.
The following is a statement of reasons for the indication of allowable subject matter:
Referring to claim 1 the closest prior art fails to teach or reasonably suggest a plasma source comprising: such that the generated plasma forms a closed-loop plasma path passing through the inner bore and extending external to the plasma source body; a mount mechanically coupled to the plasma source body, for coupling the plasma source body to a vacuum vessel with the plasma source body in fluid communication with an interior of the vacuum vessel, such that a portion of the plasma path external to the plasma source body is in fluid communication with the interior of the vacuum vessel. Hence, claim 1, and depending claims 2, 4-17, and 20 are allowed.
Conclusion
Claims 1, 2, 4-17 are allowed.
Claim 3 is cancelled.
Claims 18, 19 are rejected.
Applicant's amendment necessitated the new ground(s) of rejection presented in this Office action. Accordingly, THIS ACTION IS MADE FINAL. See MPEP § 706.07(a). Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to SRINIVAS SATHIRAJU whose telephone number is (571)272-4250. The examiner can normally be reached 8:30AM-3:30PM, 5PM -8:30PM.
Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, ALEXANDER H TANINGCO can be reached at 5712728048. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000.
SRINIVAS . SATHIRAJU
Primary Examiner
Art Unit 2844
05/07/2026