Prosecution Insights
Prosecution Insights
2 pending office actions • 2 art units • 2 examiners • 0 of 2 (0%) have an AI response strategy ready • 3 patents granted in the last 365 days
Based on the USPTO statutory response window for each pending office action. 2 of the docket's apps have a known mailing date; the rest are excluded from the tile counts.
Difficulty is derived from the rejection statutes on the most recent pending office action. §101-driven and multi-statute cases are graded Hard; §112-only and obviousness-type double-patenting cases are graded Easy; everything else is Medium. "Unknown" means we have not yet parsed a statute for that office action.
| Bucket | Cases |
|---|---|
| §103 only | 1 (50%) |
| §102 only | 1 (50%) |
How the docket's pending cases split across USPTO tech-center bands.
Manual office-action response work runs about 10 hours per case. The time-saved bands below show what IP Author's prosecution pipeline typically delivers — a conservative 20% on the low end, 35% in the middle, 50% on the high end.
| Examiner | Apps on this docket | Allow rate | Interview lift |
|---|---|---|---|
| SATHIRAJU, SRINIVAS | 1 | 88.8% | +5.8% |
| VAN, LUAN V | 1 | 33.9% | +40.1% |
Cases in front of an examiner with an allow rate of 80%+ where the difficulty is Easy or Medium. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18825455 | INVERTED PLASMA SOURCE, AND METHOD | SATHIRAJU, SRINIVAS | 76d |
Cases in front of an examiner whose interview lift is 10 percentage points or more — i.e. interviewed cases historically resolve more favorably than non-interviewed ones. The top 1 ordered by deadline are shown.
| App # | Title | Examiner | Due in |
|---|---|---|---|
| 18134087 | COATINGS FOR USE IN REMOTE PLASMA SOURCE APPLICATIONS AND METHOD OF THEIR MANUFACTURE | VAN, LUAN V | 48d |
| Art Unit | Apps |
|---|---|
| 2844 | 1 |
| 1795 | 1 |
| App # | Title | Examiner | Art Unit | Statutes | Status | Due in | AI | Filed |
|---|---|---|---|---|---|---|---|---|
| 18825455 | INVERTED PLASMA SOURCE, AND METHOD | SATHIRAJU, SRINIVAS | 2844 | §102 | Final Rejection | 76d | Pending | Sep 05, 2024 |
| 18134087 | COATINGS FOR USE IN REMOTE PLASMA SOURCE APPLICATIONS AND METHOD OF THEIR MANUFACTURE | VAN, LUAN V | 1795 | §103 | Non-Final OA | 48d | Pending | Apr 13, 2023 |
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